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The electrical properties of boron doped diamond layers after deuterium diffusion have been investigated by Hall effect and capacitance voltage measurements. It is found that (i) the deuterated boron doped diamond layers are inhomogeneous after the deuterium diffusion, resulting in conducting and insulating areas; (ii) negative and positive Hall voltages are measured on the same boron doped sample after deuterium diffusion, depending on the contact geometry (negative with van der Pauw and positive with mesa etched Hall bar); and (iii) in the conducting area, the majority of the boron-deuterium complexes are not ionized after the deuterium diffusion. The detailed electrical measurements using mesa-insulating Hall bar structures revealed that the existence of inhomogeneous regions with conducting and insulating areas is the most probable source of wrong n-type conductivity in deuterated boron doped diamond layers of this work. In the light of this result, the possibility of an incorrect assignment of a shallow donor previously reported in deuterated boron doped diamond is discussed. Finally, confirmation is given that the boron deuterium complexes created after the deuterium diffusion are neutral in p-type diamond. [ABSTRACT FROM AUTHOR]

In monocrystalline boron-doped diamond (BDD), the diffusion of deuterium induces an electrical passivation of acceptors by the formation of (B,D) complexes. However, device applications based on this process are presently limited by the small size of available monocrystalline substrates. In this work, we show that the grain size of polycrystalline diamond is a key parameter in order to achieve efficient deuterium diffusion by trapping on boron atoms. As a result, we present the first clear evidences of the electrical passivation of boron acceptors in the case of polycrystalline diamond layers with an average grain size of 50 μm. We show that, for a boron concentration of 2×1019 cm-3, the room temperature hole mobility increases from 70 to 120 cm2 V-1 s-1 after deuteration. More surprisingly, the compensation ratio keeps the same order of magnitude which suggests a passivation effect on both acceptors and donors. [ABSTRACT FROM AUTHOR]

In this work, we investigate the stress developed in phosphorus-doped layers grown on (110)-textured polycrystalline diamond templates. To that end, we follow the shifts of the diamond Raman diffusion and the exciton recombination energies by Raman and cathodoluminescence spectroscopies, respectively. With each approach, a high tensile strain of several gigapascal is evidenced. Moreover, Raman mapping performed in cross section shows (i) at the grain boundaries, a strain in tension that propagates along the growth direction from the template to the deposited layer and (ii) at the center of each grain, a tensile strain of the phosphorus-doped layer with respect to the underlying undoped grain. Concerning the second, we observe also an increase in strain effects at high phosphorus incorporation, together with a structural degradation. The possible origins of such high lattice deformation of phosphorus-doped layers are discussed. [ABSTRACT FROM AUTHOR]

The formation and properties of (110)-textured P-doped microcrystalline CVD diamond were studied. Based on several microscopy techniques, with a special emphasis on electron backscattered diffraction, a detailed determination of the grain orientations with respect to the exact [110] axis is given. The different orientations present in the film, in combination with low phosphine concentrations in the gas phase, lead to a variation in P incorporation that can vary over three orders of magnitude, as determined with cathodoluminescence mapping. The role of the surface morphology in the observation of these large incorporation differences is explained. Hall measurements confirm that the films are n-type conductive with a thermal activation energy of 0.56 eV. Based on B-doped substrates, pn junctions were created, showing a rectification ratio of nearly 10(4) at ± 25 V.