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32 results on '"Ding, Chenliang"'

7. Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Author

Ding, Chenliang, primary, Liu, Xi, additional, Liu, Qiulan, additional, Zhu, Dazhao, additional, Luo, Mengdi, additional, Gao, XiuJun, additional, Yang, Zhenyao, additional, Sun, Qiuyuan, additional, Qian, Quanli, additional, Shen, Xiaoming, additional, Cao, Chun, additional, You, Shangting, additional, Xu, Liang, additional, He, Minfei, additional, Liu, Yong, additional, Kuang, Cuifang, additional, and Liu, Xu, additional

Published
2023
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8. Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition.

Author

Ding, Chenliang, Liu, Xi, Liu, Qiulan, Zhu, Dazhao, Luo, Mengdi, Gao, XiuJun, Yang, Zhenyao, Sun, Qiuyuan, Qian, Quanli, Shen, Xiaoming, Cao, Chun, You, Shangting, Xu, Liang, He, Minfei, Liu, Yong, Kuang, Cuifang, and Liu, Xu

Subjects
*NANOLITHOGRAPHY, *ACHROMATISM, *PHOTONIC crystals, *ABSORPTION, *LITHOGRAPHY
Abstract

Improving the 3D resolution is a decisive step in the transition of direct laser writing from being limited to research use to being a powerful tool. Three‐color (3CL) lithography is expected to result in significantly higher resolution with two‐color lasers initiating polymerization in two steps and one‐color laser inhibiting polymerization. However, the 3CL process increases the complexity of the system and makes the influence of chromatic aberration worse which leads to non‐ideal writing results, which is ≈80 nm linewidth (≈λ/10) at present. In this study, the 3CL lithography is improved by introducing almost one color (1CL) instead of three colors to achieve subdiffraction 3D nanolithography based on two‐photon two‐step absorption and photoinhibition (T2A‐PI). Using benzil as a photoinitiator, a sub‐30 nm (<λ/17.5) lateral feature size, minimum 80 nm lateral, and 160 nm axial pitches are achieved, which, to our knowledge, is the best to be fabricated using the laser in the visible region. 3D woodpile photonic crystals and other high‐quality nanostructures are fabricated, demonstrating the unique advantages over existing direct laser writing technologies. [ABSTRACT FROM AUTHOR]

Published
2024
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18. Direct laser writing breaking diffraction barrier based on two-focus parallel peripheral-photoinhibition lithography

Author

Zhu, Dazhao, primary, Xu, Liang, additional, Ding, Chenliang, additional, Yang, Zhenyao, additional, Qiu, Yiwei, additional, Cao, Chun, additional, He, Hongyang, additional, Chen, Jiawei, additional, Tang, Mengbo, additional, Zhan, Lanxin, additional, Zhang, Xiaoyi, additional, Sun, Qiuyuan, additional, Ma, Chengpeng, additional, Wei, Zhen, additional, Liu, Wenjie, additional, Fu, Xiang, additional, Kuang, Cuifang, additional, Li, Haifeng, additional, and Liu, Xu, additional

Published
2022
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23. 高速并行双光子激光直写光刻系统

Author

Wang Hongqing, 王洪庆, primary, Wen Jisen, 温积森, additional, Yang Zhenyao, 杨臻垚, additional, Tang Mengbo, 汤孟博, additional, Sun Qiuyuan, 孙秋媛, additional, Ma Chengpeng, 马程鹏, additional, Wang Ziang, 王子昂, additional, Zhan Lanxin, 詹兰馨, additional, Zhang Xiaoyi, 张晓依, additional, Cao Chun, 曹春, additional, Shen Xiaoming, 沈小明, additional, Ding Chenliang, 丁晨良, additional, and Kuang Cuifang, 匡翠方, additional

Published
2022
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24. Super-resolution imaging based on the temperature-dependent electron-phonon collision frequency effect of metal thin films.

Author

Ding, Chenliang, Wei, Jingsong, and Xiao, Mufei

Subjects
*THIN films, *HIGH resolution imaging, *ELECTRON-phonon interactions, *ELECTROMAGNETIC interactions, *METALLIC films
Abstract

We herein propose a far-field super-resolution imaging with metal thin films based on the temperature-dependent electron–phonon collision frequency effect. In the proposed method, neither fluorescence labeling nor any special properties are required for the samples. The 100 nm lands and 200 nm grooves on the Blu-ray disk substrates were clearly resolved and imaged through a laser scanning microscope of wavelength 405 nm. The spot size was approximately 0.80 μ m , and the imaging resolution of 1/8 of the laser spot size was experimentally obtained. This work can be applied to the far-field super-resolution imaging of samples with neither fluorescence labeling nor any special properties. [ABSTRACT FROM AUTHOR]

Published
2018
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25. 高速并行双光子激光直写光刻系统

Author

王洪庆 Wang Hongqing, 温积森 Wen Jisen, 杨臻垚 Yang Zhenyao, 汤孟博 Tang Mengbo, 孙秋媛 Sun Qiuyuan, 马程鹏 Ma Chengpeng, 王子昂 Wang Ziang, 詹兰馨 Zhan Lanxin, 张晓依 Zhang Xiaoyi, 曹春 Cao Chun, 沈小明 Shen Xiaoming, 丁晨良 Ding Chenliang, and 匡翠方 Kuang Cuifang

Subjects
Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Published
2022

32. Sub-diffraction optical beam lithography based on a center-non-zero depletion laser.

Author

Su C, Ding C, Yang Z, Cao C, Qiu Y, Zhu D, Kuang C, and Liu X

Abstract

Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.

Published
2024
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