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303 results on '"Fowlkes, Jason"'

1. Controlling hydrocarbon transport and electron beam induced deposition on single layer graphene: toward atomic scale synthesis in the scanning transmission electron microscope

Author

Dyck, Ondrej, Lupini, Andrew R., Rack, Philip D., Fowlkes, Jason, and Jesse, Stephen

Subjects
Condensed Matter - Materials Science, Physics - Applied Physics
Abstract

Focused electron beam induced deposition (FEBID) is a direct write technique for depositing materials on a support substrate akin to 3D printing with an electron beam (e-beam). Opportunities exist for merging this existing technique with aberration-corrected scanning transmission electron microscopy to achieve molecular- or atomic-level spatial precision. Several demonstrations have been performed using graphene as the support substrate. A common challenge that arises during this process is e-beam-induced hydrocarbon deposition, suggesting greater control over the sample environment is needed. Various strategies exist for cleaning graphene in situ. One of the most effective methods is to rapidly heat to high temperatures, e.g., 600 C or higher. While this can produce large areas of what appears to be atomically clean graphene, mobile hydrocarbons can still be present on the surfaces. Here, we show that these hydrocarbons are primarily limited to surface migration and demonstrate an effective method for interrupting the flow using e-beam deposition to form corralled hydrocarbon regions. This strategy is effective for maintaining atomically clean graphene at high temperatures where hydrocarbon mobility can lead to substantial accumulation of unwanted e-beam deposition.

Published
2023
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2. Doping transition-metal atoms in graphene for atomic-scale tailoring of electronic, magnetic, and quantum topological properties

Author

Dyck, Ondrej, Zhang, Lizhi, Yoon, Mina, Swett, Jacob L., Hensley, Dale, Zhang, Cheng, Rack, Philip D., Fowlkes, Jason D., Lupini, Andrew R., and Jesse, Stephen

Subjects
Condensed Matter - Materials Science
Abstract

Atomic-scale fabrication is an outstanding challenge and overarching goal for the nanoscience community. The practical implementation of moving and fixing atoms to a structure is non-trivial considering that one must spatially address the positioning of single atoms, provide a stabilizing scaffold to hold structures in place, and understand the details of their chemical bonding. Free-standing graphene offers a simplified platform for the development of atomic-scale fabrication and the focused electron beam in a scanning transmission electron microscope can be used to locally induce defects and sculpt the graphene. In this scenario, the graphene forms the stabilizing scaffold and the experimental question is whether a range of dopant atoms can be attached and incorporated into the lattice using a single technique and, from a theoretical perspective, we would like to know which dopants will create technologically interesting properties. Here, we demonstrate that the electron beam can be used to selectively and precisely insert a variety of transition metal atoms into graphene with highly localized control over the doping locations. We use first-principles density functional theory calculations with direct observation of the created structures to reveal the energetics of incorporating metal atoms into graphene and their magnetic, electronic, and quantum topological properties.

Published
2023
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3. Electron-beam Introduction of Heteroatomic Pt-Si Structures in Graphene

Author

Dyck, Ondrej, Zhang, Cheng, Rack, Philip D., Fowlkes, Jason D., Sumpter, Bobby, Lupini, Andrew R., Kalinin, Sergei V., and Jesse, Stephen

Subjects
Condensed Matter - Materials Science
Abstract

Electron-beam (e-beam) manipulation of single dopant atoms in an aberration-corrected scanning transmission electron microscope is emerging as a method for directed atomic motion and atom-by-atom assembly. Until now, the dopant species have been limited to atoms closely matched to carbon in terms of ionic radius and capable of strong covalent bonding with carbon atoms in the graphene lattice. In situ dopant insertion into a graphene lattice has thus far been demonstrated only for Si, which is ubiquitously present as a contaminant in this material. Here, we achieve in situ manipulation of Pt atoms and their insertion into the graphene host matrix using the e-beam deposited Pt on graphene as a host system. We further demonstrate a mechanism for stabilization of the Pt atom, enabled through the formation of Si-stabilized Pt heteroatomic clusters attached to the graphene surface. This study provides evidence toward the universality of the e-beam assembly approach, opening a pathway for exploring cluster chemistry through direct assembly., Comment: 23 pages, 6 figures

