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1. Photocatalytic characteristics of hydro-oxygenated amorphous titanium oxide films prepared using remote plasma enhanced chemical vapor deposition

Author

H. Naitob, Y. Hatanakaa, M. Kandob, and S. Itouc

Subjects
Amorphous silicon, Materials science, Photoconductivity, Inorganic chemistry, Dangling bond, General Physics and Astronomy, Surfaces and Interfaces, General Chemistry, Chemical vapor deposition, Condensed Matter Physics, Photochemistry, Surfaces, Coatings and Films, Amorphous solid, Titanium oxide, chemistry.chemical_compound, chemistry, Plasma-enhanced chemical vapor deposition, Remote plasma
Abstract

The photocatalytic activity and photoconductive characteristics of hydro-oxygenated amorphous titanium oxide (a-TiOx:OH) films prepared using remote plasma enhanced chemical vapor deposition (RPE-CVD) were studied. The a-TiOx:OH films have OH groups, which when exposed to UV irradiation, show high photoconductivity. The photoconductivity is drastically affected by oxygen gas. The results suggest that the recombination states present in the film are non-activated by the OH endings in the dangling bond like the hydrogen endings in hydrogenated amorphous silicon. Oxygen-sensitive photoconductivity is useful for environmental sensor applications.

Published
2005
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