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Objective. To study the association of CREB1 gene with depression and bipolar disorder type II. Methods. Three hundred and sixty-two patients with depression, 381 patients with bipolar disorder type II and 416 healthy subjects were included. There were no significant differences in gender, age and year of education between depression group, bipolar disorder type II group and control group. Patients with severity of depression were evaluated by Hamilton Depression Rating Scale. Hypomania Check List-32 was used to screen the history of hypomanic episode of patients with depression and patients with bipolar disorder type II. A total of 2 mL of venous blood was collected from each subject, and whole genome of peripheral blood leukocyte DNA was extracted using a centrifugal column genomic DNA kit. Single nucleotide polymorphism (SNP) genotyping of SNaPshot was used to identify the rs10932201 and rs3770704 loci of CREB1 gene, and the effects of SNP on CREB1 expression in brain were analyzed using BRAINEAC database. Results. The genotypes of rs10932201 and rs3770704 of CREB1 gene in the depression group, bipolar disorder type II group and control group were well matched with Hardy-Weinberg equilibrium (P>0.05). Linkage disequilibrium analysis showed that there was a strong linkage disequilibrium between rs10932201 and rs3770704 (r²>0.4). At the rs10932201 locus of CREB1 gene, there was a significant difference in allelic frequency between the bipolar disorder type II group and the control group (χ²=4.27, P=0.042); there was no difference in allelic frequency between the depression group and the control group. There were no significant differences in either allelic or genotypic frequency of rs3770704 of CREB1 gene in the depression group and bipolar disorder type II group compared with the control group. In the haplotype constructed between rs10932201 and rs3770704 of CREB1 gene, the frequency of haplotype A-T in the bipolar disorder type II group was 57.5%, which was statistically significant (χ²=4.07,P=0.044). Expression quantitative trait loci analysis showed that rs10932201 was associated with CREB1 gene expression in temporal cortex (P=0.048). Conclusion. The rs10932201 of CREB1 gene is associated with bipolar disorder type II, and may be a risk factor for bipolar disorder type II, not depression. [ABSTRACT FROM AUTHOR]

Objective · To explore the relationship between serum interleukin-6 (IL-6) level and depressive symptoms in schizophrenia. Methods · A total of 239 patients with schizophrenia treated with olanzapine alone for more than 2 years were enrolled. Calgary Depression Scale for Schizophrenia (CDSS) was used to evaluate the depression level of the patients, and they were divided into depression group and non-depression group. Positive and Negative Syndrome Scale (PANSS) was used to evaluate the mental symptoms of patients. Serum IL-6 levels were measured by enzyme linked immunosorbent assay (ELISA), and the differences between the two groups were compared. Pearson correlation analysis was used to analyze the relationship between serum IL-6 level and CDSS score. Results · According to the results of CDSS, the patients were divided into depression group (119 cases) and non-depression group (120 cases). Compared with the non-depression group, the PANSS negative symptom subscale score and serum IL-6 level of patients in the depression group were higher (P=0.028, P=0.000). Pearson correlation analysis showed that serum IL-6 level was positively correlated with CDSS score in the depression group patients (r=0.42, P=0.000). Conclusion · The increase of serum IL-6 level may be related to the occurrence of schizophrenia with depression symptoms. [ABSTRACT FROM AUTHOR]

