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The remarkable electrical, optical and mechanical properties of graphene make it a desirable material for electronics, optoelectronics and quantum applications. A fundamental understanding of the electrical conductivity of graphene across a wide frequency range is required for the development of such technologies. In this study, we use terahertz (THz) time-domain spectroscopy to measure the complex dynamic conductivity of electrostatically gated graphene, in a broad $\sim$0.1 - 7 THz frequency range. The conductivity of doped graphene follows the conventional Drude model, and is predominantly governed by intraband processes. In contrast, undoped charge-neutral graphene exhibits a THz conductivity that significantly deviates from Drude-type models. Via quantum kinetic equations and density matrix theory, we show that this discrepancy can be explained by additional interband processes, that can be exacerbated by electron backscattering. We propose a mechanism where such backscattering -- which involves flipping of the electron pseudo-spin -- is mediated by the substantial vector scattering potentials that are associated with structural deformations of graphene. Our findings highlight the significant impact that structural distortions and resulting electrostatic vector scattering potentials can have on the THz conductivity of charge-neutral graphene. Our results emphasise the importance of the planar morphology of graphene for its broadband THz electronic response., Comment: 74 pages, 21 figures

We demonstrate a large-area passivation layer for graphene by mechanical transfer of ultrathin amorphous Ga$_2$O$_3$ synthesized on liquid Ga metal. A comparison of temperature-dependent electrical measurements of millimetre-scale passivated and bare graphene on SiO$_2$/Si indicate that the passivated graphene maintains its high field effect mobility desirable for applications. Surprisingly, the temperature-dependent resistivity is reduced in passivated graphene over a range of temperatures below 220 K, due to the interplay of screening of the surface optical phonon modes of the SiO$_2$ by high-dielectric-constant Ga$_2$O$_3$, and the relatively high characteristic phonon frequencies of Ga$_2$O$_3$. Raman spectroscopy and electrical measurements indicate that Ga$_2$O$_3$ passivation also protects graphene from further processing such as plasma-enhanced atomic layer deposition of Al$_2$O$_3$., Comment: Journal article, 10 pages, 4 figures

The integration of two-dimensional transition metal dichalcogenide crystals (TMDCs) into a dielectric environment is critical for optoelectronic and photonic device applications. Here, we investigate the effects of direct deposition of different dielectric materials (Al$_2$O$_3$, SiO$_2$, SiN$_x$) onto atomically thin (monolayer) TMDC WS$_2$ on its optical response. Atomic layer deposition (ALD), electron beam evaporation (EBE), plasma enhanced chemical vapour deposition (PECVD), and magnetron sputtering methods of material deposition are investigated. The photoluminescence (PL) measurements reveal quenching of the excitonic emission after all deposition processes. The reduction in neutral exciton PL is linked to the increased level of charge doping and associated rise of the trion emission, and/or the localized (bound) exciton emission. Furthermore, Raman spectroscopy allows us to clearly correlate the observed changes of excitonic emission with the increased levels of lattice disorder and defects. Overall, the EBE process results in the lowest level of doping and defect densities and preserves the spectral weight of the exciton emission in the PL, as well as the exciton oscillator strength. Encapsulation with ALD appears to cause chemical changes, which makes it distinct from all other techniques. Sputtering is revealed as the most aggressive deposition method for WS$_2$, fully quenching its optical response. Our results demonstrate and quantify the effects of direct deposition of dielectric materials onto monolayer WS$_2$, which can provide a valuable guidance for the efforts to integrate monolayer TMDCs into functional optoelectronic devices.

Inducing long-range magnetic order in three-dimensional topological insulators can gap the Diraclike metallic surface states, leading to exotic new phases such as the quantum anomalous Hall effect or the axion insulator state. These magnetic topological phases can host robust, dissipationless charge and spin currents or unique magnetoelectric behavior, which can be exploited in low-energy electronics and spintronics applications. Although several different strategies have been successfully implemented to realize these states, to date these phenomena have been confined to temperatures below a few Kelvin. In this review, we focus on one strategy, inducing magnetic order in topological insulators by proximity of magnetic materials, which has the capability for room temperature operation, unlocking the potential of magnetic topological phases for applications. We discuss the unique advantages of this strategy, the important physical mechanisms facilitating magnetic proximity effect, and the recent progress to achieve, understand, and harness proximity-coupled magnetic order in topological insulators. We also highlight some emerging new phenomena and applications enabled by proximity coupling of magnetism and topological materials, such as skyrmions and the topological Hall effect, and we conclude with an outlook on remaining challenges and opportunities in the field., Comment: Review article, 30 pages including references, 11 figures

