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The GaN-based light emitting diodes (LEDs) brought a revolution in the lighting market by becoming the most energy-efficient light sources. However, the power grid, i.e. electricity delivery system, is built based on alternating current (AC), which raises problems for directly driving LEDs that require direct current (DC) to operate effectively. In this paper, we demonstrate a proof of concept device that addresses this fundamental issue – a GaN-based bidirectional light emitting diode (BD LED). The BD LED structure is symmetrical with respect to the active region, which, depending on the negative or positive bias, allows for the injection of either electrons or holes from each side. It is composed of two tunnel junctions that surround the active region. The optical and electrical properties of such BD LEDs under DC and AC conditions are investigated. We find that the light is emitted in both directions of supplied current, contrary to the standard LEDs, hence BD LEDs can be considered as a semiconductor light source powered directly with AC. In addition, we show that BD LEDs can be stacked vertically to multiply the optical power achieved from a single device.

Atomically thin metal adlayers are used as surfactants in semiconductor crystal growth. The role of the adlayer in the incorporation of dopants in GaN is completely unexplored, probably because n-type doping of GaN with Si is relatively straightforward and can be scaled up with available Si atomic flux in a wide range of dopant concentrations. However, a surprisingly different behavior of the Ge dopant is observed, and the presence of atomically thin gallium or an indium layer dramatically affects Ge incorporation, hindering the fabrication of GaN:Ge structures with abrupt doping profiles. Here, we show an experimental study presenting a striking improvement in sharpness of the Ge doping profile obtained for indium as compared to the gallium surfactant layer during GaN-plasma-assisted molecular beam epitaxy. We show that the atomically thin indium surfactant layer promotes the incorporation of Ge in contrast to the gallium surfactant layer, which promotes segregation of Ge to the surface and Ge crystallite formation. Understanding the role of the surfactant is essential to control GaN doping and to obtain extremely high n-type doped III-nitride layers using Ge, because doping levels >1020 cm−3 are not easily available with Si.

This paper presents low-temperature measurements of magnetoresistivity in heavily doped n-type GaN grown by basic GaN growth technologies: molecular beam epitaxy, metal-organic vapor phase epitaxy, halide vapor phase epitaxy and ammonothermal. Additionally, GaN crystallized by High Nitrogen Pressure Solution method was also examined. It was found that all the samples under study exhibited negative magnetoresistivity at a low temperature (10 K < T < 50 K) and for some samples this effect was observed up to 100 K. This negative magnetoresistivity effect is analyzed in the frame of the weak localization phenomena in the case of three-dimensional electron gas in a highly doped semiconductor. This analysis allows for determining the phasing coherence time τφ for heavily doped n-type GaN. The obtained τφ value is proportional to T−1.34, indicating that the electron–electron interaction is the main dephasing mechanism for the free carriers.

In this work, we study the thermal degradation of In-rich InxGa1–xN quantum wells (QWs) and propose explanation of its origin based on the diffusion of metal vacancies. The structural transformatio...

In this paper, we report a low-loss photonic integrated circuits (PICs) platform at blue wavelengths of the visible spectral regime. Silicon nitride (SiN) is a popular passive waveguide material due to its fabrication flexibility, CMOS compatibility and spectral transparency in this wavelength regime. For active devices including lasers, gallium nitride (GaN) and its alloys are considered. Several basic building blocks for the development of a complete integrated platform, including blue diode lasers, in-plane- and out-of-plane light couplers, as well as on-and off-chip coupling between these active and passive components are theoretically investigated. The proposed in-plane and out-of-plane architectures operate through edge- and vertical grating couplers (VGCs), respectively. With edge-coupling, large mode-mismatch between the GaN laser diode and SiN waveguide is alleviated through nanotapers on both the active and passive sections and the calculated peak coupling efficiency is achieved to be 74% at a wavelength of 450 nm. We also separately designed efficient VGCs for coupling light from standard, commercial, off-the-shelf fibers to the SiN chip, and edge couplers for fiber-chip coupling, exhibiting coupling efficiencies of 51% and 83%, respectively. For robust on-chip light-coupling between active and passive circuit elements, with relaxed alignment tolerances, two approaches, i.e., flip-chip based hybrid integration and evanescent coupling based heterogeneous integration are studied. Calculated maximum coupling efficiencies of 40% (−4 dB) are achieved for both the hybrid and heterogeneous schemes. The theoretical work performed is an initial step towards demonstrating complex blue PICs which could offer a comprehensive range of photonic functionalities.