Published
2022
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4. Self-assembly of a drop pattern from a two-dimensional grid of nanometric metallic filaments

Author

Cuellar, Ingrith, Ravazzoli, Pablo D., Diez, Javier A., González, Alejandro G., Roberts, Nicholas A., Fowlkes, Jason D., Rack, Philip D., and Kondic, Lou

Subjects
Physics - Fluid Dynamics, Condensed Matter - Mesoscale and Nanoscale Physics
Abstract

We report experiments, modeling and numerical simulations of the self--assembly of particle patterns obtained from a nanometric metallic square grid. Initially, nickel filaments of rectangular cross section are patterned on a SiO$_2$ flat surface, and then they are melted by laser irradiation with $\sim 20$ ns pulses. During this time, the liquefied metal dewets the substrate, leading to a linear array of drops along each side of the squares. The experimental data provides a series of SEM images of the resultant morphology as a function of the number of laser pulses or cumulative liquid lifetime. These data are analyzed in terms of fluid mechanical models that account for mass conservation and consider flow evolution with the aim to predict the final number of drops resulting from each side of the square. The aspect ratio, $\delta$, between the square sides' lengths and their widths is an essential parameter of the problem. Our models allow us to predict the $\delta$-intervals within which a certain final number of drops are expected. The comparison with experimental data shows a good agreement with the model that explicitly considers the Stokes flow developed in the filaments neck region that lead to breakup points. Also, numerical simulations, that solve the Navier-Stokes equations along with slip boundary condition at the contact lines, are implemented to describe the dynamics of the problem.

Published
2018
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8. Growth diagram and magnetic properties of hexagonal LuFe$_2$O$_4$ thin films

Author

Wang, Wenbin, Gai, Zheng, Chi, Miaofang, Fowlkes, Jason D., Yi, Jieyu, Zhu, Leyi, Cheng, Xuemei, Keavney, David J., Snijders, Paul C., Ward, Thomas Z., Shen, Jian, and Xu, Xiaoshan

Subjects
Condensed Matter - Materials Science, Condensed Matter - Strongly Correlated Electrons
Abstract

A growth diagram of Lu-Fe-O compounds on MgO (111) substrates using pulsed laser deposition is constructed based on extensive growth experiments. The LuFe$_2$O$_4$ phase can only be grown in a small range of temperature and O$_2$ pressure conditions. An understanding of the growth mechanism of Lu-Fe-O compound films is offered in terms of the thermochemistry at the surface. Superparamagnetism is observed in LuFe$_2$O$_4$ film and is explained in terms of the effect of the impurity h-LuFeO$_3$ phase and structural defects .

Published
2012
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19. Controlling hydrocarbon transport and electron beam induced deposition on single layer graphene: Toward atomic scale synthesis in the scanning transmission electron microscope.

Author

Dyck, Ondrej, Lupini, Andrew R., Rack, Philip D., Fowlkes, Jason, and Jesse, Stephen

Subjects
HYDROCARBONS, ELECTRON beams, SCANNING transmission electron microscopy, THREE-dimensional printing, GRAPHENE
Abstract

Focused electron beam induced deposition (FEBID) is a direct write technique for depositing materials on a support substrate akin to 3D printing with an electron beam (e‐beam). Opportunities exist for merging this existing technique with aberration‐corrected scanning transmission electron microscopy to achieve molecular‐ or atomic‐level spatial precision. Several demonstrations have been performed using graphene as the support substrate. A common challenge that arises during this process is e‐beam‐induced hydrocarbon deposition, suggesting greater control over the sample environment is needed. Various strategies exist for cleaning graphene in situ. One of the most effective methods is to rapidly heat to high temperatures, for example, 600℃ or higher. While this can produce large areas of what appears to be atomically clean graphene, mobile hydrocarbons can still be present on the surfaces. Here, we show that these hydrocarbons are primarily limited to surface migration and demonstrate an effective method for interrupting the flow using e‐beam deposition to form corralled hydrocarbon regions. This strategy is effective for maintaining atomically clean graphene at high temperatures where hydrocarbon mobility can lead to substantial accumulation of unwanted e‐beam deposition. [ABSTRACT FROM AUTHOR]

