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Dissociated a-type screw dislocations in gallium nitride, comprising pairs of 30° Shockley partial dislocations separated by I2 basal stacking faults, were observed by aberration-corrected high resolution transmission electron microscopy (HRTEM). HRTEM image simulations, in conjunction with density functional theory calculations, led to the identification of the core structures of the Shockley partials. Both partials were found to belong to the glide set rather than the shuffle one, while the core with gallium polarity is reconstructed, but the one with nitrogen polarity is not. During in situ irradiation by the electron beam, the I2 stacking fault ribbon was found to shrink, ultimately leading to a remerging of the two partials. This reversal of the dissociation reaction was attributed to recombination enhanced dislocation glide, whereby the Shockley partial with nitrogen polarity was identified to be the mobile one. A possible model explaining this mobility is proposed comprising a local modification of the dislocation's electronic structure due to the presence of nitrogen vacancies at its core. [ABSTRACT FROM AUTHOR]

Extensive high resolution transmission and scanning transmission electron microscopy observations were performed in In(Ga)N/GaN multi-quantum well short period superlattices comprising two-dimensional quantum wells (QWs) of nominal thicknesses 1, 2, and 4 monolayers (MLs) in order to obtain a correlation between their average composition, geometry, and strain. The high angle annular dark field Z-contrast observations were quantified for such layers, regarding the indium content of the QWs, and were correlated to their strain state using peak finding and geometrical phase analysis. Image simulations taking into thorough account the experimental imaging conditions were employed in order to associate the observed Z-contrast to the indium content. Energetically relaxed supercells calculated with a Tersoff empirical interatomic potential were used as the input for such simulations. We found a deviation from the tetragonal distortion prescribed by continuum elasticity for thin films, i.e., the strain in the relaxed cells was lower than expected for the case of 1 ML QWs. In all samples, the QW thickness and strain were confined in up to 2 ML with possible indium enrichment of the immediately abutting MLs. The average composition of the QWs was quantified in the form of alloy content. [ABSTRACT FROM AUTHOR]

We present that the ultra-violet emission of ZnO can be enhanced, as much as six-times its integral intensity, using an Al thin interlayer film between the Si substrate and ZnO thin film and a postfabrication laser annealing process. The laser annealing is a cold process that preserves the chemical state and integrity of the underlying aluminum layer, while it is essential for the improvement of the ZnO performance as a light emitter and leads to enhanced emission in the visible and in the ultraviolet spectral ranges. In all cases, the metal interlayer enhances the intensity of the emitted light, either through coupling of the surface plasmon that is excited at the Al/ZnO interface, in the case of light-emitting ZnO in the ultraviolet region, or by the increased back reflection from the Al layer, in the case of the visible emission. In order to evaluate the process and develop a solid understanding of the relevant physical phenomena, we investigated the effects of various metals as interlayers (Al, Ag, and Au), the metal interlayer thickness, and the incorporation of a dielectric spacer layer between Al and ZnO. Based on these experiments, Al emerged as the undisputable best choice of metal interlayers because of its compatibility with the laser annealing process, as well as due to its high optical reflectivity at 380 and 248 nm, which leads to the effective coupling with surface plasmons at the Al/ZnO interfaces at 380 nm and the secondary annealing of ZnO by the backreflected 248 nm laser beam. [ABSTRACT FROM AUTHOR]

The morphology, nanostructure, and strain properties of InAs quantum dots (QDs) grown on GaAs(211)B, uncapped or buried, are explored by transmission electron microscopy and related quantitative techniques. Besides the built-in piezoelectric field, other differences of (211) growth compared to (100)-oriented growth are discussed in terms of the (211) surface non-singularity, leading to anisotropic shape of the QDs and local chemical inhomogeneity of the wetting layer. The shape of the uncapped QDs was precisely defined as truncated pyramidal, elongated along the (111) direction, and bounded by the {110}, {100}, and {213} facets. Local strain measurements showed that large surface QDs were almost unstrained due to plastic relaxation, exhibiting small residual elastic strain at the interface that gradually diminished toward their apex. Conversely, buried QDs were pseudomorphically grown on GaAs. By postulating a plane stress state, we have established a systematic increase of the local strain from the base toward the apex region of the QDs. Using Vegard's law, their chemical composition profiles were calculated, revealing an indium content gradient along the growth direction and compositional variants among different QDs. Photoluminescence measurements showed variations in emission energy between the QDs and consistency with a graded In-content, which complied with the quantitative strain analysis. [ABSTRACT FROM AUTHOR]

