6 results on '"Goirand, P.-J."'
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2. Combination multiple focal planes and PSM for sub 120 nm node with KrF lithography: study of the proximity effects
3. Validated 90nm CMOS technology platform with low-k copper interconnects for advanced system-on-chip (SoC).
4. Complementary double-exposure technique (CODE): a way to print 80- and 65-nm gate levels using a double-exposure binary mask approach.
5. CHARACTERIZATION OF DIELECTRIC FILMS ON SEMICONDUCTOR SUBSTRATES BY LEAKY-MODES MEASUREMENT
6. Validated 90nm CMOS technology platform with low-k copper interconnects for advanced system-on-chip (SoC)
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