We demonstrate electrically pumped III-nitride edge-emitting laser diodes (LDs) with nanoporous bottom cladding. The LD structure was grown by plasma-assisted molecular beam epitaxy. Highly doped 350 nm thick GaN:Si cladding layer with Si concentration of 6 x 1019 cm-3 was electrochemically etched to obtain porosity of 15 +/- 3% with pore size of 20 +/- 9 nm. The devices with nanoporous bottom cladding are compared to the refer-ence structures. The pulse mode operation was obtained at 448.7 nm with a slope efficiency (SE) of 0.2 W/A while the reference device without etched cladding layer was lasing at 457 nm with SE of 0.56 W/A. The de-sign of the LDs with porous bottom cladding was modelled theoretically. Performed calculations allowed to choose the optimum porosity and thickness of the cladding needed for the desired optical mode confinement and reduced the risk of light leakage to the substrate and to the top-metal contact. This demonstration opens new possibilities for the fabrication of III-nitride LDs., 12 pages, 7 figures

Typical methods of doping quantification are based on spectroscopy or conductivity measurements. The spatial dopant distribution assessment with nanometer-scale precision is limited usually to one or two dimensions. Here we demonstrate an approach to detect three-dimensional dopant homogeneity in GaN:Si layers using electrochemical etching (ECE). GaN:Si layers are grown by plasma-assisted molecular beam epitaxy. Dopant incorporation is uniform when the growth front morphology is atomically flat. Non-uniform Si incorporation into GaN is observed when step-bunches are present on the surface during epitaxy. In this study we show that local Si concentration in the area of step-bunch is about three times higher than in the area between step-bunches. ECE spatial resolution in our experiment is estimated to be about 50 nm. This makes ECE a simple and quantitative probing tool for local three-dimensional conductivity homogeneity assessment. Our study proves that ECE could be important both for fundamental studies of crystal growth physics and impurity incorporation and for ion-implanted structures and post-processing device control.

The stability of the Nitrogen-polar (000-1) surface of single-crystal bulk GaN substrates is studied for layers grown by plasma-assisted molecular beam epitaxy (PAMBE) in Nitrogen-rich conditions at 730 °C. It is shown that smooth GaN layers with parallel atomic steps are obtained for substrates when the surface crystal miscut angle is larger than 2o, revealing a highly stable epitaxial growth regime on single crystals. A step meandering pattern is observed on layers grown on lower miscut angle substrates. The meandering periodicity is found to have an inverse dependence on growth rate and miscut angle. This is opposite to what is observed for epitaxy on the Ga-polar surface. Combining analytic modeling and kinetic Monte Carlo simulations, it is shown that the existence of an Ehrlich-Schwoebel Barrier (ESB) in the PAMBE growth of GaN in nitrogen-rich conditions on (000-1) GaN reproduces the experimentally observed periodicity of step meandering. Assuming that ESB height depends on interactions between diffusing adatoms, all experimental phenomena are reproduced.

Blue and violet light-emitting devices based on III-nitrides caused an ongoing revolution in general lighting. One of the highly deliberated discussions in this field is devoted to the problem call...

New growth window for N-polar nitride devices is reported for plasma-assisted molecular beam epitaxy (PAMBE). Nitrogen-rich growth conditions were employed to obtain good optical quality N-polar ( 0 0 0 1 ¯ ) InGaN/GaN heterostructures. Atomically flat interfaces were obtained for N-rich growth on ( 0 0 0 1 ¯ ) GaN substrates with high miscut angle of 4° and 7°. Ga-polar samples grown at the same growth conditions were rough and exhibit no indium incorporation. Obtained results point out significantly different growth kinetics on both GaN polarities and offer efficient way for fabricating N-polar devices by PAMBE.

