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Solution deposition processes for the production of thin multi-element metal oxide films continue with great interest and varied success. Solution deposition via either sol-gel or MOD (Metal Organic Decomposition) methods are of interest due to the ability to produce a wide variety of compositional products at low capital investment cost. The sol-gel method generally uses hydrolytically sensitive metal alkoxides as the starting materials. Manipulation of the reagents and different hydrolysis rates for multi-element mixtures are issues. The MOD method utilizes large organic acid metal salts as the starting materials. In general, MOD solutions are more hydrolytically stable than the sol-gel solutions. MOD process challenges include large quantities of carbon to be decomposed during the firing, shrinkage and stress of the thin films, variable chemistry in synthesis of the starting materials (especially when the starting materials for the MOD precursors are metal alkoxides), and long reaction times for the synthesis. For both the sol-gel and MOD precursors, toxic and volatile organic chemical (VOC's) solvents are employed as the vehicle. This paper will review the chemistry-related issues to production of consistent high-quality metal oxide films via the MOD process. The fabrication of thin Ba(x)Sr(1-x)TiO3 (BST) films is described. A new class of MOD precursor has been implemented using polyether acids as the organic vehicle. These new materials are both water stable and water soluble. High quality BST thin films made from these precursors are described and capacitors made from these films are compared to the aliphatic acid MOD materials. Improved capacitors using lower resistance electrodes and interconnects are described, as well as devices designed specifically for our specific application., This article is from the Materials Research Society symposium proceedings, v720 p23-28, 2002. Prepared in cooperation with Pennsylvania State Univ. University Park, PA; Univ. of Pittsburgh, Pittsburgh, PA. This article is from ADA410712 Materials Research Society Symposium Proceedings; Volume 720. Materials Issues for Tunable RF and Microwave Devices III Held in San Francisco, California on April 2-3, 2002