1. Free-electron concentration and polarity inversion domains in plasmonic (Zn,Ga)O
- Author
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Holm Kirmse, Sergey Sadofev, Peter Schäfer, Fritz Henneberger, and Sascha Kalusniak
- Subjects
Free electron model ,Limiting factor ,Materials science ,business.industry ,Doping ,Surface plasmon ,Condensed Matter Physics ,Surface plasmon polariton ,Electronic, Optical and Magnetic Materials ,Condensed Matter::Materials Science ,Optoelectronics ,Wafer ,business ,Plasmon ,Molecular beam epitaxy - Abstract
Heavily Ga-doped ZnO layers are grown on bulk ZnO wafers by molecular beam epitaxy. The layers grow in a two-dimensional pseudomorphic mode with high structural quality under increase of the c-lattice constant up to free-electron concentrations of cm. Formation of Zn-polar inversion domains in the O-polar ZnO matrix is identified as the limiting factor for the incorporation of electrically active Ga. The domain formation can be inhibited by growing with larger excess of Zn. This results in a shift of surface plasmon frequency of meV and allows for covering the telecommunication wavelength range.
- Published
- 2014
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