Nitride-based light-emitting diodes (LEDs) are well known to suffer from a high built-in electric field in the quantum wells (QWs). In this paper we determined to what extent the electric field is screened by injected current. In our approach we used high pressure to study this evolution. In LEDs with a narrow QW (2.6 nm) we found that even at a high injection current a large portion of built-in field remains. In LEDs with very wide QWs (15 and 25 nm) the electric field is fully screened even at the lowest currents. Furthermore, we examined LEDs with a tunnel junction in two locations – above and below the active region. This allowed us to study the cases of parallel and antiparallel fields in the well and in the barriers.

The physics of the bottom tunnel junction (BTJ) and its improvement over standard p-up geometry in InGaN blue LEDs is quantified through pulsed power measurements. It is found that the peak external quantum efficiency (EQE) and wall-plug efficiency (WPE) for a p-down BTJ LED is about threefold that of its counterpart, the p-up top tunnel junction (TTJ) LED. This is contributed to increased radiative recombination and reduced electron overflow. Further, the peaks occur at lower current densities for the BTJ device, suggesting earlier saturation of Shockley-Read-Hall traps. In the droop regime, where electron overflow, device heating, and 3-particle interactions are significant, the performance of the BTJ is found to be consistently better than that of the TTJ, converging at large current densities where the polarization fields are screened.

Properties of tunnel junctions (TJs) grown by plasma-assisted molecular beam epitaxy are investigated. Examined TJs consist of a ($\mathrm{In},\mathrm{Ga})\mathrm{N}$ quantum well (QW) sandwiched between ${\mathrm{In}}_{0.02}{\mathrm{Ga}}_{0.98}\mathrm{N}$ barriers. The influence of piezoelectric polarization, doping, and width of a TJ QW on resistivity of TJs is studied. A decrease of TJ resistivity is observed for high doping and high ($\mathrm{In},\mathrm{Ga})\mathrm{N}$ composition. Additionally, the crystal quality of TJs as a function of magnesium and silicon doping in a ($\mathrm{In},\mathrm{Ga})\mathrm{N}$ QW is discussed. Generation of defects in highly doped layers is observed in transmission electron microscopy and by defect selective etching. High doping leads to deterioration of surface morphology, which is corroborated by atomic force microscopy imaging. TJs with low resistance and high crystalline quality, without formation of structural defects, are demonstrated. A theoretical model for calculation of tunneling currents is proposed based on Kane tunneling theory, which considers a realistic electric field distribution in a TJ. A good agreement with the experimental data is obtained. The model is used to predict electrical parameters in a wide range of ${\mathrm{In}}_{x}{\mathrm{Ga}}_{1\ensuremath{-}x}\mathrm{N}$ compositions (x = 0--0.40), doping (${n}_{\mathrm{Mg},\mathrm{Si}}={10}^{17}\ensuremath{-}5\ifmmode\times\else\texttimes\fi{}{10}^{21}\phantom{\rule{0.25em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$), and TJ QW width (d = 2 -- 12 nm).

A novel approach to fabricate efficient nitride light-emitting diodes (LEDs) grown on gallium polar surface operating at cryogenic temperatures is presented. We investigate and compare LEDs with standard construction with structures where p-n junction field is inverted through the use of bottom tunnel junction (BTJ). BTJ LEDs show improved turn on voltage, reduced parasitic recombination and increased quantum efficiency at cryogenic temperatures. This is achieved by moving to low resistivity n-type contacts and nitrogen polar-like built-in field with respect to current flow. It inhibits the electron overflow past quantum wells and improves hole injection even at T=12K. Therefore, as cryogenic light sources, BTJ LEDs offer significantly enhanced performance over standard LEDs.

In this paper the reliability of III-nitride blue laser diodes grown by plasma-assisted molecular beam epitaxy on low threading dislocation density Ammono-GaN substrates is studied. It is found that defects formed in the heavily Mg-doped electron blocking layer (EBL) strongly affect the lifetime of the devices. These defects are identified as basal stacking fault domains which create threading dislocations. The effect of the EBL growth conditions on their generation and influence on lifetime of devices is presented. By optimization of the growth conditions of the EBL the lifetime of III-nitride laser diodes has been increased from 2000 up to 100,000 h.

