25 results on '"Kang, Sukin"'
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2. High-Dimensional Physical Reservoir with Back-End-of-Line-Compatible Tin Monoxide Thin-Film Transistor.
3. Thickness-Dependent Growth Behaviors of Sputtered Amorphous InGaZnO Films Depending on the Substrates and Sputtering Conditions
4. Review of Semiconductor Flash Memory Devices for Material and Process Issues (Adv. Mater. 43/2023)
5. Enhancing the Crystallization and Properties of the SrRuO3 Electrode Film Grown by Atomic-Layer-Deposited SrO and Pulsed-Chemical Vapor-Deposited RuO2 through Al Substitution
6. Parallel Integration of Nanoscale Atomic Layer Deposited Ge2Sb2Te5 Phase-Change Memory with an Indium Gallium Zinc Oxide Thin-Film Transistor
7. Enhancing the Crystallization and Properties of the SrRuO3 Electrode Film Grown by Atomic-Layer-Deposited SrO and Pulsed-Chemical Vapor-Deposited RuO2 through Al Substitution.
8. Electrical properties of amorphous Zn–Sn–O thin films depending on composition and post-deposition annealing temperature near crystallization temperature
9. Review of Semiconductor Flash Memory Devices for Material and Process Issues
10. Parallel Integration of Nanoscale Atomic Layer Deposited Ge2Sb2Te5 Phase-Change Memory with an Indium Gallium Zinc Oxide Thin-Film Transistor.
11. Go anywhere: user-verifiable authentication over distance-free channel for mobile devices
12. Threshold Voltage Modulation in a Transistor with a Two-Dimensional Electron Gas Channel at the Interface between Al2O3 and Sub-5 nm ZnO Films
13. Investigating the Reasons for the Difficult Erase Operation of a Charge‐Trap Flash Memory Device with Amorphous Oxide Semiconductor Thin‐Film Channel Layers
14. Characterization of a 2D Electron Gas at the Interface of Atomic‐Layer Deposited Al2O3/ZnO Thin Films for a Field‐Effect Transistor
15. Substrate-Dependent Growth Behavior of Atomic-Layer-Deposited Zinc Oxide and Zinc Tin Oxide Thin Films for Thin-Film Transistor Applications
16. Comparative Study on the Gate‐Induced Electrical Instability of p‐Type SnO Thin‐Film Transistors with SiO2 and Al2O3/SiO2 Gate Dielectrics
17. Characterization of a 2D Electron Gas at the Interface of Atomic‐Layer Deposited Al2O3/ZnO Thin Films for a Field‐Effect Transistor.
18. Comparative Study on the Gate‐Induced Electrical Instability of p‐Type SnO Thin‐Film Transistors with SiO2 and Al2O3/SiO2 Gate Dielectrics.
19. Button‐based method for the prevention of near field communication relay attacks
20. Secure Collaborative Key Management for Dynamic Groups in Mobile Networks
21. Detecting a Relay Attack with a Background Noise
22. A Study on the Self-destructing Data for Information Privacy
23. Go anywhere: user-verifiable authentication over distance-free channel for mobile devices
24. EDGAR: Extended Dynamic Group-Key AgReement
25. Button-based method for the prevention of near field communication relay attacks.
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