Published
2022
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28. High-Fidelity 3D-Nanoprinting via Focused Electron Beams: Computer-Aided Design (3BID)

Author

Fowlkes, Jason D., Winkler, R., Lewis, Brett B., Fernández-Pacheco, A., Skoric, L., Sanz-Hernández, D., Stanford, Michael G., Mutunga, Eva, Rack, P. D., Plank, H., Fernandez-Pacheco, Amalio [0000-0002-3862-8472], and Apollo - University of Cambridge Repository

Subjects
3D-nanoprinting, focused electron beam induced deposition, direct write, additive manufacturing, computer-aided design
Abstract

Currently, there are few techniques that allow true 3D-printing on the nanoscale. The most promising candidate to fill this void is focused electron-beam-induced deposition (FEBID), a resist-free, nanofabrication compatible, direct-write method. The basic working principles of a computer-aided design (CAD) program (3BID) enabling 3D-FEBID is presented and simultaneously released for download. The 3BID capability significantly expands the currently limited toolbox for 3D-nanoprinting, providing access to geometries for optoelectronic, plasmonic, and nanomagnetic applications that were previously unattainable due to the lack of a suitable method for synthesis. The CAD approach supplants trial and error toward more precise/accurate FEBID required for real applications/device prototyping.

Published
2018
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35. ORNL Laboratory Directed Research and Development Program FY 2008 Annual Report

