Search

Your search keyword '"Jeremy Freixas"' showing total 3 results
Start Over Author "Jeremy Freixas"
3 results on '"Jeremy Freixas"'

1. Ultra-high areal capacitance and high rate capability RuO2 thin film electrodes for 3D micro-supercapacitors

Author

Bouchra Asbani, Jeremy Freixas, Pascal Roussel, Christophe Lethien, Thierry Brousse, Marielle Huvé, Gaëtan Buvat, David Troadec, Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Université catholique de Lille (UCL)-Université catholique de Lille (UCL), Réseau sur le stockage électrochimique de l'énergie (RS2E), Université de Nantes (UN)-Aix Marseille Université (AMU)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Université de Picardie Jules Verne (UPJV)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Pau et des Pays de l'Adour (UPPA)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS), Centrale de Micro Nano Fabrication - IEMN (CMNF - IEMN), Université catholique de Lille (UCL)-Université catholique de Lille (UCL)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA), Institut Universitaire de France (IUF), Ministère de l'Education nationale, de l’Enseignement supérieur et de la Recherche (M.E.N.E.S.R.), Circuits Systèmes Applications des Micro-ondes - IEMN (CSAM - IEMN ), This research is financially supported by the ANR within the DENSS-CAPIO project (ANR-17-CE05-0015-02) . The authors also want to thank the ANR STORE-EX and the French network on electrochemical energy storage (RS2E) for the financial support. The French RENATECH network is greatly acknowledged for the use of microfabrication facilities. Chevreul Institute (FR 2638) is also acknowledged for the access to advanced characterization facilities. The TEM facility in Lille (France) is supported by the 'Conseil Regional des Hauts-de-France' and the 'European Regional Development Fund (ERDF) '., Renatech Network, RS2E, CMNF, ANR-17-CE05-0015,DENSSCAPIO,Supercondensateurs nanostructurés tout-solides pour stockage d'énergie plus dense et plus sûr(2017), ANR-10-LABX-0076,STORE-EX,Laboratory of excellency for electrochemical energy storage(2010), Université de Picardie Jules Verne (UPJV)-Institut de Chimie du CNRS (INC)-Aix Marseille Université (AMU)-Université de Pau et des Pays de l'Adour (UPPA)-Université de Nantes (UN)-Université de Montpellier (UM)-Centre National de la Recherche Scientifique (CNRS)-Sorbonne Université (SU)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille, and Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA)-Centrale Lille-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-JUNIA (JUNIA)

Subjects
Materials science, Thin films, Energy Engineering and Power Technology, 02 engineering and technology, 010402 general chemistry, Electrochemistry, 01 natural sciences, 7. Clean energy, Capacitance, Ruthenium oxide, law.invention, Planar, law, RuO2, Rate capability, General Materials Science, Electronics, Pseudocapacitance, 3D micro-supercapacitor, Supercapacitor, Renewable Energy, Sustainability and the Environment, business.industry, 021001 nanoscience & nanotechnology, 0104 chemical sciences, Capacitor, Electrode, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Optoelectronics, 0210 nano-technology, business
Abstract

International audience; To power the next generation of miniaturized electronic devices, 3D micro-supercapacitors are a new class of millimeter scale electrochemical capacitors with superior storage performance than their planar counterparts. Nevertheless, it is mandatory to carefully match the dimensions of the 3D scaffold with the thickness of the electrochemically active electrode materials to take benefit from both the high capacitance values and the high rate capability of 3D micro-supercapacitors technology. Here we demonstrate how to design an efficient 3D electrode based on ruthenium oxide pseudocapacitive film (similar to 400 nm-thick) deposited on a robust 3D scaffold. '90% of the initial capacitance value is maintained during 10000 cycles. The proposed 3D RuO2 electrode exhibits remarkable areal capacitance values (similar to 4.5 Fcm(-2)) at 2 mVs(-1), while maintaining more than 2 Fcm(-2) at 100 mVs(-1) (10 s charge / discharge time), thus validating the design of ultra-high capacitance electrode with high rate capability.

