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2. A Novel Method for Preparation of Al‐Ni Reactive Coatings by Incorporation of Ni Nanoparticles into an Al Matrix Fabricated by Electrodeposition in AlCl3:[EMIm]Cl (1.5:1) Ionic Liquid Containing Ni Nanoparticles

6. Defects Contributing to Hysteresis in Few-Layer and Thin-Film MoS 2 Memristive Devices.

8. Novel Gas Phase Route Toward Patterned Deposition of Sputter‐Free Pt/Al Nanofoils (Adv. Mater. Technol. 18/2023)

10. Electrodeposition of Reactive Aluminum-Nickel Coatings in an AlCl3:[EMIm]Cl Ionic Liquid Containing Nickel Nanoparticles

18. Self‐Aligning Metallic Vertical Interconnect Access Formation through Microlensing Gas Phase Electrodeposition controlling Airgap and Morphology (Adv. Electron. Mater. 1/2023)

20. Energy‐Efficient Operation Conditions of MoS2‐Based Memristors.

22. Formation and Characterization of Three-Dimensional Tetrahedral MoS2 Thin Films by Chemical Vapor Deposition

23. Hysteresis Associated with Intrinsic-Oxide Traps in Gate-Tunable Tetrahedral CVD-MoS2 Memristor

25. Three-Dimensional MoS 2 Nanosheet Structures: CVD Synthesis, Characterization, and Electrical Properties.

36. Formation and Characterization of Three-Dimensional Tetrahedral MoS2Thin Films by Chemical Vapor Deposition

37. Designing MoS2 channel properties for analog memory in neuromorphic applications.

38. Fluidic heterogeneous microsystems assembly and packaging

39. Programmable reconfigurable self-assembly: parallel heterogeneous integration of chip-scale components on planar and nonplanar surfaces

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