438 results on '"Fogarassy, E."'
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2. Modeling of CW laser diode irradiation of amorphous silicon films
3. Pulsed Excimer Laser Crystallization and Doping for the Fabrication of Poly-Si and -SiGe TFTs
4. Fabrication and investigation of 1D and 2D structures in LiNbO 3 thin films by pulsed laser ablation
5. Dopant diffusion and activation induced by sub-melt laser anneal within the co-implanted p+ polycrystalline silicon gate used in CMOS technologies
6. Treatment of high arsenic content wastewater by membrane filtration
7. Optical–thermal simulation applied to the study of the pattern effects induced by the sub-melt laser anneal process in advanced CMOS technologies
8. Simulation of the sub-melt laser anneal process in 45 CMOS technology—Application to the thermal pattern effects
9. Micro structuring of LiNbO 3 by using nanosecond pulsed laser ablation
10. Fabrication of p+/n Ultra Shallow Junctions (USJ) in silicon by excimer laser doping from spin-on glass sources
11. Field emission properties of a-CNx films prepared by pulsed laser deposition
12. Mechanisms and application of the Excimer laser doping from spin-on glass sources for USJ fabrication
13. Diode laser soldering using a lead-free filler material for electronic packaging structures
14. Thermal stability of amorphous carbon films deposited by pulsed laser ablation
15. Chemical analysis of a-CNx thin films synthesized by nanosecond and femtosecond pulsed laser deposition
16. Super-lateral-growth regime analysis in long-pulse-duration excimer-laser crystallization of a-Si films on SiO2
17. Introduction to the Laser Processing of Materials
18. Long Pulse Excimer Laser Doping of Silicon and Silicon Carbide for High Precision Junction Fabrication
19. The effects of KrF pulsed laser and thermal annealing on the crystallinity and surface morphology of radiofrequency magnetron sputtered ZnS:Mn thin films deposited on Si
20. Vacuum Ultraviolet and Visible Optical Emission Spectra from Laser Ablation of Graphite at 193 NM: Application to Carbon Nitride Thin Films Deposition
21. Raman investigation of submicro-grained Si films obtained by incoherent UV photo-CVD of silicon hydrides
22. Number density and size distribution of droplets in KrF excimer laser deposited boron carbide films
23. Pulsed laser crystallization of hydrogen-free a-Si thin films for high-mobility poly-Si TFT fabrication
24. Spectroscopic study of the vacuum ultraviolet windowless photodissociation of silicon hydrides for silicon-based film deposition
25. The combined effect of laser fluence and target deterioration in determining the chemical composition of pulsed laser deposited boron carbide films
26. Low-temperature synthesis of silicon oxide, oxynitride, and nitride films by pulsed excimer laser ablation
27. Properties of silicon dioxide films prepared by pulsed-laser ablation
28. On the growth mechanism of pulsed laser deposited carbon nitride films
29. Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics
30. Morphological study of PLD grown carbon films
31. Interference microscopy for nanometric surface microstructure analysis in excimer laser processing of silicon for flat panel displays
32. Long-pulse duration excimer laser annealing of Al + ion implanted 4H-SiC for pn junction formation
33. Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium
34. Polymer photoablation under windowless VUV hydrogen or helium discharge lamp
35. Correlation between surface oxygen content and microstructure of carbon nitride films
36. The effect of process parameters on the chemical structure of pulsed laser deposited carbon nitride films
37. Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy
38. Characterization of CN x films deposited by pulsed laser ablation using spectroscopic ellipsometry
39. Influence of the nitrogen content on the field emission properties of a-CN x films prepared by pulsed laser deposition
40. Morphology and composition of ArF excimer laser deposited carbon nitride films as determined by analytical TEM
41. Long-Pulse Duration Excimer Laser Processing in the Fabrication of High Performance Polysilicon TFTs for Large Area Electronics
42. Experimental and numerical analysis of surface melt dynamics in 200 ns-excimer laser crystallization of a-Si films on glass
43. Correlation between hydrogen content and structure of pulsed laser deposited carbon nitride films
44. Numerical and experimental analysis of pulsed excimer laser processing of silicon carbide
45. Dependence of nitrogen content and deposition rate on nitrogen pressure and laser parameters in ArF excimer laser deposition of carbon nitride films
46. Chemical analysis of pulsed laser deposited a-CNx films by comparative infrared and X-ray photoelectron spectroscopies
47. The effects of multiple KrF laser irradiations on the electroluminescence and photoluminescence of rf-sputtered ZnS:Mn-based electroluminescent thin film devices
48. Ablation study on pulsed KrF laser annealed electroluminescent ZnS:Mn/Y 2O 3 multilayers deposited on Si
49. A new process to manufacture thin SiGe and SiGeC epitaxial films on silicon by ion implantation and excimer laser annealing
50. Pulsed KrF laser annealing of RF sputtered ZnS:Mn thin films
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