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We review the thin film growth, chemistry, and physical properties of Group 4-6 transition-metal diboride (TMB2) thin films with AlB2-type crystal structure (Strukturbericht designation C32). Industrial applications are growing rapidly as TMB2 begin competing with conventional refractory ceramics like carbides and nitrides, including pseudo-binaries such as Ti1-xAlxN. The TMB2 crystal structure comprises graphite-like honeycombed atomic sheets of B interleaved by hexagonal close-packed TM layers. From the C32 crystal structure stems unique properties including high melting point, hardness, and corrosion resistance, yet limited oxidation resistance, combined with high electrical conductivity. We correlate the underlying chemical bonding, orbital overlap, and electronic structure to the mechanical properties, resistivity, and high-temperature properties unique to this class of materials. The review highlights the importance of avoiding contamination elements (like oxygen) and boron segregation on both the target and substrate sides during sputter deposition, for better-defined properties, regardless of the boride system investigated. This is a consequence of the strong tendency for B to segregate to TMB2 grain boundaries for boron-rich compositions of the growth flux. It is judged that sputter deposition of TMB2 films is at a tipping point towards a multitude of applications for TMB2 not solely as bulk materials, but also as protective coatings and electrically conducting high-temperature stable thin films., Comment: 81 pages, 11 figures, 4 tables

X-ray photoelectron spectroscopy (XPS) and energy-dispersive X-ray spectroscopy (EDX) are applied to investigate the properties of fine-grained concentrate on artisanal small-scale gold mining samples from the Kubi Gold Project of the Asante Gold Corporation near Dunwka-on-Offin in the Central Region of Ghana. Both techniques show that the Au-containing residual sediments are dominated by the host elements Fe, Ag, Al, N, O, Si, Hg, and Ti that either form alloys with gold or inherent elements in the sediments. For comparison, a bulk nugget sample mainly consisting of Au forms an electrum i.e., a solid solution with Ag. Untreated (impure) sediments, fine-grained Au concentrate, coarse-grained Au concentrate, and processed ore (Au bulk/nugget) samples were found to contain cluster of O, C, N, and Ag with Au concentrations significantly lower than that of the related elements. This finding can be attributed to primary geochemical dispersion, which evolved from crystallization of magma and hydrothermal liquids as well as migration of metasomatic elements and rapid rate of chemical weathering of lateralization in secondary processes. The results indicate that Si and Ag are strongly concomitants with Au because of their eutectic characteristics N, C, and O follow alongside because of their affinity to Si. These non-noble elements thus act as pathfinders of Au ores in the exploration area. The paper further discusses relationships between gold and sediments of auriferous lodes as key to determine indicator minerals of gold in mining sites, Comment: 20 pages, 9 figures, 3 tables

W-B-C films were deposited on Si(100) substrates held at elevated temperature by reactive sputtering from a W target in Kr/trimethylboron (TMB) plasmas. Quantitative analysis by X-ray photoelectron spectroscopy (XPS) shows that the films are W-rich between ~ 73 and ~ 93 at.% W. The highest metal content is detected in the film deposited with 1 sccm TMB. The C and B concentrations increase with increasing TMB flow to a maximum of ~18 and ~7 at.%, respectively, while the O content remains nearly constant at 2-3 at.%. Chemical bonding structure analysis performed after samples sputter-cleaning reveals C-W and B-W bonding and no detectable W-O bonds. During film growth with 5 sccm TMB and 500 oC or with 10 sccm TMB and 300-600 oC thin film X-ray diffraction shows the formation of cubic 100-oriented WC1-x with a possible solid solution of B. Lower flows and lower growth temperatures favor growth of W and W2C, respectively. Depositions at 700 and 800 oC result in the formation of WSi2 due to a reaction with the substrate. At 900 oC, XPS analysis shows ~96 at.% Si in the film due to Si interdiffusion. Scanning electron microscopy images reveal a fine-grained microstructure for the deposited WC1-x films. Nanoindentation gives hardness values in the range from ~23 to ~31 GPa and reduced elastic moduli between ~220 and 280 GPa in the films deposited at temperatures lower than 600 oC. At higher growth temperatures the hardness decreases by a factor of 3 to 4 following the formation of WSi2 at 700-800 oC and Si-rich surface at 900 oC., Comment: 14 pages, 8 figures