Author

McFarlane, Joanna, primary, de Almeida, Valmor, additional, Green, Johney, additional, Daw, Stuart, additional, Chakravarthy, Kalyan, additional, Lewis, Sam, additional, Sluder, Scott, additional, Steele, Bill, additional, Wagner, Robert, additional, Reitz, Rolf, additional, Bell, Gary, additional, Battiste, Rick, additional, Dinwiddie, Ralph, additional, Sham, Sam, additional, Datskos, Panos, additional, Lavrik, Nickolay, additional, Smith, Barton, additional, Schwartz, Viviane, additional, Tsouris, Costas, additional, Daniel, Claus, additional, Tolbert, Leon, additional, Chinthavali, Madhu, additional, Ozpineci, Burak, additional, Li, Fran, additional, Kueck, John, additional, Starke, Michael, additional, Zhang, Hui, additional, Xu, Yan, additional, DePaoli, David, additional, Compere, Alicia, additional, Griffith, William, additional, Narula, Chaitanya, additional, Vass, Arpad, additional, Sanchez, Luis, additional, McDuffee, Joel, additional, Gehin, Jess, additional, Hobbs, Randy, additional, Ott, Larry, additional, Snead, Lance, additional, Spellman, Donald, additional, Heatherly, Dennis, additional, Ellis, Ronald, additional, Thoms, Kenneth, additional, Dai, Sheng, additional, Luo, Huimin, additional, Baker, Gary, additional, Toops, Todd, additional, Britton, C., additional, Alley, G., additional, Ericson, M., additional, Warmack, R., additional, Retterer, S., additional, Young, Glenn, additional, Srijanto, Bernadetta, additional, Duty, Chad, additional, Ott, Ron, additional, Boudreaux, Philip, additional, Sabau, Adrian, additional, Jellison, Gerald, additional, Maxey, Curt, additional, Leonard, Keith, additional, Das, Biswajit, additional, Urban, Volker, additional, Hong, Kunlun, additional, Britt, Phillip, additional, Mays, Jimmy, additional, Boeker, Alexander, additional, Gruszkiewicz, Miroslaw, additional, Chialvo, Ariel, additional, Cole, David, additional, Simonson, Michael, additional, Goeringer, Douglas, additional, Van Berkel, Gary, additional, Kertesz, Vilmos, additional, Whitten, William, additional, Shaw, Robert, additional, Stocks, G., additional, Goyal, Amit, additional, Zhong, Jianxin, additional, Gao, Yanfei, additional, Borisevich, Albina, additional, Jonge, Niels, additional, Lupini, Andrew, additional, Pennycook, Stephen, additional, Veith, Gabriel, additional, Lee, Ho, additional, Chisholm, Matthew, additional, Singh, David, additional, Kalinin, Sergei, additional, Brown, Gilbert, additional, Ivanov, Ilia, additional, Jesse, Stephen, additional, Hoelzer, David, additional, Bentley, James, additional, Fu, Chong, additional, Miller, Michael, additional, Chen, Xingqiu, additional, Wang, Xun-Li, additional, Hay, Benjamin, additional, Jackson, Jeremy, additional, Geohegan, David, additional, Rother, Gernot, additional, Maksymovych, Petro, additional, Meunier, Vincent, additional, Wendelken, J., additional, Zhang, Zhenyu, additional, Eres, Gyula, additional, Paranthaman, M., additional, Gu, Baohua, additional, Zhu, Wenguang, additional, Buchanan III, A., additional, Kidder, Michelle, additional, Dabestani, Reza, additional, Hagaman, Edward, additional, Pan, Minghu, additional, Ankner, John, additional, Dadmun, Mark, additional, Kilbey II, S., additional, Simpson, John, additional, Dudney, Nancy, additional, More, Karren, additional, Hagaman, Ed, additional, Shaw, Bob, additional, Jiang, De-en, additional, Payzant, Andrew, additional, Lara-Curzio, Edgar, additional, Collier, Charles, additional, Jung, Seung-Yong, additional, Retterer, Scott, additional, Hu, Zhiyu, additional, Buckner, Mark, additional, Moore, Michael, additional, Vann, Michael, additional, Rao, Nageswara, additional, MacIntryre, Lawrence, additional, Bobrek, Miljko, additional, Huey, Benjamin, additional, Bouldin, Donald, additional, Qualls, A., additional, Sumpter, B., additional, Labinov, S., additional, Neal, John, additional, Boatner, Lynn, additional, Rajic, Slobodan, additional, Shankar, Mallikarjun, additional, Jiao, Yu, additional, Kerekes, Ryan, additional, Lusk, Rick, additional, Potok, Thomas, additional, Rhyne, Timothy, additional, Protopopescu, Vladimir, additional, Heller, William, additional, Mo, Yiming, additional, Myles, Dean, additional, Smith, Greg, additional, Mamontov, Eugene, additional, Cummings, Peter, additional, Herwig, Kenneth, additional, Santodonato, Louis, additional, Ankner, J., additional, Mays, J., additional, Messman, J., additional, Myles, D., additional, Lokitz, B., additional, Liang, Liyuan, additional, Wang, Wei, additional, Johs, Alex, additional, O’Neill, Hugh, additional, Snell, Edward, additional, Tulk, Chris, additional, Dos