21 results on '"Dixit, Dhairya"'
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2. Characterization of Overlay and Tilt in Advanced Technology Nodes using Scatterometry
3. Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes
4. Correlation study of actual temperature profile and in-line metrology measurements for within-wafer uniformity improvement and wafer edge yield enhancement (Conference Presentation)
5. Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm
6. Advanced applications of scatterometry based optical metrology
7. Correlation study of actual temperature profile and in-line metrology measurements for within-wafer uniformity improvement and wafer edge yield enhancement.
8. Spectroscopic ellipsometry studies of 3-stage deposition of CuIn1−xGaxSe2 on Mo-coated glass and stainless steel substrates
9. Optical critical dimension metrology for directed self-assembly assisted contact hole shrink
10. Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology
11. Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
12. Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry
13. Optical CD metrology for directed self-assembly assisted contact hole shrink process
14. Mueller matrix optical scatterometry of Si fins patterned using directed self-assembly block copolymer line arrays
15. Metrology for directed self-assembly block lithography using optical scatterometry
16. Correlation study of actual temperature profile and in-line metrology measurements for within-wafer uniformity improvement and wafer edge yield enhancement (Conference Presentation)
17. Advanced applications of scatterometry based optical metrology
18. Optical CD metrology for directed self-assembly assisted contact hole shrink process
19. Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry
20. Metrology for directed self-assembly block lithography using optical scatterometry
21. Spectroscopic ellipsometry studies of 3-stage deposition of CuIn1 − xGaxSe2 on Mo-coated glass and stainless steel substrates.
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