We investigate the structural properties of a series of high alloy content InGaN epilayers grown by plasma-assisted molecular beam epitaxy, employing the deposition temperature as variable under invariant element fluxes. Using transmission electron microscopy methods, distinct strain relaxation modes were observed, depending on the indium content attained through temperature adjustment. At lower indium contents, strain relaxation by V-pit formation dominated, with concurrent formation of an indium-rich interfacial zone. With increasing indium content, this mechanism was gradually substituted by the introduction of a self-formed strained interfacial InGaN layer of lower indium content, as well as multiple intrinsic basal stacking faults and threading dislocations in the rest of the film. We show that this interfacial layer is not chemically abrupt and that major plastic strain relaxation through defect introduction commences upon reaching a critical indium concentration as a result of compositional pulling. Upon further increase of the indium content, this relaxation mode was again gradually succeeded by the increase in the density of misfit dislocations at the InGaN/GaN interface, leading eventually to the suppression of the strained InGaN layer and basal stacking faults. [ABSTRACT FROM AUTHOR]

The spontaneous growth of GaN nanopillars (NPs) by direct plasma-assisted molecular beam epitaxy on nitridated r-plane sapphire substrates has been studied. The emanation of metal-polarity NPs from inside an a-plane nonpolar GaN film was found to depend on both the substrate nitridation and the growth conditions. The density of NPs increased with increasing the duration of the nitridation process and the power applied on the radio-frequency plasma source, as well as the III/V flux ratio, while variation of the first two parameters enhanced the roughness of the substrate's surface. Transmission electron microscopy (TEM) techniques were employed to reveal the structural characteristics of the NPs and their nucleation mechanism from steps on the sapphire surface and/or interfacial semipolar GaN nanocrystals. Lattice strain measurements showed a possible Al enrichment of the first 5-6 monolayers of the NPs. By combining cross-sectional and plan-view TEM observations, the three-dimensional model of the NPs was constructed. The orientation relationship and interfacial accommodation between the NPs and the nonpolar a-plane GaN film were also elucidated. The NPs exhibited strong and narrow excitonic emission, suggesting an excellent structural quality. [ABSTRACT FROM AUTHOR]

Angular-dependent polarized Raman spectroscopy was utilized to study nonpolar a-plane (11120) and semipolar s-plane (10111) InN epilayers. The intensity dependence of the Raman peaks assigned to the vibrational modes A1(TO), E1(TO), and Eh 2 on the angle w that corresponds to rotation around the growth axis, is very well reproduced by using expressions taking into account the corresponding Raman tensors and the experimental geometry, providing thus a reliable technique towards assessing the sample quality. The s- and a-plane InN epilayers grown on nitridated r-plane sapphire (Al2O3) exhibit good crystalline quality as deduced from the excellent fitting of the experimental angle-dependent peak intensities to the theoretical expressions as well as from the small width of the Raman peaks. On the contrary, in the case of the s-plane epilayer grown on non-nitridated r-plane sapphire, fitting of the angular dependence is much worse and can be modeled only by considering the presence of two structural modifications, rotated so as their c-axes are almost perpendicular to each other. Although the presence of the second variant is verified by transmission electron and atomic force microscopies, angular dependent Raman spectroscopy offers a nondestructive and quick way for its quantification. Rapid thermal annealing of this sample did not affect the angular dependence of the peak intensities. The shift of the E1(TO) and Eh 2 Raman peaks was used for the estimation of the strain state of the samples. [ABSTRACT FROM AUTHOR]

Heteroepitaxial non-polar III-Nitride layers may exhibit extensive anisotropy in the surface morphology and the epilayer microstructure along distinct in-plane directions. The structural anisotropy, evidenced by the "M"-shape dependence of the (11̄20) x-ray rocking curve widths on the beam azimuth angle, was studied by combining transmission electron microscopy observations, Raman spectroscopy, high resolution x-ray diffraction, and atomic force microscopy in a-plane GaN epilayers grown on r-plane sapphire substrates by plasma-assisted molecular beam epitaxy (PAMBE). The structural anisotropic behavior was attributed quantitatively to the high dislocation densities, particularly the Frank-Shockley partial dislocations that delimit the I1 intrinsic basal stacking faults, and to the concomitant plastic strain relaxation. On the other hand, isotropic samples exhibited lower dislocation densities and a biaxial residual stress state. For PAMBE growth, the anisotropy was correlated to N-rich (or Ga-poor) conditions on the surface during growth, that result in formation of asymmetric a-plane GaN grains elongated along the c-axis. Such conditions enhance the anisotropy of gallium diffusion on the surface and reduce the GaN nucleation rate. [ABSTRACT FROM AUTHOR]