Santos, Antonio, additional, Molaison, Jamie, additional, Chakoumakos, Bryan, additional, Horita, Juske, additional, Cole, Dave, additional, Welton, Robert, additional, Baity, F., additional, Goulding, Richard, additional, Christianson, Andrew, additional, Baker, Sheila, additional, Lumsden, Mark, additional, Nagler, Stephen, additional, Sales, Brian, additional, Schulthess, Thomas, additional, McManamy, Thomas, additional, Crawford, Roy, additional, Ferguson, Phillip, additional, Janney, James, additional, Rennich, Mark, additional, Coates, Leighton, additional, Meilleur, Flora, additional, Fishman, Randy, additional, Robertson, Lee, additional, Shen, Jian, additional, Chen, Wei-Ren, additional, Smith, Gregory, additional, Goddard, William, additional, Liu, Yi, additional, Liu, Yun, additional, Porcar, Lionel, additional, Agarwal, Pratul, additional, Michaud III, Edward, additional, Foster, Carmen, additional, Keller, Martin, additional, Yang, Zamin, additional, Venkateswaran, Amudhan, additional, Podar, Mircea, additional, Schadt, Christopher, additional, Brown, Steven, additional, Yang, Shihui, additional, Tschaplinski, Timothy, additional, Pelletier, Dale, additional, Hurst, Gregory, additional, Yang, Yunfeng, additional, Kalluri, Udaya, additional, McKnight, Timothy, additional, Morrell-Falvey, Jennifer, additional, Lankford, Patricia, additional, Jawdy, Sara, additional, Borole, A., additional, Palumbo, Anthony, additional, Ericson, Nance, additional, Smith, Jeremy, additional, Chesler, Elissa, additional, Dale, Virginia, additional, Baskaran, Latha, additional, Bhaduri, Budhendra, additional, Graham, Robin, additional, Middleton, Richard, additional, Mulholland, Patrick, additional, Parish, Esther, additional, Sorokine, Alexandre, additional, Wolfe, Amy, additional, Wilbanks, Thomas, additional, Ganguly, Auroop, additional, King, Anthony, additional, Erickson, David, additional, Kline, Keith, additional, Wright, Sherry, additional, Castro-Gonzalez, Hector, additional, De Graaff, Marie, additional, Garten III, Charles, additional, Classen, Aimee, additional, Hanson, Paul, additional, Wullschleger, Stan, additional, Norby, Richard, additional, Childs, Kenneth, additional, Thomas, Warren, additional, Voy, Brynn, additional, Datar, Ram, additional, Storaasli, Olaf, additional, Apra, Edoardo, additional, Bernholc, Jerzy, additional, Harrison, Robert, additional, Shelton, William, additional, Sumpter, Bobby, additional, Vazhkudai, Sudharshan, additional, Cobb, John, additional, Ma, Xiaosong, additional, Scott, Stephen, additional, Ong, Hong, additional, Engelmann, Christian, additional, Vallee, Geoffroy, additional, Kendall, Ricky, additional, Brightwell, Ron, additional, Maccabe, Barney, additional, Schulthess, T., additional, Eisenbach, M., additional, Nicholson, D., additional, Tao, X., additional, Zhou, C., additional, Levesque, J., additional, Gorin, Andrey, additional, Ahmad, Nabeela, additional, Bordner, Andrew, additional, Gu, Jessie, additional, Kora, Guruprasad, additional, Pan, Chongle, additional, Park, Byung-Hoon, additional, Samatova, Nagiza, additional, Tao, Xiuping, additional, Uberbacher, Edward, additional, Perumalla, Kalyan, additional, Seal, Sudip, additional, Vetter, Jeffrey, additional, Yoginath, Srikanth, additional, Simunovic, Srdjan, additional, Nukala, Phani, additional, Clarno, Kevin, additional, Gauld, Ian, additional, Besmann, Theodore, additional, Weber, Charles, additional, Grice, Warren, additional, Bennink, Ryan, additional, Evans, Philip, additional, Humble, Travis, additional, Bernholdt, David, additional, Barrett, Richard, additional, Elwasif, Wael, additional, Shet, Aniruddha, additional, Drake, John, additional, White