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Interfacial characteristics of GaAs/GaAs0.64P0.19Sb0.17GaAs heterostructures and emission properties of a quaternary GaAs0.64P0.19Sb0.17 layer were studied by excitation-power- and temperature-dependent photoluminescence (PL) measurements. The GaAs-to-GaAsPSb upper interface related emission feature and signals from GaAsPSb and GaAs were observed and characterized. The upper interface related emission peak was attributed to the radiative recombination of spatially separated electron–hole pairs and suggesting the type-II alignment at the GaAs/GaAsPSb interface. The localized excitonic emission feature of GaAsPSb revealed a blueshift due to the saturation effect of localized states and showed a fast thermal-quench with the increase of temperature. The temperature variation of the band edge emission signal of GaAsPSb was found to follow that of GaAs closely.

We fabricated and characterized ultraviolet (UV) light-emitting diodes (LEDs) composed of n-ZnO/SiO2-ZnO nanocomposite/p-GaN heterostructures. Significant UV electroluminescence at 387 nm from the n-ZnO layer in this heterostructure LED was observed at a forward-bias current of as low as 1.8 mA. This is ascribed to the high quality of the n-ZnO layer and the effective function of the SiO2-ZnO nanocomposite layer. The SiO2-ZnO nanocomposite layer accomplishes the role of current blocking by forming the larger energy barrier for electron injection from n-ZnO into p -GaN and also contributes to, due to its low refractive index, higher light extraction efficiency from the n-ZnO layer.

The characteristics of temperature-dependent photoluminescence (PL) from Si nanocrystals and effects of arsenic-doping (As-doping) were investigated. The Si nanocrystals on a p-type Si substrate were prepared by low pressure chemical vapor deposition and post-deposition thermal oxidation. The As-doping process was carried out using the gas-phase-doping technique. Temperature-dependent PL from Si nanocrystals exhibited considerable differences between samples with/without As-doping. Phase transition between electron–hole liquid and free exciton was observed in the undoped Si nanocrystals, leading to the increase in PL intensity with temperature less than 50 K. Electron emission from As-doped Si nanocrystals to the p-Si substrate was responsible for the significant increase in PL intensity with temperature greater than 50 K. Characteristics of light emission from Si nanocrystals will facilitate the development of silicon-based nanoscaled light-emitting devices.

Atomic layer deposition technique and subsequent rapid thermal annealing (RTA) were implemented to grow high-quality ZnO epilayers for the fabrication of n-ZnO/p-GaN heterojunction LEDs. The X-ray diffraction measurement reveals that the ZnO epilayer has high crystallinity with c axis orientation. Transmission electron microscopy images present that the ZnO layer is a single crystal, including only a few survivals of threading dislocations, which were generated in the GaN layer deposited by metal-organic chemical vapor deposition on the c-Al2O3 substrate and most of which were eliminated at the n-ZnO/p-GaN interface. An interfacial layer 4-5 nm thick caused by the RTA treatment was observed between the n-ZnO and p-GaN layers. Room temperature UV electroluminescence (EL) at 391 nm from ZnO was achieved at a low injection current about 10 mA. It is concluded that the competition between the ELs from the n-ZnO and p-GaN (around 425 nm) may be ascribed to the ZnO/GaN interface states coupled with the differences between the n-ZnO and p-GaN in carrier concentration and light emission efficiency.

Multiple In0.18Ga0.82N (4 nm)/GaN (40 nm) quantum well (QW) layers in a green laser diode were observed by high-angle annular dark-field (HAADF) scanning transmission electron microscopy (STEM) and conventional transmission electron microscopy. HAADF-STEM provided undoubted evidence that V defects in the multiple QW have the thin six-walled structure with InGaN/GaN {10\\bar11} layers. The detailed structure of the observed V defects is discussed on the basis of the formation mechanism of V defects which was proposed taking into account the growth kinetics of the GaN crystal and a masking effect of In atoms segregated around the threading dislocation (Shiojiri et al. J. Appl. Phys. 99, (2006) 073505).

InGaN/GaN multiple quantum well light emitting diode structures have been grown on sapphire substrates by metalorganic chemical vapor deposition. They are investigated, in this study, by high-resolution X-ray diffraction, high-resolution transmission electron microscopy, photoluminescence, and photoluminescence excitation. HR-XRD showed multiple satellite peaks up to 10th order due to the quantum well superlattice confinement effects. These indicate the high quality of layer interface structures of this sample. Excitation power-dependent photoluminescence shows that both piezoelectric field-induced quantum-confined Stark effect and band filling effect influence the luminescent properties of this sample. Temperature-dependent photoluminescence of this sample has also been studied. The peak position of the PL exhibits a monotonic red-shift and the full width at half maximum of the PL band shows a W-shaped temperature-dependent behavior with increasing temperature. From the photoluminescence excitation results, a large energy difference, so-called Stokes shift, between the band-edge absorption and emission was observed.

