Search

Your search keyword '"He, Minfei"' showing total 22 results
Start Over Author "He, Minfei"
22 results on '"He, Minfei"'

4. Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Author

Ding, Chenliang, primary, Liu, Xi, additional, Liu, Qiulan, additional, Zhu, Dazhao, additional, Luo, Mengdi, additional, Gao, XiuJun, additional, Yang, Zhenyao, additional, Sun, Qiuyuan, additional, Qian, Quanli, additional, Shen, Xiaoming, additional, Cao, Chun, additional, You, Shangting, additional, Xu, Liang, additional, He, Minfei, additional, Liu, Yong, additional, Kuang, Cuifang, additional, and Liu, Xu, additional

Published
2023
Full Text
View/download PDF

6. Ultrahigh-printing-speed photoresists for additive manufacturing

Author

Liu, Tianqi, primary, Tao, Peipei, additional, Wang, Xiaolin, additional, Wang, Hongqing, additional, He, Minfei, additional, Wang, Qianqian, additional, Cui, Hao, additional, Wang, Jianlong, additional, Tang, Yaping, additional, Tang, Jin, additional, Huang, Ning, additional, Kuang, Cuifang, additional, Xu, Hong, additional, and He, Xiangming, additional

Published
2023
Full Text
View/download PDF

7. Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition.

Author

Ding, Chenliang, Liu, Xi, Liu, Qiulan, Zhu, Dazhao, Luo, Mengdi, Gao, XiuJun, Yang, Zhenyao, Sun, Qiuyuan, Qian, Quanli, Shen, Xiaoming, Cao, Chun, You, Shangting, Xu, Liang, He, Minfei, Liu, Yong, Kuang, Cuifang, and Liu, Xu

Subjects
NANOLITHOGRAPHY, ACHROMATISM, PHOTONIC crystals, ABSORPTION, LITHOGRAPHY
Abstract

Improving the 3D resolution is a decisive step in the transition of direct laser writing from being limited to research use to being a powerful tool. Three‐color (3CL) lithography is expected to result in significantly higher resolution with two‐color lasers initiating polymerization in two steps and one‐color laser inhibiting polymerization. However, the 3CL process increases the complexity of the system and makes the influence of chromatic aberration worse which leads to non‐ideal writing results, which is ≈80 nm linewidth (≈λ/10) at present. In this study, the 3CL lithography is improved by introducing almost one color (1CL) instead of three colors to achieve subdiffraction 3D nanolithography based on two‐photon two‐step absorption and photoinhibition (T2A‐PI). Using benzil as a photoinitiator, a sub‐30 nm (<λ/17.5) lateral feature size, minimum 80 nm lateral, and 160 nm axial pitches are achieved, which, to our knowledge, is the best to be fabricated using the laser in the visible region. 3D woodpile photonic crystals and other high‐quality nanostructures are fabricated, demonstrating the unique advantages over existing direct laser writing technologies. [ABSTRACT FROM AUTHOR]

Published
2024
Full Text
View/download PDF

18. 基于边缘光抑制技术的双光束激光直写纳米光刻系统

Author

周国尊 Zhou Guozun, 何敏菲 He Minfei, 杨臻垚 Yang Zhenyao, 曹春 Cao Chun, 谢飞 Xie Fei, 曹耀宇 Cao Yaoyu, 匡翠方 Kuang Cuifang, and 刘旭 Liu Xu

Subjects
Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials
Published
2022

20. 3D Sub‐Diffraction Printing by Multicolor Photoinhibition Lithography: From Optics to Chemistry.

Author

He, Minfei, Zhang, Zhimin, Cao, Chun, Zhou, Guozun, Kuang, Cuifang, and Liu, Xu

Subjects
*THREE-dimensional printing, *LITHOGRAPHY, *OPTICS, *DATA warehousing, *VISIBLE spectra
Abstract

Photoinhibition lithography (PIL) is a nanoscale fabrication technique that uses multicolor visible light to enable the printing of arbitrary 3D structures beyond the diffraction limit. Photoinhibition allows the control and confinement of the exposed region for photoinitiation during the photolithographic process, thus improving the resolution of existing lithographic techniques, such as direct laser writing. Because PIL enables super‐resolution 3D printing, it has a multitude of applications. In this review, practical applications of PIL in the areas of photonics, data storage, and biotechnology are highlighted; in addition, its unique features are revealed. The theory and recent advances in PIL for sub‐diffraction printing and high‐throughput fabrication are also discussed. Besides, challenges and tentative solutions are discussed with the hope of providing a preliminary roadmap for technological breakthroughs in PIL to enable developments of resolution and throughput. [ABSTRACT FROM AUTHOR]

Published
2022
Full Text
View/download PDF

Catalog

Books, media, physical & digital resources
See catalog results