III, J., additional, Archibald, R., additional, Drake, J., additional, Evans, K., additional, Kothe, D., additional, Worley, P., additional, Kohl, Jim, additional, Lepro, Doug, additional, Neergaard, Dude, additional, Maier, Thomas, additional, Alvarez, Gonzalo, additional, Meredith, Jeremy, additional, Summers, Michael, additional, Bannister, Mark, additional, Hettich, Robert, additional, Vane, Charles, additional, Havener, Charles, additional, Krause, Herbert, additional, Fogle, Jr., Michael, additional, Schultz, David, additional, Continetti, Robert, additional, Larsson, Mats, additional, Thomas, Richard, additional, Doktycz, Mitchel, additional, Allison, David, additional, Thundat, Thomas, additional, Rey, Christopher, additional, Borole, Abhijeet, additional, Passian, Ali, additional, Wang, Yisong, additional, Liu, Yie, additional, Lin, Henry, additional, Evans, Boyd, additional, Zheng, Siyang, additional, Fowlkes, Jason, additional, Rack, Philip, additional, Lee, James, additional, Evans, Barbara, additional, Reilly, Peter, additional, Greenbaum, Elias, additional, McLain, Sylvia, additional, Baker, David, additional, Liang, Chengdu, additional, Howe, Jane, additional, Xu, Jun, additional, Custelcean, Radu, additional, Overbury, Steve, additional, Cohen, Seth, additional, Ward, Richard, additional, Kruse, Kara, additional, Nutaro, James, additional, Beckerman, Barbara, additional, Grandas, Oscar, additional, Cui, Xiaohui, additional, Radhakrishnan, B., additional, Zhang, X.-G., additional, Li, An-Ping, additional, Kulkarni, N., additional, Mahurin, Shannon, additional, Cheng, Meng-Dawn, additional, Gossage, David, additional, Wilson, Bruce, additional, Yin, T., additional, Gunter, L., additional, Littrell, Ken, additional, Bilheux, Hassina, additional, Bjornstad, D., additional, Wolfe, A., additional, Warren, Jeff, additional, Bigelow, Timothy, additional, Caughman, John, additional, McKeever, John, additional, Ryan, Philip, additional, Scudiere, Matthew, additional, Alley, Gary, additional, Kulkarni, Nagraj, additional, Wang, Hsin, additional, Meyer, Harry, additional, Radhakrishnan, Bala, additional, Nicholson, Don, additional, Todd, Peter, additional, Tobin, Kenneth, additional, Paquit, Vincent, additional, Price, Jeffery, additional, Jansen, John, additional, Love, Lonnie, additional, Lloyd, Peter, additional, Mann, Christopher, additional, Bingham, Philip, additional, Biggerstaff, John, additional, Zemel, Michael, additional, D’Urso, Brian, additional, Lind, Randy, additional, Baba, Justin, additional, Lee, Seung, additional, Rajic, S., additional, Datskos, P., additional, Reboredo, Fernando, additional, Sun, Chengjun, additional, Zhang, Xiaoguang, additional, Mandrus, David, additional, Narula, C., additional, Moses-DeBusk, M., additional, Buchanan, A., additional, Hsueh, C., additional, Becher, P., additional, Liu, C., additional, Wang, John, additional, Dahotre, Narendra, additional, Kim, Seokho, additional, Blau, Peter, additional, Pawel, Steve, additional, Christen, Hans, additional, Schneibel, Joachim, additional, Brady, Michael, additional, Tiegs, Terry, additional, Vitek, John, additional, Horton, J., additional, Liu, Ken, additional, Naus, Dan, additional, Wright, I., additional, Snead, Lance., additional, Byun, Thak, additional, Miller, Roger, additional, Bischoff, B., additional, Adcock, K., additional, Ohriner, Evan, additional, Erdmann III, Donald, additional, Seal, Katyayani, additional, Haynes, James, additional, Pint, Bruce, additional, Dai, Pengcheng, additional, Gai, Zheng, additional, Yin, Lifeng, additional, Melnichenko, Y., additional, Wignall, G., additional, Cole, D., additional, Radlinski, A., additional, Mastalerz, M., additional, Alexander, C., additional, Smithwick, R., additional, Lewis, L., additional, Boatner, L., additional, Ferrada, Juan, additional, Collins, Jack, additional, Dole, Les, additional, Forsberg, Charles, additional, Haire, M., additional, Hunt, Rodney, additional, Lewis, Ben, additional, Wymer, Ray, additional, Ladd-Lively, Jennifer, additional, Hu, Michael, additional, Shao, Lei, additional, Akkurt, Hatice, additional, Eckerman, Keith, additional, Lee, Ida, additional, Yiacoumi, Sotira, additional, Hollenbach, Daniel, additional, Dean, D., additional, Ramsey-Musolf, M., additional, Smith, Michael, additional, Lingerfelt, Eric, additional, Buckner, Kim, additional, and Nesaraja, Caroline, additional

