145 results on '"Chi, D.Z."'
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2. Yb-doped WO3 photocatalysts for water oxidation with visible light
3. Semiconducting beta-phase FeSi2 for light emitting diode applications: Recent developments, challenges, and solutions
4. High quality Ge epitaxy on GaAs (100) grown by metal-organic chemical vapor deposition
5. Electrical properties and noise characterization of HfO2 gate dielectrics on strained SiGe layers
6. Fabricating high-quality GaN-based nanobelts by strain-controlled cracking of thin solid films for application in piezotronics
7. Thin Film Polycrystalline β-FeSi2/Si Heterojunction Solar Cells via Al Incorporation and Rapid Thermal Processing
8. Characterization of Y 2O 3 gate dielectric on n-GaAs substrates
9. HfAlO x high-k gate dielectric on SiGe: Interfacial reaction, energy-band alignment, and charge trapping properties
10. Deep level centers in InGaN/GaN heterostructure grown on sapphire and free-standing GaN
11. Addressing materials and integration issues for NiSi silicide contact metallization in nano-scale CMOS devices
12. Micro-Raman spectroscopic investigation of NiSi films formed on BF2 +-, B+- and non-implanted (100)Si substrates
13. Formation and Morphology Evolution of Nickel Germanides on Ge (100) under Rapid Thermal Annealing
14. Influence of Atomic Hydrogen on Nickel Silicide Formation
15. Effect of Ge-rich Si1−zGez Segregation on the Morphological Stability of NiSi1−uGeu Film Formed on Strained (001) Si0.8Ge0.2 Epilayer
16. Kinetics of NiSi-to-NiSi 2 transformation and morphological evolution in nickel silicide thin films on Si(0 0 1)
17. Effect of plasma process on low- k material and barrier layer performance
18. Enhanced morphological stability of NiGe films formed using Ni(Zr) alloy
19. Effects of Si(001) surface amorphization on ErSi 2 thin film
20. Electrical characterization of platinum and palladium effects in nickel monosilicide/n-Si Schottky contacts
21. Growth of high quality Er–Ge films on Ge(001) substrates by suppressing oxygen contamination during germanidation annealing
22. Erbium silicidation on SiGe for advanced MOS application
23. Metal-germanide Schottky Source/Drain transistor on Germanium substrate for future CMOS technology
24. Bulk instability of nickel disilicide at reduced temperatures
25. Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process
26. Near-surface defects in hydrogen-plasma-treated boron-doped silicon studied by positron beam spectroscopy
27. Enhanced stability of Ni monosilicide on MOSFETs poly-Si gate stack
28. Probing Effects of Etching Plasmas on the Properties of Porous Low-k Dielectrics
29. DLTS characterisation of InGaAlP films grown using different V/III ratios
30. Study of electrically active defects in n-GaN layer
31. Optical and electrical characterization of sputter-deposited Fe[Si.sub.2] and its evolution with annealing temperature
32. Assignment of deep levels causing yellow luminescence in GaN
33. Influence of the polarization on interfacial properties in Al/SiO2/GaN/Al(sub sub 0.4Ga(sub 0.6)N/GaN heterojunction metal-insulator-semiconductor structures
34. Reverse current transport mechanism in shallow junctions containing silicide spikes
35. Electron-beam-induced carbon deposition on high-indium-content AlInN thin films grown on Si by sputtering at elevated temperature
36. P-type Ge epitaxy on GaAs (100) substrate grown by MOCVD
37. Effects of temperature and LT-ZnO template on structural and optical properties of thermal-evaporation deposited ZnO submicron crystals
38. Ultra-Sensitive 2D Photodetectors Based on Large-Scale Molybdenum Disulfide Crystals
39. Influence of interleukin-1β and interleukin-6 gene polymorphisms on the development of acute pancreatitis
40. Effects of lift-off and strain relaxation on optical properties of InGaN/GaN blue LED grown on 150mm diameter Si (111) substrate
41. Probing the growth of β‐FeSi2 nanoparticles for photovoltaic applications: a combined imaging and spectroscopy study using transmission electron microscopy
42. HfAlOx high-k gate dielectric on SiGe: Interfacial reaction, energy-band alignment, and charge trapping properties
43. Characterization of Y2O3 gate dielectric on n-GaAs substrates
44. Schottky barrier height in germanide/Ge contacts and its engineering through germanidation induced dopant segregation
45. Silicon Nanowire Schottky Barrier NMOS Transistors
46. Effects of Si(001) surface amorphization on ErSi2 thin film
47. Improved electrical performance of erbium silicide Schottky diodes formed by Pre-RTA amorphization of Si
48. Ni(alloy)-germanosilicide contact technology for Si1-xGex (x=0.20-0.5) junctions
49. Material and Electrical Characterization of Ni- and Pt-Germanides for p-channel Germanium Schottky Source/Drain Transistors
50. Study of Ta-barrier and pore sealing dielectric layer interaction for enhanced barrier performance of Cu/ultralow /spl kappa/(/spl kappa/<2.2) interconnects
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