Study of N-polar GaN surface barrier. Corrigendum: Available online 4 February 2020: Łukasz Janicki, Jan Misiewicz, Marcin Siekacz, Henryk Turski, Joanna Moneta, Sandeep Gorantla, Czesław Skierbiszewski, Robert Kudrawiec; Corrigendum to “Sensitivity of N-polar GaN surface barrier to ambient gases” [Sens. Actuators B: Chem. 281(2019) 561–567]. https://doi.org/10.1016/j.snb.2020.127782, Corrigendum: Available online 4 February 2020: Łukasz Janicki, Jan Misiewicz, Marcin Siekacz, Henryk Turski, Joanna Moneta, Sandeep Gorantla, Czesław Skierbiszewski, Robert Kudrawiec; Corrigendum to "Sensitivity of N-polar GaN surface barrier to ambient gases" [Sens. Actuators B: Chem. 281(2019) 561–567]. https://doi.org/10.1016/j.snb.2020.127782

In this work, we present a GaN-based blue LED construction utilizing bottom tunnel junction (TJ) grown by plasma-assisted molecular beam epitaxy. The setup allows for N-polar-like built-in field alignment while being grown on a Ga-polar substrate. In this study, we present an efficient bottom TJ LED in which the distance between the quantum well and device surface is only 25 nm. This is achieved by the utilization of an n-type current spreading layer consisting of 20 nm thick In0.02Ga0.98N with a Ge doping concentration of 7 × 1019 cm−3. Heavily Ge and Mg doped bottom TJs allowed achieving a low LED turn-on voltage of 2.75 V at 20 A/cm2 and a differential resistivity of 4.7 × 10−4 Ω cm2 at 1 kA/cm2. The device maintained high crystal quality and smooth morphology, which allows for its use as a light emitting platform for further integration. Although the p-up reference LED exhibits lower resistivity at high current, its luminous efficiency is lower than for bottom TJ LEDs.

Theoretical predictions of high hydrogen diffusivity in p-GaN layers were confirmed in many experiments for samples grown by Metalorganic Vapor Phase Epitaxy (MOVPE). In this technology, p-GaN has a high concentration of hydrogen incorporated during the growth. In this work, we confirm that also in hydrogen-free p-GaN grown by Plasma Assisted Molecular Beam Epitaxy (PAMBE) the hydrogen diffusion during H2+NH3 annealing is much higher than in n-type layers. Additionally, we have compared hydrogen diffusion for samples of different dislocation density and we have found no effect of these defects. The photoluminescence of the PAMBE-grown p-GaN exhibited the following change after annealing in H2+NH3 atmosphere: the blue luminescence decrease and yellow luminescence increase.

Doping of Ga(Al)N layers by plasma-assisted molecular beam epitaxy in Ga-rich conditions on c-plane bulk GaN substrates was studied. Ga(Al)N samples, doped with Mg or Si, grown using different growth conditions were compared. In contrast to Si doped layers, no change in the Mg concentration was observed for layers grown using different growth rates for a constant Mg flux and constant growth temperature. This effect enables the growth of Ga(Al)N:Mg layers at higher growth rates, leading to shorter growth time and lower residual background doping, without the need of increasing Mg flux. Enhancement of Mg incorporation for Al containing layers was also observed. Change of Al content from 0% to 17% resulted in more than two times higher Mg concentration.

The design of the active region is one of the most crucial problems to address in light emitting devices (LEDs) based on III-nitride, due to the spatial separation of carriers by the built-in polarization. Here, we studied radiative transitions in InGaN-based LEDs with various quantum well (QW) thicknesses—2.6, 6.5, 7.8, 12, and 15 nm. In the case of the thinnest QW, we observed a typical effect of screening of the built-in field manifested with a blue shift of the electroluminescence spectrum at high current densities, whereas the LEDs with 6.5 and 7.8 nm QWs exhibited extremely high blue shift at low current densities accompanied by complex spectrum with multiple optical transitions. On the other hand, LEDs with the thickest QWs showed a stable, single-peak emission throughout the whole current density range. In order to obtain insight into the physical mechanisms behind this complex behavior, we performed self-consistent Schrodinger–Poisson simulations. We show that variation in the emission spectra between the samples is related to changes in the carrier density and differences in the magnitude of screening of the built-in field inside QWs. Moreover, we show that the excited states play a major role in carrier recombination for all QWs, apart from the thinnest one.