Published
2009
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40. Tunable 3D Nanoresonators for Gas‐Sensing Applications

Author

Arnold, Georg, primary, Winkler, Robert, additional, Stermitz, Martin, additional, Orthacker, Angelina, additional, Noh, Joo‐Hyon, additional, Fowlkes, Jason D., additional, Kothleitner, Gerald, additional, Huth, Michael, additional, Rack, Philip D., additional, and Plank, Harald, additional

Published
2018
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41. Effects of ultramicroelectrode dimensions on the electropolymerization of polypyrrole.

Author

Fletcher, Benjamin L., Fern, Jared T., Rhodes, Kevin, McKnight, Timothy E., Fowlkes, Jason D., Retterer, Scott T., Keffer, David J., Simpson, Michael L., and Doktycz, Mitchel J.

Subjects
PYRROLES, ULTRAMICROELECTRODES, ELECTRIC properties of polymers, ANODES, MATHEMATICAL physics, POLYMERIZATION
Abstract

Anode geometry can significantly affect the electrochemical synthesis of conductive polymers. Here, the effects of anode dimensions on the electropolymerization of pyrrole are investigated. Band microelectrodes were prepared with widths ranging from 2 to 500 μm. The anode dimension has a significant effect on the resulting thickness of polymer film. The electropolymerization process deviates significantly from that predicted by simple mass transfer considerations when electrode dimensions are less than ∼20 μm. Polymer film thickness is thinner than expected when electrode dimensions become less than ∼10 μm. A simple mathematical model was derived to explain the observed effects of anode dimensions on the polymerization process. Simulation results confirm that diffusive loss of reaction intermediates accounts for the observed experimental trends. The described simulation facilitates understanding of the electropolymerization processes and approaches to the controlled deposition of polypyrrole, particularly at the submicron scale, for microelectromechanical systems and biomedical applications. [ABSTRACT FROM AUTHOR]

Published
2009
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42. Effects of ultramicroelectrode dimensions on the electropolymerization of polypyrrole

Author

letcher, Benjamin L., Fern, Jared T., Rhodes, Kevin, McKnight, Timothy E., Fowlkes, Jason D., Retterer, Scott T., Keffer, David J., Simpson, Michael L., and Doktycz, Mitchel J.

Subjects
Pyrrole -- Properties, Pyrrole -- Analysis, Polymerization -- Analysis, Physics
Abstract

The effects of anode dimensions on the electropolymerization of pyrrole are examined. The results have shown that diffusive loss of reaction intermediates have accounted for the observed effects of anode dimensions on the polymerization process.

Published
2009

44. Defect Facilitated Phonon Transport through Kinks in Boron Carbide Nanowires

Author

Zhang, Qian, primary, Cui, Zhiguang, additional, Wei, Zhiyong, additional, Chang, Siang Yee, additional, Yang, Lin, additional, Zhao, Yang, additional, Yang, Yang, additional, Guan, Zhe, additional, Jiang, Youfei, additional, Fowlkes, Jason, additional, Yang, Juekuan, additional, Xu, Dongyan, additional, Chen, Yunfei, additional, Xu, Terry T., additional, and Li, Deyu, additional

Published
2017
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48. Direct-Write 3D Nanoprinting of Plasmonic Structures

Author

Winkler, Robert, primary, Schmidt, Franz-Philipp, additional, Haselmann, Ulrich, additional, Fowlkes, Jason D., additional, Lewis, Brett B., additional, Kothleitner, Gerald, additional, Rack, Philip D., additional, and Plank, Harald, additional

Published
2016
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