Observations of easy transition between nonpolar and semipolar orientations during III-Nitride heteroepitaxy identify the 90o <[formula]> rotation relationship as being very important in defining this coexistence. A rigorous analysis of this relationship using the topological theory of interfaces showed that it leads to a high order of coincident symmetry and makes energetically favorable the appearance of the intergranular boundaries. Principal low-energy boundaries, that could also be technologically exploited, have been identified by high-resolution transmission electron microscopy (HRTEM) observations and have been studied energetically using empirical potential calculations. It is also shown that these boundaries can change their average orientation by incorporating disconnections. The pertinent strain relaxation mechanisms can cause such boundaries to act as sources of threading dislocations and stacking faults. The energetically favorable ([formula]) || (0001) boundary was frequently observed to delimit m-plane crystallites in ([formula]) semipolar growth. [ABSTRACT FROM AUTHOR]

The structural characteristics of ZnO nanocrystals epitaxially grown on p-type (0001) 4H-SiC substrates were studied by transmission electron microscopy (TEM). The nanocrystallites were grown by atmospheric-pressure metalorganic chemical vapor deposition. The ZnO nanocrystals were formed at terraces introduced by vicinal 4H-SiC substrates toward the [[formula]] direction. They had the shape of hexagonal nanopillars, with their edges parallel to the <[formula]> directions and a top c-plane facet, reflecting the crystal symmetry of ZnO. The free surface between the hexagonal nanopillars was covered by a very thin and highly defected epitaxial ZnO film, which strongly suggests the Stranski-Krastanov mode of growth. The ZnO/SiC interface was systematically studied by plane view TEM and cross sectional high resolution TEM. The residual strain in the thin continuous film as well as in the nanopillars was estimated from Moiré patterns and by geometrical phase analysis. ZnO was also deposited on the SiO2/Si substrate for comparison. The films were polycrystalline exhibiting strong preferred orientation, with the c-axes of the grains almost perpendicular to the substrate resulting in the formation of nanopillars. The differences of nanopillar formation in the two substrates, 4H-SiC and SiO2 is also discussed. [ABSTRACT FROM AUTHOR]

GaN quantum dots (QDs) grown in semipolar [formula] AlN by plasma-assisted molecular-beam epitaxy were studied by transmission electron microscopy (TEM) and scanning transmission electron microscopy techniques. The embedded [formula]-grown QDs exhibited pyramidal or truncated-pyramidal morphology consistent with the symmetry of the nucleating plane, and were delimited by nonpolar and semipolar nanofacets. It was also found that, in addition to the [formula] surface, QDs nucleated at depressions comprising [formula] facets. This was justified by ab initio density functional theory calculations showing that such GaN/AlN facets are of lower energy compared to [formula]. Based on quantitative high-resolution TEM strain measurements, the three-dimensional QD strain state was analyzed using finite-element simulations. The internal electrostatic field was then estimated, showing small potential drop along the growth direction, and limited localization at most QD interfaces. [ABSTRACT FROM AUTHOR]

We study the influence of the heteroepitaxial interface on the defect content of nonpolar a-plane GaN grown on r-plane sapphire, using transmission electron microscopy techniques and the topological theory of interfacial defects. The structural mismatch is accommodated in different ways along distinct in-plane directions. For the misfit along the [0001] direction of GaN, the I1 basal stacking faults constitute the principal relaxation mechanism, through their delimiting partial dislocations. The misfit along [1100] is relaxed by misfit dislocations that have out-of-plane Burgers vectors causing rotational misorientations of the epilayer about [0001]. These misorientations lead to the introduction of low-angle tilt grain boundaries which are defect sources through their associated primary lattice dislocations. Furthermore, semipolar nanocrystals can nucleate on sapphire p-plane nanofacets, causing the introduction of threading dislocations (TDs) and stacking faults, when these nanocrystals are overgrown by the nonpolar epilayer. The semipolar nanocrystals bear a high-symmetry 90° [1210] orientation relative to the nonpolar epilayer. The interfacial dislocations at the nonpolar/semipolar boundaries have suitable Burgers vectors to become TDs. These grain boundaries also promote the introduction of stacking faults and pockets of cubic GaN. The coexistence of semipolar orientation variants leads to twin boundaries and associated dislocations. [ABSTRACT FROM AUTHOR]