In this paper we review the recent studies on wide InGaN quantum wells (QWs). InGaN QWs are known to suffer from an extremely high built-in piezoelectric polarization, which separates the electron and hole wavefunctions and causes the quantum-confined Stark effect. We show both by means of modeling and experimentally, that wide InGaN QWs can have quantum efficiency superior to commonly used thin QWs. The high efficiency is explained by initial screening of the piezoelectric field and subsequent emergence of optical transitions involving the excited states of electrons and holes, which have a high oscillator strength. A high pressure spectroscopy and photocurrent measurements are used to verify the mechanism of recombination through excited states. Furthermore, the influence of QW width on the properties of optoelectronic devices is studied. In particular, it is shown how the optical gain forms in laser diodes with wide InGaN QWs.

Detailed comparison of optical quality of GaN layers grown homoepitaxially on bulk Ga-polar and N-polar substrates by plasma-assisted molecular beam epitaxy was performed. One order of magnitude lower photoluminescence (PL) intensity and decay time at room temperature was observed for layers grown on N-polar substrates, realized using gallium-rich conditions. This nonradiative recombination channel was very efficient also at liquid helium temperatures, what was evidenced by no improvement in PL time decay. Optical quality of GaN layer (PL intensity, lifetimes) grown on N-polar substrates was greatly improved by using nitrogen-rich growth conditions. We attribute this improvement to suppressed formation of nitrogen vacancy-related point defects. Finally, linewidth below 1 meV and lifetime above 0.1 ns (DX line, He temperature) were obtained for layers grown on N-polar substrate.

InGaN multi-quantum well (MQW) structures were grown by plasma-assisted molecular beam epitaxy (PAMBE) on semipolar (202¯1), nonpolar m-plane (101¯0) and polar c-plane (0001) GaN substrates. The impact of In- and N-rich growth conditions on surface morphology, luminescence properties and structural quality was studied. Semipolar MQWs grown under N-excess have a smooth surface and narrow photoluminescence (PL) at room temperature at 420 nm. Semipolar MQWs grown under In-rich conditions emitted at 414 nm with slightly broader emission and higher surface roughness. Nonpolar m-plane MQWs grown under N-excess emitted at 411 nm and its surface was very rough. When grown under In-rich conditions, nonpolar MQWs also emitted at 411 nm but significant peak broadening was observed due to hillock formation resulting in surface roughening and inhomogeneous In incorporation. The c-plane reference MQW structures grown in the same growth run did not show PL at room temperature due to poor structural quality related to three-dimensional growth mode and structure relaxation.

Recently, the use of bottom-TJ geometry in LEDs, which achieves N-polar-like alignment of polarization fields in conventional metal-polar orientations, has enabled enhancements in LED performance due to improved injection efficiency. Here, we elucidate the root causes behind the enhanced injection efficiency by employing mature laser diode structures with optimized heterojunction GaN/In0.17Ga0.83N/GaN TJs and UID GaN spacers to separate the optical mode from the heavily doped absorbing p-cladding regions. In such laser structures, polarization offsets at the electron blocking layer, spacer, and quantum barrier interfaces play discernable roles in carrier transport. By comparing a top-TJ structure to a bottom-TJ structure, and correlating features in the electroluminescence, capacitance-voltage, and current-voltage characteristics to unique signatures of the N- and Ga-polar polarization heterointerfaces in energy band diagram simulations, we identify that improved hole injection at low currents, and improved electron blocking at high currents, leads to higher injection efficiency and higher output power for the bottom-TJ device throughout 5 orders of current density (0.015–1000 A/cm2). Moreover, even with the addition of a UID GaN spacer, differential resistances are state-of-the-art, below 7 × 10−4 Ωcm2. These results highlight the virtues of the bottom-TJ geometry for use in high-efficiency laser diodes.

New approach towards efficient light emission with bottom-tunnel junctions is developed. The bottom-tunnel junction design aligns the polarization fields in a desired direction in the vicinity of quantum well, while simultaneously eliminating the need for p-type contacts, and allowing efficient current spreading. By preventing electron overshoot past quantum wells, it disables carrier recombination in undesired regions of the heterostructures, increasing injection efficiency and opening new possibilities in heterostructure design. InGaN-based buried-tunnel junction is used to construct first monolithically grown p-type-down laser diode on n-type, Ga-polar bulk GaN substrate. Unique advantages of such construction that enables to separate design of carrier injection and optical mode confinement for such laser diode structures is discussed.

