1. Miniaturized pH‐Sensitive Field‐Effect Capacitors with Ultrathin Ta2O5 Films Prepared by Atomic Layer Deposition.
- Author
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Molinnus, Denise, Iken, Heiko, Johnen, Anna Lynn, Richstein, Benjamin, Hellmich, Lena, Poghossian, Arshak, Knoch, Joachim, and Schöning, Michael J.
- Subjects
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ATOMIC layer deposition , *THIN films , *ELECTRIC capacity , *CAPACITORS , *BUFFER solutions , *NITRIDATION , *CAPACITIVE sensors , *METAL oxide semiconductor field-effect transistors - Abstract
Miniaturized electrolyte–insulator–semiconductor capacitors (EISCAPs) with ultrathin gate insulators have been studied in terms of their pH‐sensitive sensor characteristics: three different EISCAP systems consisting of Al–p‐Si–Ta2O5(5 nm), Al–p‐Si–Si3N4(1 or 2 nm)–Ta2O5 (5 nm), and Al–p‐Si–SiO2(3.6 nm)–Ta2O5(5 nm) layer structures are characterized in buffer solution with different pH values by means of capacitance–voltage and constant capacitance method. The SiO2 and Si3N4 gate insulators are deposited by rapid thermal oxidation and rapid thermal nitridation, respectively, whereas the Ta2O5 film is prepared by atomic layer deposition. All EISCAP systems have a clear pH response, favoring the stacked gate insulators SiO2–Ta2O5 when considering the overall sensor characteristics, while the Si3N4(1 nm)–Ta2O5 stack delivers the largest accumulation capacitance (due to the lower equivalent oxide thickness) and a higher steepness in the slope of the capacitance–voltage curve among the studied stacked gate insulator systems. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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