InGaN/GaN multiple quantum well (MQW) light emitting diode (LED) structures with blue and green light emissions have been grown on sapphire substrates by metalorganic chemical vapor deposition. They are investigated by high-resolution X-ray diffraction (HR-XRD), high-resolution transmission electron microscopy (HR-TEM), photoluminescence (PL) and photoluminescence excitation (PLE). HR-XRD showed multiple satellite peaks up to 10th order due to the quantum well superlattice confinement effects. HR-TEM determined the MQW structures and parameters, indicating the high quality of layer interfaces of these LED samples. Excitation power-dependent PL predicates that both piezoelectric field-induced quantum-confined Stark effect and band filling effect influence the luminescent properties. Temperature-dependent PL shows that the QW PL emission peak exhibits a monotonic red-shift and that the full width at half maximum of the PL band shows a W-shaped temperature-dependent behavior with increasing temperature. From the PLE results, a large energy difference, so-called quantum confined Stokes shift, between the band-edge absorption and emission was observed. Penetrating TEM revealed the V-shape defects, and quantum dot-like structures within the InGaN well region, which leads to intense light emissions from these MQW LEDs.

An optical-field-ionization soft x-ray laser with prepulse-controlled nanoplasma expansion in a cluster gas jet was demonstrated. Pd-like xenon lasing at 41.8-nm with 95 nJ pulse energy and 5-mrad divergence was achieved, indicating near-saturation amplification. In addition, by using deflectometry of a longitudinal probe pulse to resolve the spatiotemporal distribution of the preformed plasma, we characterize and control the plasma density distribution near the target surface for the development of solid-target x-ray lasers. We show that the use of prepulses in an ignitor-heater scheme can increase the scale length of the preformed plasma and how the effect varies with target materials.

InGaN/GaN Multiple Quantum Well (MQW) structures have been grown on sapphire substrates by low pressure metalorganic chemical vapor deposition (MOCVD), for wide range of blue, blue-green and green light emission device application. The compositions and sizes within QWs were designed according to the requirements on the LED performance. Samples were investigated by a variety of characterization techniques. Optimization of the growth parameters and process was realized and evidenced by high resolution X-ray diffraction (XRD) measurements. High quality of MQW wafers have been achieved with excellent characteristics, showing XRD multiple satellite peaks up to 10 th order due to the quantum well superlattice confinements and fine fringe structures among satellite peaks. Transmission electron microscopy confirmed the sharp MQW structures and dimensional parameters, and revealed the V-shape defects. Optical properties were further studied and Quantum confined Stokes effect was observed from photoluminescence and photoluminescence excitation measurements.

Ultraviolet (UV) light-emitting diodes composed of n-ZnO:Al-SiO2-ZnO nanocomposite/p-GaN:Mg heterojunction were fabricated on the c-plane sapphire substrate. TEM images clearly reveals a dispersion of high crystalline ZnO nanoparticles in the amorphous SiO2 matrix with sizes about 3~10 nm. Analyses of the Zn distribution by means of EDX and HAADF show a strongly non-uniform distribution of Zn within the SiO2 matrix. The SiO2-ZnO nanocomposite layer accomplishes a role of the current blocking layer and also causes, by its low refractive index, the increase in the light extraction efficiency from n-ZnO. With a SiO2 layer, significant UV electroluminescence from n-ZnO was achieved at a low forward-bias current of 1.8 mA. Strong UV emission arising from impact ionization in GaN, ZnO, and GaN:Mg states was also observed at reverse breakdown bias.

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Si nanocrystals embedded in a SiO2 matrix and an n-type Al-doped ZnO (ZnO:Al) layer were applied to improve the external quantum efficiency from Si in n- ZnO/SiO2-Si nanocrystals-SiO2/p-Si heterojunction light-emitting diodes (LEDs). The Si nanocrystals were grown by low pressure chemical vapor deposition and the ZnO:Al layer was prepared by atomic layer deposition. The n-type ZnO:Al layer acts as an electron injection layer, a transparent conductive window, and an anti-reflection coating to increase the light extraction efficiency. Owing to the spatial confinement of carriers and surface passivation by the surrounding SiO2, the Si nanocrystals embedded in the SiO2 matrix lead to a significant enhancement of the light emission efficiency from Si. An external quantum efficiency up to 4.3 x 10(-4) at the wavelength corresponding to the indirect bandgap of Si was achieved at room temperature.