129 results on '"Chiu, Fu-Chien"'
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2. Trap characterization and conductance quantization in phosphorus-doped ZnO memory devices
3. Efficient Recognition of Facial Expression with Lightweight Octave Convolutional Neural Network
4. Optimization of Photobiomodulation Dose in Biological Tissue by Adjusting the Focal Point of Lens
5. Structural properties and electrical characteristics of high-k Dy2O3 gate dielectrics
6. Structural and electrical properties of thin Ho 2O 3 gate dielectrics
7. Reliability characteristics and conduction mechanisms in resistive switching memory devices using ZnO thin films
8. Voltage stress induced interface states and hole trapping in germanium pMOSFETs with high-k gate dielectric and metal-gate electrode
9. Advance in next Century nanoCMOSFET research
10. New Metal-High-k-High-k-Oxide-Semiconductor Capacitors and Field Effect Transistors Using Al/Y2O3/Ta2O5/SiO2/Si Structure for Nonvolatile Memory Applications
11. Temperature and Thickness Dependence of Cerium Oxide Dielectric Breakdown
12. Stress-Induced Leakage Current and Charge Trapping in Cerium Dioxide Thin Film
13. The electrical properties of Metal–Ferroelectric (PbZr0.53Ti0.47O3)–Insulator–Silicon (MFIS) capacitors with different insulator materials
14. Electrical properties of metal–HfO 2–silicon system measured from metal–insulator–semiconductor capacitors and metal–insulator–semiconductor field–effect transistors using HfO 2 gate dielectric
15. Leakage currents in amorphous Ta2O5 thin films
16. Design optimization of ESD protection and latchup prevention for a serial I/O IC
17. Lossy Mode Resonance-Based Glucose Sensor with High-κ Dielectric Film
18. Reliability characterization of stress-induced charge trapping in HfO2 by electrostatic discharge impulse stresses.
19. Current conduction mechanisms in Pr2O3/oxynitride laminated gate dielectrics.
20. Electrical characterization and current transportation in metal/Dy2O3/Si structure.
21. Interface characterization and carrier transportation in metal/HfO2/silicon structure.
22. Electron conduction mechanism and band diagram of sputter-deposited Al/ZrO2/Si structure.
23. Inserted substrate pickup style with external resistance in an ESD NMOS transistor
24. Leakage currents in amorphous Ta[sub 2]O[sub 5] thin films.
25. A Review on Conduction Mechanisms in Dielectric Films
26. Analysis of breakdown characteristics in high-k dielectrics under electrostatic discharge impulse stress.
27. Trap Exploration in Amorphous Boron-Doped ZnO Films
28. Resistive Switching Characteristics in Boron Doped Zinc Oxide Films
29. A Split Island Layout Style of Butting/Inserted Substrate Pickups for NMOSFET ESD Reliability
30. Conduction Mechanisms in Resistance Switching Memory Devices Using Transparent Boron Doped Zinc Oxide Films
31. Structural properties and electrical characteristics of high-k GdTiO3 gate dielectrics for InGaZnO thin-film transistors
32. Effect of titanium content on the impedance characteristics of high-Κ TbTxOy electrolyte-insulator-semiconductor pH sensors
33. Negative resistance characterisation and defective trap exploration in ZnO nonvolatile memory devices
34. Thin Film Applications in Advanced Electron Devices
35. Electrical analyses of charge trapping and stress-induced leakage current in CeO2gate dielectric
36. Resistance Switching Characteristics in ZnO-Based Nonvolatile Memory Devices
37. Trap exploration of ZnO-based resistance switching memory devices
38. A Substrate-and-Gate Triggering NMOS Device for High ESD Reliability in Deep Submicrometer Technology
39. Surface State Capture Cross-Section at the Interface between Silicon and Hafnium Oxide
40. Charge-Trapping Devices Using Multilayered Dielectrics for Nonvolatile Memory Applications
41. ESD and Latchup Optimization of an Embedded-Floating-pMOS SCR-Incorporated BJT.
42. Structural and Electrical Characteristics of Alternative High‐ k Dielectrics for CMOS Applications
43. Conduction mechanism of resistive switching films in MgO memory devices
44. An SCR-Incorporated BJT Device for Robust ESD Protection With High Latchup Immunity in High-Voltage Technology
45. Metal–Oxide–High-$k$ -Oxide–Silicon Memory Device Using a Ti-Doped $\hbox{Dy}_{2}\hbox{O}_{3}$ Charge-Trapping Layer and $\hbox{Al}_{2}\hbox{O}_{3}$ Blocking Layer
46. Polarity of Bipolar Resistive Switching Characteristics in ZnO Memory Films
47. Structural and electrical properties of thin Ho2O3 gate dielectrics
48. Thickness and Temperature Dependence of Dielectric Reliability Characteristics in Cerium Dioxide Thin Film
49. Stress-Induced Leakage Current and Charge Trapping in Cerium Dioxide Thin Film
50. CeO2 Optical Properties and Electrical Characteristics
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