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The paper summarizes the recent progress on the optical materials and components for the high power laser system in China. The amplifier material, Nd glass, has been developed with continuous melt. Non-linear crystals, KDP/DKDP, have been grown with rapid and traditional growth method. Fused silica and K9 glass has been achieved high quality. Some potential materials for next generation high power laser system are also evinced in this summary.

Using the birefringent properties of thin film, a non-polarizing design concept is presented in this paper. This concept can be applied to design non-polarizing band-pass and edge filters at oblique incidence.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

The ZrO2 thin films were deposited on BK7 glass substrates by electron beam evaporation method at room temperature. The influences of post-deposition annealing between 200°C and 400°C on the structural and mechanical properties of the films have been investigated by X-ray diffraction and atomic force microscopy. It was found that a monoclinic phase formed at lower temperature of 200°C. With the increase of the annealing temperature, the tetragonal phase appeared. The stress in ZrO2 films showed a transition from tensile to compressive which could be explained as the evolution of the microstructure as function of annealing temperatures. At the same time, the refractive index of the ZrO2 films increased with the increasing of annealing temperatures, which may be ascribed to the microstructure densification of the ZrO2 films.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

In (2+1) dimension, growth process of thin film on non-planar substrate in Kuramoto-Sivashinsky (K-S) model is studied with the numerical simulation approach. 15×15 semi-ellipsoids arranged orderly on the surface of substrate are used to represent initial rough surface of substrate. The results show that at the initial stage of growth process, the interface width constantly decreases with the growth time, then it reaches minimum. However, with the increase of growth time, the granules of different sizes distributes evenly on the surface of thin film. Whereafter the size of granules and the interface width gradually increase with the growth time, and the surface of thin film presents fractal properties.© (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

Adhesion between the interface of pure silver thin film and three kinds of low refractive index coatings MgF2, Al2O3, SiO2 were compared in this article. The results indicated that the adhesion of Al2O3 and Ag was evidently superior to that of MgF2 and Ag, and the adhesion of MgF2 and Ag was evidently superior to that Of SiO2 and Ag. Reasons were analyzed accordingly. On the other hand, we compared the effect on the optical characteristic of Ag film when these three kinds of films were used as protective coatings and enhanced coatings. Considering the difference of the adhesion between Ag and MgF2, Al2O3, SiO2, suited uses are given for each other. C 2004 Elsevier B.V. All rights reserved.

A characteristic criterion of the growth of metallic films from discontinuous to continuous has been proposed. That is, when the electric conductivity of thin metallic film equals to 63.2% of the electric conductivity of the infinitely thick metallic film, the growth of metallic films come into continuous film. The corresponding equivalent thickness G of the characteristic criterion can be thought of as the characteristic thickness of the growth of metal films from discontinuous to continuous. According this characteristic criterion, the characteristic thicknesses of Co films and Cu films have been given. The topography images of Co and Cu films have been observed using atomic force microscopy. Keywords: metallic films, a characteristic criterion, discontinuous film, continuous film, ion beam sputtering 1. INTRODUCTION The growth of a solid film on a substrate generally takes place in one of the three modes, which are, firstly, the island or Volmer–Weber growth mode. Secondly, the layer, or Frank–van der Merwe growth mode. Thirdly, an intermediate layer plus an island or Stranski–Krastanov growth mode. It has been shown that most metal films grow from initially isolated metallic islands to a connecting network and finally to complete coverage of the whole area

The optical sensitive characteristic of SnO2 and V2O5 thin films to the gas SO2 was investigated with photometric and ellipsometric methods. It is found that thin films of the Pd-doped SnO2 and pure-V2O5 have good optical sensitive characteristics to SO2 in the visible range, and the Zr-doped SnO2 film in the near-infrared area. The results show that the change of the optical characteristic is directly related to the variation of optical gap and the concentration of free carrier in thin films.© (2000) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

PbTiO 3 (PT) thin film with perovskite-type microstructure was synthesized directly on transparent sapphire using a rf-magnetron sputtering system with a composite target. The results show that the film is completely [111] oriented, and the lattice constant is larger than that of bulk PT material. The optical properties were calculated from the transmittance spectrum alone, and the dispersion was found to fit the single-term Sellmeier relation well. The minimum refractive index of the film is found to be 2.51, and the direct band-gap energy is estimated to be 3.65 eV from the linear fitting of the absorption coefficient to the Tauc plot of ((alpha) hv) 2 vs hv.

In this paper, normal incidence soft x-ray multilayer mirrors for 23.4 nm, 8.89 nm, and 4.47 nm have been fabricated by planar magnetron, the multilayer is characterized with low angle x-ray diffraction and TEM technique. The absolute reflectivity is measured at the synchronization radiation facility.

The fabrication and characterization of soft X-ray multilayer lamellar phase gratings are given simply in this paper. The measurement of optical performance of soft X-ray multilayer phase grating at Beijing Synchrotron Radiation Facility is described in detail. The measurement results are analyzed and also compared with the theory predication.

In the soft x-ray domain (near 10 nm), the reported optical constants of silver and silicon are sufficiently different to make them attractive for a multilayer design. In this paper, design and fabrication of silver/silicon multilayer to be used as normal-incidence reflectors for 11.4 nm radiation are presented. Characterization of these multilayer structures was accomplished using Auger electron spectroscopy (AES) and little-angle x-ray diffraction (LXD). As a result of our experiments, we came to realize that silver/silicon multilayer can provide high quality structures and reach a certain reflectance.