Atomically thin transition metal dichalcogenide crystals (TMDCs) have extraordinary optical properties that make them attractive for future optoelectronic applications. Integration of TMDCs into practical all-dielectric heterostructures hinges on the ability to passivate and protect them against necessary fabrication steps on large scales. Despite its limited scalability, encapsulation of TMDCs in hexagonal boron nitride (hBN) currently has no viable alternative for achieving high performance of the final device. Here, we show that the novel, ultrathin Ga$_2$O$_3$ glass is an ideal centimeter-scale coating material that enhances optical performance of the monolayers and protects them against further material deposition. In particular, Ga$_2$O$_3$ capping of commercial grade WS$_2$ monolayers outperforms hBN in both scalability and optical performance at room temperature. These properties make Ga$_2$O$_3$ highly suitable for large scale passivation and protection of monolayer TMDCs in functional heterostructures.

Implementing topological insulators as elementary units in quantum technologies requires a comprehensive understanding of the dephasing mechanisms governing the surface carriers in these materials, which impose a practical limit to the applicability of these materials in such technologies requiring phase coherent transport. To investigate this, we have performed magneto-resistance (MR) and conductance fluctuations\ (CF) measurements in both exfoliated and molecular beam epitaxy grown samples. The phase breaking length ($l_{\phi}$) obtained from MR shows a saturation below sample dependent characteristic temperatures, consistent with that obtained from CF measurements. We have systematically eliminated several factors that may lead to such behavior of $l_{\phi}$ in the context of TIs, such as finite size effect, thermalization, spin-orbit coupling length, spin-flip scattering, and surface-bulk coupling. Our work indicates the need to identify an alternative source of dephasing that dominates at low $T$ in topological insulators, causing saturation in the phase breaking length and time.

One of the unique features of Dirac Fermions is pseudo-diffusive transport by evanescent modes at low Fermi energies when the disorder is low. At higher Fermi energies i.e. carrier densities, the electrical transport is diffusive in nature and the propagation occurs via plane-waves. In this study, we report the detection of such evanescent modes in the surface states of topological insulator through 1/f noise. While signatures of pseudo-diffusive transport have been seen experimentally in graphene, such behavior is yet to be observed explicitly in any other system with a Dirac dispersion. To probe this, we have studied 1/f noise in topological insulators as a function of gate-voltage, and temperature. Our results show a non-monotonic behavior in 1=f noise as the Fermi energy is varied, suggesting a crossover from pseudo-diffusive to diffusive transport regime in mesoscopic topological insulators. The temperature dependence of noise points towards conductance fluctuations from quantum interference as the dominant source of the noise in these samples., Comment: 5 pages, 4 figures

We report a detailed study on low-frequency 1/f-noise in large-area molecular-beam epitaxy grown thin (10 nm) films of topological insulators as a function of temperature, gate voltage, and magnetic field. When the Fermi energy is within the bulk valence band, the temperature dependence reveals a clear signature of generation-recombination noise in the defect states in the bulk band gap. However, when the Fermi energy is tuned to the bulk band gap, the gate voltage dependence of noise shows that the resistance fluctuations in surface transport are caused by correlated mobility-number density fluctuations due to the activated defect states present in the bulk of the topological insulator crystal with a density of D$_{it}=3.2\times10^{17}$ cm$^2$eV$^{-1}$. In the presence of a magnetic field, noise in these materials follows a parabolic dependence, which is qualitatively similar to mobility and charge-density fluctuation noise in non-degenerately doped trivial semiconductors. Our studies reveal that even in thin films of (Bi,Sb)$_2$Te$_3$ with thickness as low as 10 nm, the intrinsic bulk defects are the dominant source of noise., Comment: 15 pages, 4 figures

A key feature of topological insulators (TI) is symplectic symmetry of the Hamiltonian which changes to unitary when time reversal symmetry is lifted and the topological phase transition occurs. However, such a crossover has never been explicitly observed, by directly probing the symmetry class of the Hamiltonian. In this report, we have probed the symmetry class of topological insulators by measuring the mesoscopic conductance fluctuations in the TI Bi$_{1.6}$Sb$_{0:4}$Te$_2$Se, which shows an exact factor of two reduction on application of a magnetic field due to crossover from symplectic to unitary symmetry classes. The reduction provides an unambiguous proof that the fluctuations arise from the universal conductance fluctuations (UCF), due to quantum interference and persists from T = 22 mK to 4.2 K. We have also compared the phase breaking length (l$_\phi$) extracted from both magneto-conductivity and UCF which agree well within a factor of two in the entire temperature and gate voltage range. Our experiment confirms UCF as the major source of fluctuations in mesoscopic disordered topological insulators, and the intrinsic preservation of time reversal symmetry in these systems., Comment: 6 pages, 4 figures