In this work the broadening of interband transitions in InGaN/GaN quantum wells (QWs) resulting from structural inhomogeneities is analyzed. The role of polarization-induced electric field in the mechanism behind the inhomogeneous broadening observed in photoluminescence (PL) and electromodulated reflectance (ER) spectra of InGaN QWs dedicated to green/blue lasers is explained. Spectra of both polar and non-polar QWs are simulated within the random QW model distinguishing contributions of individual transitions taking into account QW inhomogeneities (QW width and indium content fluctuations). On this basis we interpret the ER and PL spectra measured for a polar multiple QW InGaN/GaN structure. The built-in electric field shifts the emission wavelength to red, and enhances the broadening of optical transitions. It is clearly shown that for polar QWs the Stokes shift can be easily overestimated if PL spectra are compared with ER spectra since the intensity of the fundamental transition observed in ER spectra significantly decreases with the increase in QW width. In this way ER signal related to excited states start to dominate. This effect is strongly enhanced by QW inhomogeneities., 18 pages, 8 figures, supplementary material

Semipolar ( 20 2 1 ) , nonpolar m-plane ( 10 1 0 ) and polar c-plane (0001) GaN and InGaN layers were grown by plasma-assisted molecular beam epitaxy. The surface of semipolar and nonpolar GaN grown under Ga-rich conditions is very smooth. The indium incorporation efficiency in InGaN layers grown under In-rich growth conditions is studied on three surface orientations (i) as a function of temperature from 570 to 650 °C and (ii) for varied active nitrogen flux from 0.41 to 2.03 µm/h. The In content follows the relation ( 10 1 0 ) ( 20 2 1 )

The evolution of surface morphology during the growth of N-polar ( 000 1 ¯ ) GaN under N-rich conditions is studied by kinetic Monte Carlo (kMC) simulations for two substrates miscuts 2° and 4°. The results are compared with experimentally observed surface morphologies of ( 000 1 ¯ ) GaN layers grown by plasma-assisted molecular beam epitaxy. The proposed kMC two-component model of GaN ( 000 1 ¯ ) surface where both types of atoms, nitrogen and gallium, attach to the surface and diffuse independently shows that at relatively high rates of the step flow (miscut angle 2 ° ) the low mobility of gallium adatoms causes surface instabilities and leads to experimentally observed roughening while for low rates of the step flow (miscut 4°), smooth surface can be obtained. In the presence of almost immobile nitrogen atoms under N-rich conditions crystal growth is realized by the process of two-dimensional island nucleation and coalescence. Larger crystal miscut, lower growth rate or higher temperature results in similar effect of the surface smoothening. We show that the surface also smoothens for the growth conditions with very high N-excess. In the presence of large number of nitrogen atoms the mobility of gallium atoms changes locally thus providing easier coalescence of separated island.

For the development and application of GaN-based nanowire structures, it is crucial to understand their fundamental properties. In this work, we provide the nano-scale correlation of the morphological, electrical, and optical properties of GaN/AlGaN nanowire light emitting diodes (LEDs), observed using a combination of spatially and spectrally resolved cathodoluminescence spectroscopy and imaging, electron beam-induced current microscopy, the nano-probe technique, and scanning electron microscopy. To complement the results, the photo- and electro-luminescence were also studied. The interpretation of the experimental data was supported by the results of numerical simulations of the electronic band structure. We characterized two types of nanowire LEDs grown in one process, which exhibit top facets of different shapes and, as we proved, have opposite growth polarities. We show that switching the polarity of nanowires (NWs) from the N- to Ga-face has a significant impact on their optical and electrical properties. In particular, cathodoluminescence studies revealed quantum wells emissions at about 3.5 eV, which were much brighter in Ga-polar NWs than in N-polar NWs. Moreover, the electron beam-induced current mapping proved that the p&ndash, n junctions were not active in N-polar NWs. Our results clearly indicate that intentional polarity inversion between the n- and p-type parts of NWs is a potential path towards the development of efficient nanoLED NW structures.