Published
2021

2. Atomic Layer Deposition of Functional Layers for on Chip 3D Li-Ion All Solid State Microbattery

Author

Manon Létiche, Vincent De Andrade, Arnaud Demortière, Laurence Morgenroth, Jeremy Freixas, David Troadec, Etienne Eustache, Christophe Lethien, F. Vaurette, Pascal Roussel, Thierry Brousse, Pascal Tilmant, Matériaux divisés, interfaces, réactivité, électrochimie (MADIREL), Aix Marseille Université (AMU)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Institut des Matériaux Jean Rouxel (IMN), Université de Nantes - UFR des Sciences et des Techniques (UN UFR ST), Université de Nantes (UN)-Université de Nantes (UN)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN), Laboratoire réactivité et chimie des solides - UMR CNRS 7314 (LRCS), Université de Picardie Jules Verne (UPJV)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Educations et Pratiques de Santé (LEPS), Université Paris 13 (UP13)-Université Sorbonne Paris Cité (USPC)-Institut National de la Santé et de la Recherche Médicale (INSERM), Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN), Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF), Unité de Catalyse et Chimie du Solide - UMR 8181 (UCCS), Université d'Artois (UA)-Centrale Lille-Institut de Chimie du CNRS (INC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS), Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)-Nantes université - UFR des Sciences et des Techniques (Nantes univ - UFR ST), Nantes Université - pôle Sciences et technologie, Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ)-Nantes Université - pôle Sciences et technologie, Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ)-Nantes Université - Ecole Polytechnique de l'Université de Nantes (Nantes Univ - EPUN), Nantes Université (Nantes Univ)-Nantes Université (Nantes Univ), Réseau sur le stockage électrochimique de l'énergie (RS2E), Université de Nantes (UN)-Aix Marseille Université (AMU)-Université de Haute-Alsace (UHA) Mulhouse - Colmar (Université de Haute-Alsace (UHA))-Collège de France (CdF (institution))-Université de Picardie Jules Verne (UPJV)-Ecole Nationale Supérieure de Chimie de Montpellier (ENSCM)-Ecole Nationale Supérieure de Chimie de Paris - Chimie ParisTech-PSL (ENSCP), Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Université de Pau et des Pays de l'Adour (UPPA)-Institut de Chimie du CNRS (INC)-Université de Montpellier (UM)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut National Polytechnique (Toulouse) (Toulouse INP), Université de Toulouse (UT)-Université de Toulouse (UT)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), Université Grenoble Alpes (UGA)-Université Grenoble Alpes (UGA), Université de Nantes (UN)-Université de Nantes (UN)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Ecole Polytechnique de l'Université de Nantes (EPUN), Université de Nantes (UN)-Université de Nantes (UN), Université de Picardie Jules Verne (UPJV)-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC), Institut National de la Santé et de la Recherche Médicale (INSERM)-Université Sorbonne Paris Cité (USPC)-Université Paris 13 (UP13), Centrale Lille Institut (CLIL)-Université d'Artois (UA)-Centrale Lille-Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Lille, Tokyo University of Agriculture and Technology (TUAT), Université Fédérale Toulouse Midi-Pyrénées-Université Fédérale Toulouse Midi-Pyrénées-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP ), and Lethien, Christophe

Subjects
Materials science, [SPI] Engineering Sciences [physics], [SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, chemistry.chemical_element, Context (language use), Nanotechnology, 3D microbattery, 02 engineering and technology, Substrate (electronics), 010402 general chemistry, 01 natural sciences, Atomic Layer Depostion, [SPI]Engineering Sciences [physics], Atomic layer deposition, Fast ion conductor, General Materials Science, [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics, Thin film, ComputingMilieux_MISCELLANEOUS, Renewable Energy, Sustainability and the Environment, 021001 nanoscience & nanotechnology, Surface energy, 0104 chemical sciences, solid electrolyte, chemistry, double microtube, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], Lithium, 0210 nano-technology, Layer (electronics)
Abstract

Nowadays, millimeter scale power sources are key devices for providing autonomy to smart, connected, and miniaturized sensors. However, until now, planar solid state microbatteries do not yet exhibit a sufficient surface energy density. In that context, architectured 3D microbatteries appear therefore to be a good solution to improve the material mass loading while keeping small the footprint area. Beside the design itself of the 3D microbaterry, one important technological barrier to address is the conformal deposition of thin films (lithiated or not) on 3D structures. For that purpose, atomic layer deposition (ALD) technology is a powerful technique that enables conformal coatings of thin film on complex substrate. An original, robust, and highly efficient 3D scaffold is proposed to significantly improve the geometrical surface of miniaturized 3D microbattery. Four functional layers composing the 3D lithium ion microbattery stacking has been successfully deposited on simple and double microtubes 3D templates. In depth synchrotron X-ray nanotomography and high angle annular dark field transmission electron microscope analyses are used to study the interface between each layer. For the first time, using ALD, anatase TiO2 negative electrode is coated on 3D tubes with Li3PO4 lithium phosphate as electrolyte, opening the way to all solid-state 3D microbatteries. The surface capacity is significantly increased by the proposed topology (high area enlargement factor – “thick” 3D layer), from 3.5 μA h cm−2 for a planar layer up to 0.37 mA h cm−2 for a 3D thin film (105 times higher).

