Search

Tetrahedrally bonded III-N and related alloys are useful for a wide range of applications from optoelectronics to dielectric electromechanics. Heterostructural AlN-based alloys offer unique properties for piezoelectrics, ferroelectrics, and other emerging applications. Atomic-scale point defects and impurities can strongly affect the functional properties of materials, and therefore, it is crucial to understand the nature of these defects and the mechanisms through which their concentrations may be controlled in AlN-based alloys. In this study, we employ density functional theory with alloy modeling and point defect calculations to investigate native point defects and unintentional impurities in Al 1 − x Gd x N alloys. Among the native defects that introduce deep midgap states, nitrogen vacancies (V N ) are predicted to be in the highest concentration, especially under N-poor growth conditions. We predict and experimentally demonstrate that V N formation can be suppressed in thin films through growth in N-rich environments. We also find that Al 1 − x Gd x N alloys are prone to high levels of unintentional O incorporation, which indirectly leads to even higher concentrations of deep defects. Growth under N-rich/reducing conditions is predicted to minimize and partially alleviate the effects of O incorporation. The results of this study provide valuable insights into the defect behavior in wurtzite nitride-based alloys, which can guide their design and optimization for various applications. [ABSTRACT FROM AUTHOR]

The potential impact of cation-substituted AlN-based materials, such as Al1−xScxN, Al1−xGaxN, and Al1−xBxN, with exceptional electronic, electromechanical, and dielectric properties has spurred research into this broad family of materials. Rare earth (RE) cations are particularly appealing as they could additionally impart optoelectronic or magnetic functionality. However, success in incorporating a significant level of RE cations into AlN has been limited so far because it is thermodynamically challenging to stabilize such heterostructural alloys. Using combinatorial co-sputtering, we synthesized Al1−xRExN (RE = Pr, Tb) thin films and performed a rapid survey of the composition–structure–property relationships as a function of RE substitution. Under our growth conditions, we observe that Al1−xPrxN maintains a phase-pure wurtzite structure until transitioning to amorphous for x ≳ 0.22. Al1−xTbxN exhibits a phase-pure wurtzite structure until x ≲ 0.15, then exhibits mixed wurtzite and rocksalt phases for 0.16 ≲ x ≲ 0.28, and finally becomes amorphous beyond that. Ellipsometry measurements reveal that the absorption onset decreases with increasing rare earth incorporation and has a strong dependence on the phases present. We observe the characteristic cathodoluminescence emission of Pr3+ and Tb3+, respectively. Using this synthesis approach, we have demonstrated incorporation of Pr and Tb into the AlN wurtzite structure up to higher compositions levels than previously reported and made the first measurements of corresponding structural and optoelectronic properties. [ABSTRACT FROM AUTHOR]

The thin-film vapor-liquid-solid (TF-VLS) growth technique presents a promising route for high quality, scalable, and cost-effective InP thin films for optoelectronic devices. Toward this goal, careful optimization of material properties and device performance is of utmost interest. Here, we show that exposure of polycrystalline Zn-doped TF-VLS InP to a hydrogen plasma (in the following referred to as hydrogenation) results in improved optoelectronic quality as well as lateral optoelectronic uniformity. A combination of low temperature photoluminescence and transient photocurrent spectroscopy was used to analyze the energy position and relative density of defect states before and after hydrogenation. Notably, hydrogenation reduces the relative intragap defect density by 1 order of magnitude. As a metric to monitor lateral optoelectronic uniformity of polycrystalline TF-VLS InP, photoluminescence and electron beam induced current mapping reveal homogenization of the grain versus grain boundary upon hydrogenation. At the device level, we measured more than 260 TF-VLS InP solar cells before and after hydrogenation to verify the improved optoelectronic properties. Hydrogenation increased the average open-circuit voltage (VOC) of individual TF-VLS InP solar cells by up to 130 mV and reduced the variance in VOC for the analyzed devices.

The integration of near-field scanning optical microscopy (NSOM) with the imaging and localized excitation capabilities of electrons in a scanning electron microscope (SEM) offers new capabilities for the observation of highly resolved transport phenomena in the areas of electronic and optical materials characterization, semiconductor nanodevices, plasmonics and integrated nanophotonics. While combined capabilities for atomic force microscopy (AFM) and SEM are of obvious interest to provide localized surface topography in concert with the ease and large spatial dynamic range of SEM and dual beam imaging (e.g., in-situ AFM following focused ion beam modification), integration with near-field optical imaging capability can also provide access to localized transport phenomena beyond the reach of far-field systems. In particular, the flexibility that is achieved with the capability for independent, high resolution placement of an electron source, providing localized excitation in the form of free carriers, photons or plasmons, with scanning of the optical collecting tip allows for unique types of “dual-probe” experiments that directly image energy transfer. We review integrated near-field and electron optics systems to date, highlight applications in a variety of fields and suggest future directions.

Beta-phase gallium oxide (β-Ga2O3) has attracted attention in recent years as a potentially low cost, large area substrate and active layer material for high power, high temperature power electronics and sensing devices. However, growth of β-Ga2O3 crystals is complicated by easily activated (100) and (001) cleavage planes, the presence of low angle grain boundaries (LAGBs) and twins, and the potential formation of polycrystalline grains. In this study, β-Ga2O3 crystals were grown by the edge-defined film-fed growth technique with an (010) principal face. Two crystals with apparently randomly formed high angle grain boundaries (HAGBs) were selected and analyzed by electron backscatter diffraction, electron channeling contrast imaging, and cathodoluminescence to investigate the nature of the LAGBs and the source of the HAGB formation. It was discovered that planar LAGBs lying parallel to the (010) plane exist in the region immediately preceding the start of an HAGB. Increased misorientation across the LAGB was observed, approaching the initiation of a new grain. We present multimodal microscopy characterization, correlating misorientation and variation in optoelectronic properties with LAGBs and the associated dislocations. [ABSTRACT FROM AUTHOR]

A scanning-electron-microscope (SEM)-based technique is presented for the local measurement of electric field. Results suggest the capability of the proposed technique in measuring the actual profiles which reflect local material variations and contact-related phenomena.

The article presents the discussion on solar energy growing faster than experts projected. Topics include current impacts and growing threats of climate change becoming more visible and the world accelerates efforts for adopting new clean-energy technology; and lithium-ion batteries replicating solar technology's big success and discussing new storage technologies being developed.

Presents information on a study which proposed a phenomenological model for the steady-state distribution of electric field and potential near and implanted contact on a low-temperature infrared detector. Schematic diagram of a p-type photoconductor with implanted contacts; Physics of the near-contact region; Modeling of the near-contact field and potential.

Focuses on a study which investigated the temperature dependence of the free-carrier concentration in germanium (Ge) doped with the double acceptor beryllium (Be). Growth of closely compensated Ge-Be; Material characterization; Results; Summary.