In this paper, we demonstrate a novel approach utilizing tunnel junction (TJ) to realize GaN-based distributed feedback (DFB) laser diodes (LDs). Thanks to the use of the TJ the top metal contact is moved to the side of the ridge and the DFB grating is placed directly on top of the ridge. The high refractive index contrast between air and GaN, together with the high overlap of optical mode with the grating, provides a high coupling coefficient. The demonstrated DFB LD operates at λ=450.15 nm with a side mode suppression ratio higher than 35dB. The results are compared to a standard Fabry-Perot LD.

We demonstrate the applications of tunnel junctions (TJs) for new concepts of monolithic nitride-based multicolor light emitting diode (LED) and laser diode (LD) stacks. The presented structures were grown by plasma-assisted molecular beam epitaxy (PAMBE) on GaN bulk crystals. We demonstrate a stack of four LDs operated at pulse mode with emission wavelength of 453 nm. The output power of 1.1 W and high slope efficiency of 2.3 W/A is achieved for devices without dielectric mirrors. Atomically flat surface after the epitaxy of four LD stack and low dislocation density is measured as a result of proper TJ design with optimized doping level. The strain compensation design with InGaN waveguides and AlGaN claddings is shown to be crucial to avoid cracking and lattice relaxation of the 5 &micro, m thick structure. Vertical connection of n-LDs allows for cascade emission of photons and increases the quantum efficiency n-times. The two-color (blue and green) LEDs are demonstrated. Application of TJs simplifies device processing, reducing the need for applications of p-type contact. The key factor enabling demonstration of such devices is hydrogen-free PAMBE technology, in which activation of buried p-type layers is not necessary.

We demonstrate a stack of two III-nitride laser diodes (LDs) interconnected by a tunnel junction grown by plasma-assisted molecular beam epitaxy. Hydrogen-free growth is used to obtain as-grown p-type conductivity essential for buried tunnel junctions (TJ). We show the impact of the design of tunnel junction. In particular, we show that, apart from the beneficial piezoelectric polarization inside the TJ, heavy doping reduces the differential resistivity even further. The device starts to lase at a wavelength of 459 nm with a slope efficiency (SE) of 0.7 W/A followed by lasing at 456 nm from the second active region doubling the total SE to 1.4 W/A. This demonstration opens new possibilities for the fabrication of stacks of ultraviolet and visible high power pulsed III-nitride LD.

The frozen internal polarization-induced electric fields due to broken inversion symmetry in all conventional blue and green nitride semiconductor light emitting semiconductor quantum well heterostructures point in a direction opposite to what is desired for efficient flow of electrons and holes. This state of affairs has persisted because of the desire to have p-type hole injectors on top of the quantum well active region. Because of the internal polarization fields in nitride heterostructures, there exist four permutations of doping and polarization for the realization of such light emitters. Which permutation is the most desirable for efficient light emission? In this work, we answer this question by demonstrating a fundamentally new approach towards efficient light emission with bottom-tunnel junctions. The bottom-tunnel junction design aligns the polarization fields in a desired direction in the quantum well, while simultaneously eliminating the need for p-type contacts, and allowing efficient current spreading. By preventing electron overshoot past quantum wells, it disables carrier recombination in undesired regions of the quantized heterostructures, and opens up the possibility for new geometries of integrating and stacking multiple light emitters. Due to the inherent advantages, the bottom-tunnel junction light emitting diode enables a 200-300% increase in the light emission efficiency over alternate heterostructure designs., Comment: 23 pages, 9 figures

The impact of Ga and N fluxes on optical quality of InGaN multiple quantum wells grown by plasma assisted molecular beam epitaxy is studies by means of photoluminescence (PL) and time resolved photoluminescence (TRPL) technique. This investigation reveals that both PL spectrum intensity and broadening are affected by Ga and N fluxes but the optimal growth conditions for the smallest broadening and highest intensity can be different. These effects are explained by the changes in the concentration of nonradiative recombination centres. The experimental results are supported by simulation via hopping excitons model. The theoretical studies of impact of quantum wells inhomogeneity and concentration of nonradiative centres on photoluminescence intensity, decay times and quenching are presented and discussed. Both experimental and theoretical results show that nonradiative processes are present also at low temperature and the recombination efficiency can be lower than 100% even at low temperatures.