We investigate sputtering of a Ti3SiC2 compound target at temperatures ranging from RT (no applied external heating) to 970 oC as well as the influence of the sputtering power at 850 oC for the deposition of Ti3SiC2 films on Al2O3(0001) substrates. Elemental composition obtained from time-of-flight energy elastic recoil detection analysis shows an excess of carbon in all films, which is explained by differences in angular distribution between C, Si and Ti, where C scatters the least during sputtering. The oxygen content is 2.6 at.% in the film deposited at RT and decreases with increasing deposition temperature, showing that higher temperatures favor high purity films. Chemical bonding analysis by X-ray photoelectron spectroscopy shows C-Ti and Si-C bonding in the Ti3SiC2 films and Si-Si bonding in the Ti3SiC2 compound target. X-ray diffraction reveals that the phases Ti3SiC2, Ti4SiC3, and Ti7Si2C5 can be deposited from a Ti3SiC2 compound target at substrate temperatures above 850 oC and with growth of TiC and the Nowotny phase Ti5Si3Cx at lower temperatures. High-resolution scanning transmission electron microscopy shows epitaxial growth of Ti3SiC2, Ti4SiC3, and Ti7Si2C5 on TiC at 970 oC. Four-point probe resistivity measurements give values in the range 120 to 450 micro-Ohm-cm and with the lowest values obtained for films containing Ti3SiC2, Ti4SiC3, and Ti7Si2C5., Comment: 14 pages, 7 figures

The electronic structure and chemical bonding of Beta-Ta synthesized as a thin 001-oriented film (space group P421m) is investigated by 4f core level and valence band X-ray photoelectron spectroscopy and compared to alfa-Ta bulk. For the Beta-phase, the 4f7/2 peak is located at 21.91 eV and with the 4f5/2 at 23.81 eV which is 0.16 eV higher compared to the corresponding 4f peaks of the alfa-Ta reference. We suggest that this chemical shift originates from electron screening, higher resistivity or strain in the Beta-Ta film. Furthermore, the 5d-5s states at the bottom of the valence band are shifted by 0.75 eV towards higher binding energy in Beta-Ta compared to alfa-Ta. This is a consequence of the lower number of nearest neighbors with four in Beta-Ta compared to eight in the alfa-Ta phase. The difference in the electronic structures, spectral line shapes of the valence band and the energy positions of the Ta 4f, 5p core-levels of Beta-Ta versus alfa-Ta are discussed in relation to calculated states of Beta-Ta and alfa-Ta. In particular, the lower number of states at the Fermi level of Beta-Ta (0.557 states/eV/atom) versus alfa-Ta (1.032 states/eV/atom) that according to Mott's law should decrease the conductivity in metals and affect the stability by charge redistribution in the valence band. This is experimentally supported from resistivity measurements of the film yielding a value of ~170 micro-Ohm-cm in comparison to alfa-Ta bulk with a reported value of ~13.1 micro-Ohm-cm., Comment: 12 pages, 6 figures

The chemical bonding in an epitaxial ZrB2 film is investigated by Zr K-edge (1s) X-ray absorption near-edge structure (XANES) and extended X-ray absorption fine structure (EXAFS) spectroscopies and compared to the ZrB2 compound target from which the film was synthesized as well as a bulk {\alpha}-Zr reference. Quantitative analysis of X-ray Photoelectron Spectroscopy spectra reveals at the surface: ~5% O in the epitaxial ZrB2 film, ~19% O in the ZrB2 compound target and ~22% O in the bulk {\alpha}-Zr reference after completed sputter cleaning. For the ZrB2 compound target, X-ray diffraction (XRD) shows weak but visible -111, 111, and 220 peaks from monoclinic ZrO2 together with peaks from ZrB2 and where the intensity distribution for the ZrB2 peaks show a randomly oriented target material. For the bulk {\alpha}-Zr reference no peaks from any crystalline oxide were visible in the diffractogram recorded from the 0001-oriented metal. The Zr K-edge absorption from the two ZrB2 samples demonstrate more pronounced oscillations for the epitaxial ZrB2 film than in the bulk ZrB2 attributed to the high atomic ordering within the columns of the film. The XANES exhibits no pre-peak due to lack of p-d hybridization in ZrB2, but with a chemical shift towards higher energy of 4 eV in the film and 6 eV for the bulk compared to {\alpha}-Zr (17.993 keV) from the charge-transfer from Zr to B. The 2 eV larger shift in bulk ZrB2 material suggests higher oxygen content than in the epitaxial film, which is supported by XPS. In EXAFS, the modelled cell-edge in ZrB2 is slightly smaller in the thin film (a=3.165 {\AA}, c=3.520 {\AA}) in comparison to the bulk target material (a=3.175 {\AA}, c=3.540 {\AA}) while in hexagonal closest-packed metal ({\alpha}-phase, a=3.254 {\AA}, c=5.147 {\AA})., Comment: 15 pages, 5 Figures, 4 tables

