1. Interference between dielectronic and radiative recombination in electron - highly charged Bi collisions
- Author
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Shunsuke Ohtani, Frederick Currell, Daiji Kato, Hirotsugu Tobiyama, Hirofumi Watanabe, Yueming Li, Nobuyuki Nakamura, Hiroaki Nohara, Hiroyuki A. Sakaue, Anthony Kavanagh, and Chikashi Yamada
- Subjects
Physics ,History ,Radiative transfer ,Spontaneous emission ,Electron ,Atomic physics ,Interference (wave propagation) ,Recombination ,Computer Science Applications ,Education ,Electron beam ion trap ,Line (formation) ,Ion - Abstract
Interference between radiative and dielectronic recombination in electron and highly charged Bi ion collisions has been studied by observing emitted x-rays with the Tokyo electron beam ion trap. The so-called Fano line shapes were fitted to the KLL DR resonant profiles observed as the enhancement of the x-ray counts. The shape parameters q have been determined similarly to the previous experiments for highly charged U [D A Knapp et al 1995 Phys. Rev. Lett. 74 54] and Hg ions [A J Gonzalez Martinez et al 2005 Phys. Rev. Lett. 94 20320]. The present results were compared to the previous results.
- Published
- 2007
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