Objective: To compare the clinical efficacy of minimally invasive percutaneous plate osteosynthesis(MIPPO)and open reduction and internal fixation (ORIF) in treating senile NEER IIproximal humerus fractures., Methods: From March 2014 to March 2016, 46 elderly patients with Neer II proximal humerus fractures were retrospectively reviewed. Among them, 20 patients in MIPPO group included 9 males and 11 females with an average age of (70.4±4.4) years old; while 26 patients in ORIF group included 11 males and 15 females with an average age of (70.9±4.0) years old. The length of hospital stay, times of fluoroscopy, beginning time of function rehabilitation, healing time of fracture, Constant Murley score of the shoulder joint at 3, 6, 12 months after operation and complications were observed and compared., Results: All patients were followed up for 12 to 24 months with an average of 16.8±3.7. The healing time of fracture, beginning time of function rehabilitation in MIPPO group were(13.0±0.8) weeks, (3.0±0.9) days respectively and shorter than those in ORIF group which were (13.8±1.4) weeks and(6.8±1.3) days. The times of fluoroscopy in MIPPO group was 19.2±3.7 and more than that in ORIF group which was 12.1±3.4. At 3 and 6 months after operation, Constant Murley score in MIPPO group were 81.3±3.9, 86.6±5.4 and more than that in ORIF group which were 69.5±6.6, 80.5±6.7. There were no differences between two groups in the length of hospital stay, Constant Murley score at 12 months after operation and grading at the final follow-up. There was one fracture redisplacement in each group. And 1 case of axillary nerve injury in MIPPO group, 2 cases of delayed union in ORIF group. No incision infection, screw loosening or plate break was found., Conclusions: MIPPO and ORIF are both effective in treating Neer II proximal humeral fractures. MIPPO technique has the advantages of faster recovery, earlier rehabilitative exercise and better shoulder function. The disadvantages are more exposure to radiationd and the possibility of axillary nerve injure., Competing Interests: The authors of this article and the planning committee members and staff have no relevant financial relationships with commercial interests to disclose., (Copyright© 2018 by the China Journal of Orthopaedics and Traumatology Press.)

The research and development of the KTP crystal with high threshold is of very importance for its application in high-energy laser systems. Ablation characteristics in KTP crystal as well as their influence on the Raman spectroscopy were studied by UV laser with high repetition frequency. The research results show that the laser plasma effects are the main reasons for the damage in the KTP crystal. The inverse bremsstrahlung absorption effect can increase the deposition of the laser pulse energy greatly; the ionization effect can make the crystal dislocated completely; shock wave effect can push away the mixture of melted, vaporized and ionized materials and cause cracks in the pit. Through investigation and comparison of the Raman spectroscopy before and after the laser ablation, it was found that the distribution characteristics of Raman peaks are almost the same, suggesting that the basic structures of KTP crystal do not change. But almost all the Raman characteristic peaks' R1R values have changed and the widths are broadened, which means that the crystalline degree has been decreased. The Raman peaks of TiO6 and PO4 oxygen polyhedron shift to the lower wave number, which indicates that bonding force becomes weaker and the KTP crystal can be damaged easily.

Optical components with higher surface quality and higher damage threshold requirement are necessary in high-energy/power laser system, which strongly depends on the performance of optical thin films. The damage morphologies on the surface of the HfO2/SiO2 anti-reflection film, caused by focused laser pulses, were investigated in the present paper. The studies revealed that the shock wave formed with the expansion of laser plasma, and its velocity and pressure decease rapidly with the radius. The spectrum of laser plasma, recorded by EEP2000 spectrometer, shows that the wavelength of laser plasma radiation is shorter than incident laser, which will increase the probability of multi-photon absorption; the photon energy in deep ultraviolet region, higher than the band gap of HfO2, can be absorbed directly. The ionization effect of laser plasma can easily induce film damage. The combination of shock wave and ionization effect determines the damage morphology of films. In the case of laser pulse focused on the film surface, the radiation and shock wave effects are the highest, not only the film is removed, but also the quartz substrate is broken-down. When the focus point is away from the film surface to a certain distance, the radiation of laser plasma and shock wave decrease rapidly, as a result, no damage can be found except that the thin-film can be peeled away from the substrate.

Silicon is the basic material for electro-photonic detectors, so the studies of the laser induced damage of silicon are of great significance in laser detecting and military applications. The damage characters of silicon under high intensity nanosecond laser pulses were investigated in the present paper. The results show that laser plasma has thermal effect, shock effect and spectral radiation effect, etc. These comprehensive effects combined together determinate the damage characters. By thermal effects and shock effects of laser plasma, the material is being melt, vaporized, ionized and pushed out at the laser irradiated area. In this way, the pit can be formed and the cooled ejected effluents are radially distributed. The silicon was melt at the bottom of the pit and the temperature was modulated by the intensity of the incident laser, which interfered with scattering laser simultaneously. The periodic heat distribution generates the period stripes. N, O and Si characteristic spectrum in the laser plasma prove that the colored film is the mixture of SiOx:SiNy which were sprayed out from laser plasma under repetitive laser pulses.