The variation in local atomic structure and chemical bonding of ZrHx (x=0.15, 0.30, 1.16) magnetron sputtered thin films are investigated by Zr K-edge (1s) X-ray absorption near-edge structure and extended X-ray absorption fine structure spectroscopies. A chemical shift of the Zr K-edge towards higher energy with increasing hydrogen content is observed due to charge-transfer and an ionic or polar covalent bonding component between the Zr 4d and the H 1s states with increasing valency for Zr. We find an increase in the Zr-Zr bond distance with increasing hydrogen content from 3.160 {\AA} in the hexagonal closest-packed metal (alpha-phase) to 3.395 {\AA} in the understoichiometric delta-ZrHx film (CaF2-type structure) with x=1.16 that largely resembles that of bulk delta-ZrH2. For yet lower hydrogen contents, the structures are mixed alpha and delta-phases, while sufficient hydrogen loading (x>1) yields a pure {\delta}-phase that is understoichiometric, but thermodynamically stable. The change in the hydrogen content and strain is discussed in relation to the corresponding change of bond lengths, hybridizations, and trends in electrical resistivity., Comment: 17 pages, 7 figures

The electronic structure and chemical bonding in reactively magnetron sputtered ZrHx (x=0.15, 0.30, 1.16) thin films with oxygen content as low as 0.2 at% are investigated by 4d valence band, shallow 4p core-level and 3d core-level X-ray photoelectron spectroscopy. With increasing hydrogen content, we observe significant reduction of the 4d valence states close to the Fermi level as a result of redistribution of intensity towards the H 1s - Zr 4d hybridization region at about 6 eV below the Fermi level. For low hydrogen content (x=0.15, 0.30), the films consist of a superposition of hexagonal closest packed metal (alpha-phase)and understoichiometric delta-ZrHx (CaF2-type structure) phases, while for x=1.16, the film form single phase ZrHx that largely resembles that of stoichiometric delta-ZrH2 phase. We show that the cubic delta-ZrHx phase is metastable as thin film up to x=1.16 while for higher H-contents, the structure is predicted to be tetragonally distorted. For the investigated ZrH1.16 film, we find chemical shifts of 0.68 and 0.51 eV towards higher binding energies for the Zr 4p3/2 and 3d5/2 peak positions, respectively. Compared to the Zr metal binding energies of 27.26 and 178.87 eV, this signifies a charge-transfer from Zr to H atoms. The change in the electronic structure, spectral line shapes, and chemical shifts as function of hydrogen content is discussed in relation to the charge-transfer from Zr to H that affects the conductivity by charge redistribution in the valence band., Comment: 11 pages, 6 figures

The anisotropy of the electronic structure of ternary nanolaminate V2GeC is investigated by bulk-sensitive soft x-ray emission spectroscopy. The measured polarization-dependent emission spectra of V L2,3, C K, Ge M1 and Ge M2,3 in V2GeC are compared to those from monocarbide VC and pure Ge. The experimental emission spectra are interpreted with calculated spectra using ab initio density-functional theory including dipole transition matrix elements. Different types of covalent chemical bond regions are revealed; V 3d - C 2p bonding at -3.8 eV, Ge 4p - C 2p bonding at -6 eV and Ge 4p - C 2s interaction mediated via the V 3d orbitals at -11 eV below the Fermi level. We find that the anisotropic effects are high for the 4p valence states and the shallow 3d core levels of Ge, while relatively small anisotropy is detected for the V 3d states. The macroscopic properties of the V2GeC nanolaminate result from the chemical bonds with the anisotropic pattern as shown in this work., Comment: 15 pages, 6 figures, 1 table, http://link.aps.org/doi/10.1103/PhysRevB.78.035117