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Semiconductor industry is experiencing a rising demand for environmentally friendly processes with the emphasis on green policies and worldwide environmental sustainability. Nitrogen trifluoride (NF3), the most common plasma chamber cleaning agent gas, poses a significant concern as a potent greenhouse gas since it has global warming potential (GWP), 740 times and 6 times higher than that CO2 and N2O. This study investigated the exhaust gas using quadrupole mass spectroscopy (QMS) and analyzed the change in cleaning speed and the type of exhaust gas through plasma monitoring using optical mass spectroscopy (OES). The objective is to lower the use of the amount of NF3 gas in chamber cleaning process to partially contribute the environmental sustainability in the point of semiconductor manufacturing. When a small amount of N2 was added to NF3 whose ratio of 7:23, the cleaning efficiency reached to 90% compared to NF3 gas alone. Addition of N2 positively affected electron density and temperature to increase the F-radical in remote plasma system. In conclusion, 18% of NF3 usage amount was reduced during the Sio2 deposition chamber cleaning process. [ABSTRACT FROM AUTHOR]

Silicon nitride (Si3N4) etching using CF4/O2 mixed with N2 has become very popular in 3D NAND flash structures. However, studies on Si3N4 dry etching based on optical emission spectroscopy (OES) are lacking; in particular, no study has reported the use of OES for analyzing N2-mixed CF4/O2 plasma. Thus, this study demonstrates an OES-based approach for analyzing a mixed-gas plasma for etching Si3N4 thin films. The state of each single gas plasma of CF4, O2, and N2 as well as that of mixed plasmas of heterogeneous gases CF4/O2, CF4/N2, and O2/N2 was investigated to analyze the mixed-gas plasma. Furthermore, the amount of N2 in the CF4/O2 plasma varied from 0 to 8 sccm. The relationship between the OES analysis results and the Si3N4 etch rate was subsequently established using Si3N4 film etching, and the explanation was verified through a chemical reaction modeling and surface reaction. Therefore, our study confirmed the alteration in chemical species and quantity that occurred when N2 was added to CF4/O2 plasma and the effect of the alteration on Si3N4 etch. [ABSTRACT FROM AUTHOR]

Abstract: Nickel manganite spinel (NiMn2O4) based negative temperature coefficient (NTC) thermistors have good thermistor characteristics and stabilities. However, to achieve thermistors with a high B constant, the activation energy should be high, which results in high room temperature (RT) resistivity. To obtain a high B constant and low RT resistivity, NiMn2O4 based nanocomposite thick films with the conducting metal oxide, LaNiO3, were fabricated on a glass substrate by aerosol deposition at room temperature. The NiMn2O4–LaNiO3 nanocomposite thick films showed an RT resistivity as low as 35kΩ cm, which is one order of magnitude lower than that of the NiMn2O4 films, while retaining the high B constant of NiMn2O4 of over 5000K when 25vol.% LaNiO3 was used without any post thermal treatment. [Copyright &y& Elsevier]

Cas12j, a hypercompact and efficient Cas protein, has potential for use in CRISPR diagnostics, but has not yet been used because the trans-cleavage activity of Cas12j is veiled. Here, the trans-cleavage behavior of Cas12j1, 2, and 3 variants and evaluate their suitability for nucleic acid detection is unveiled. The target preferences and mismatch specificities of the Cas12j variants are precisely investigated and the optimal Cas12j reaction conditions are determined. As a result, the EXP-J assay for miRNA detection by harnessing the robust trans-cleavage activity of Cas12j on short ssDNA is developed. The EXP-J method demonstrates exceptional detection capabilities for miRNAs, proving that Cas12j can be a pivotal component in molecular diagnostics. Furthermore, the translational potential of the EXP-J assay is validated by detecting oncogenic miRNAs in plasma samples from lung cancer patients. This investigation not only elucidates the trans-cleavage characteristics of Cas12j variants, but also advances the Cas12j-based diagnostic toolkit., (© 2024 The Author(s). Advanced Science published by Wiley‐VCH GmbH.)