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1. Polymer self assembly in semiconductor microelectronics

6. Novel Fluoropolymers for Use in 157nm Lithography.

7. Development of 157 nm positive resists

8. Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems.

9. Progress in 193 nm Positive Resists.

11. Mechanistic Studies of the Acidolysis Reactions Occurring in Silicon-Containing Bilayer Photoresists

12. Experimental implementation of an adiabatic quantum optimization algorithm.

13. Experimental realization of Shor's quantum factoring algorithm using nuclear magnetic resonance.

14. Experimental realization of an order-finding algorithm with an NMR quantum computer.

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