Published
2016

3. Sputtered Thin Films for Lithium Ion Microbatteries: Recent Results on TiN Lithium Barrier Diffusion Layer, Au Negative and C-LiFePO4 Positive Electrodes

Author

Etienne Eustache, Jeremy Freixas, Olivier Crosnier, Pascal Tilmant, Dmitri Yarekha, Pascal Roussel, Nathalie Rolland, Thierry Brousse, and Christophe Lethien

Abstract

With the development of energy autonomous systems (sensors, connected objects, active RFID…), the interest for energy storage devices as microbatteries is growing. Such batteries are based on lithium technologies. Classically, a thin film lithium microbattery consists of the deposition on a substrate of several functional layers such as 2 current collectors, a positive and a negative (lithium metal) electrodes separated by a solid electrolyte (fig. 1). Our study focuses on sputtered thin films deposited on a silicon substrate (figure 1). To prevent the lithium diffusion from the active layers to the silicon substrate, a diffusion barrier layer should be integrated in the structure. Titanium Nitride (TiN) is really developed in microelectronics and TiN could be used both as a current collector and as lithium diffusion barrier (1) for the negative electrode (2, 3). The purpose of this study is to understand the influence of deposition parameters on the titanium nitride characteristics in order to get low resistivity and low electrochemically active thin film against lithium ion insertion. To do so, experiments have been led to get resistivity and Li-capacity as function of the deposition parameters. Structural properties such as crystalline texture, roughness and microstructure have been also studied (figure 2). Prior to the thin film deposition of gold materials and their electrochemical characterization, in operando X ray diffraction measurement has been performed on a gold foil in order to clearly understand the structural evolution of the lithium-gold alloys (4). As in the lithium-silicon alloys, the understanding is really complicated and the number of publications is limited (5-7): ours conclusion and results will be presented. Then, a negative gold electrode has been deposited on the TiN current collector by sputtering means. It has been shown that the electrochemical study is quite difficult if the gold thin film is deposited directly on the silicon wafer owing to the lithium-silicon alloys. It has been demonstrated the benefit from the TiN layer by TOF-SIMS measurement where the lithium ion bas been blocked in the gold electrode due to the TiN barrier layer. Galvanostatic cycling tests has been carried out on the gold electrode and two plateaus have been highlighted corresponding to the lithium-poor and lithium-rich gold phases. The reversibility of these two plateaus have been studied in liquid (1M LITFSI/EC/DEC) as well as in solid (sputtered LIPON) electrolytes and will be presented. Finally, the C-LiFePO4 positive electrode has been studied by RF and pulsed DC magnetron sputtering deposition means. The electrochemical (cyclic voltammetry, galvanostatic cycling) experiments on the thin films as a function of the deposition parameters (figure 3) will also be reported. Micro-patterning of the C-LiFePO4 layer has been realized for the first time by deep reactive ion etching. All the building blocks mixing material deposition/characterization and microelectronic fabrication have been developed in this study and paves the ways to the technological fabrication of thin film lithium-ion microbattery based on this technology. Acknowledgments: The authors want to thank the French network of the electrochemical energy storage (RS2E) for this support. This research is financially supported by the ANR and the DGA within the MECANANO project (ANR-12-ASTR-0032-01). The French RENATECH network and the CPER CIA are greatly acknowledged. 1. L. Baggetto, R. A. H. Niessen, F. Roozeboom and P. H. L. Notten, Advanced Functional Materials, 18, 1057 (2008). 2. S.-K. Rha, W.-J. Lee, D.-I. Kim, S.-Y. Lee, D.-W. Kim, Y.-S. Hwang, S.-S. Chun and C.-O. Park, Thin Solid Films, 320, 134 (1998). 3. V. Chakrapani, F. Rusli, M. A. Filler and P. A. Kohl, Journal of Power Sources, 216, 84 (2012). 4. A. D. Pelton, Bulletin of Alloy Phase Diagrams 7, 228 (1986). 5. G. Taillades, N. Benjelloun, J. Sarradin and M. Ribes, Solid State Ionics 152–153, 119 (2002). 6. T. L. Kulova, A. M. Skundin, V. M. Kozhevin, D. A. Yavsin and S. A. Gurevich, Russian Journal of Electrochemistry, 46, 877 (2010). 7. A. Gohier, B. Laïk, J.-P. Pereira-Ramos, C. S. Cojocaru and P. Tran-Van, Journal of Power Sources, 203, 135 (2012).

Published
2014

Catalog

Books, media, physical & digital resources
See catalog results