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The radical structures and stabilization energies of C-H bond dissociation in alkyl amines was examined to provide theoretical investigations to previous related studies. Photoacoustic calorimetry in benzene solvent was used to determine the AlphaC-H bond dissociation energies of trimethylamine, triethylamine, tri-n-butylamine and secondary amines. Results revealed that alkylamines adopt a conformation with at least one C-H bond. Furthermore, the stable carbon-centered Alpha-to-N free radical is derived by abstracting the H atom.

Fourier transform infrared and X-ray photoelectron spectroscopies and X-ray reflectometry help characterize ultrathin as-grown and annealed anodic silicon oxide films. Potentiostatically grown and annealed oxides have the best physical properties. The grown silicon oxide films contain silanol and water at levels of 3.8 plus or minus 0.3% and H2O levels of 5.0 plus or minus 0.4%.

Laser flash photolysis of cis- and trans-2, 3-di(1'-naphthyl)oxiranes in fluid solutions reveals the behavior of their carbonyl ylides and their photoproduct formation. Triplet sensitization in acetonitrile and benzene yields naphthalene-like triplet precursors to short-lived (40-70 ns) ylides. In contrast, direct photolysis does not yield any triplet oxirane but only ylides with shorter (14-22 ns) lifespans produced by one-bond fragmentation. Direct excitation also forms 1-naphthaldehyde and 1-naphthylcarbene. Other aspects of the results from the two photochemical paths are discussed.