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Your search keyword '"Karur-Shanmugam, Ramkumar"' showing total 16 results
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16 results on '"Karur-Shanmugam, Ramkumar"'

1. Statistical process optimization method for metrology equipment

Author

Kim, Dongsoo, primary, Moran, Zaberchik, additional, Li, Chen, additional, Lee, Honggoo, additional, Park, Chanha, additional, Lee, Sangho, additional, Lee, Dongyoung, additional, Beatty, Scott, additional, Park, Jae Y., additional, Karur-Shanmugam, Ramkumar, additional, Koffas, Telly, additional, Lee, Dohwa, additional, Jeon, Sanghuck, additional, Choi, Dongsub, additional, Megged, Efi, additional, BenDavid, Nir, additional, and Spielberg, Hedvi, additional

Published
2021
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2. CPE run-to-run overlay control for High Volume Manufacturing

Author

Subramany, Lokesh, primary, Chung, Woong Jae, additional, Gutjhar, Karsten, additional, Garcia-Medina, Miguel, additional, Sparka, Christian, additional, Yap, Lipkong, additional, Demirer, Onur, additional, Karur-Shanmugam, Ramkumar, additional, Riggs, Brent, additional, Ramanathan, Vidya, additional, Robinson, John C., additional, and Pierson, Bill, additional

Published
2015
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3. HVM capabilities of CPE run-to-run overlay control

Author

Subramany, Lokesh, additional, Chung, Woong Jae, additional, Gutjahr, Karsten, additional, Garcia-Medina, Miguel, additional, Sparka, Christian, additional, Yap, Lipkong, additional, Demirer, Onur, additional, Karur-Shanmugam, Ramkumar, additional, Riggs, Brent, additional, Ramanathan, Vidya, additional, Robinson, John C., additional, and Pierson, Bill, additional

Published
2015
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4. 20nm MOL overlay case study

Author

Subramany, Lokesh, additional, Hsieh, Michael, additional, Li, Chen, additional, Koh, Hui Peng, additional, Cho, David, additional, Golotsvan, Anna, additional, Ramanathan, Vidya, additional, Karur Shanmugam, Ramkumar, additional, and Yap, Lipkong, additional

Published
2014
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5. Integrated production overlay field-by-field control for leading edge technology nodes

Author

Chung, Woong Jae, additional, Tristan, John, additional, Gutjahr, Karsten, additional, Subramany, Lokesh, additional, Li, Chen, additional, Sun, Yulei, additional, Yelverton, Mark, additional, Kim, Young Ki, additional, Kim, Jeong Soo, additional, Huang, Chin-Chou Kevin, additional, Pierson, William, additional, Karur-Shanmugam, Ramkumar, additional, Riggs, Brent, additional, Jug, Sven, additional, Robinson, John C., additional, Yap, Lipkong, additional, and Ramanathan, Vidya, additional

Published
2014
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6. Quality metric for accurate overlay control in <20nm nodes

Author

Klein, Dana, primary, Amit, Eran, additional, Cohen, Guy, additional, Amir, Nuriel, additional, Har-Zvi, Michael, additional, Huang, Chin-Chou Kevin, additional, Karur-Shanmugam, Ramkumar, additional, Pierson, Bill, additional, Kato, Cindy, additional, and Kurita, Hiroyuki, additional

Published
2013
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7. Study of overlay in EUV/ArF mix and match lithography

Author

Huang, Chin-Chou Kevin, primary, Chua, Lin, additional, Hwang, KyungBae, additional, Mani, Antonio, additional, Marcuccilli, Gino, additional, Pierson, Bill, additional, Karur-Shanmugam, Ramkumar, additional, Robinson, John C., additional, Choi, Dongsub, additional, Ferber, Michael, additional, Roeth, Klaus-Dieter, additional, Lee, ByoungHoon, additional, and Lee, Inhwan, additional

Published
2013
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8. Applications of CPL mask technology for sub-65nm gate imaging

Author

Litt, Lloyd C., primary, Conley, Will, additional, Wu, Wei, additional, Peters, Richie, additional, Parker, Colita, additional, Cobb, Jonathan, additional, Kasprowicz, Bryan S., additional, van den Broeke, Doug, additional, Park, J. C., additional, and Karur-Shanmugam, Ramkumar, additional

Published
2005
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10. HVM capabilities of CPE run-to-run overlay control

Author

Cain, Jason P., Sanchez, Martha I., Subramany, Lokesh, Chung, Woong Jae, Gutjahr, Karsten, Garcia-Medina, Miguel, Sparka, Christian, Yap, Lipkong, Demirer, Onur, Karur-Shanmugam, Ramkumar, Riggs, Brent, Ramanathan, Vidya, Robinson, John C., and Pierson, Bill

Published
2015
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11. 20nm MOL overlay case study

Author

Cain, Jason P., Sanchez, Martha I., Subramany, Lokesh, Hsieh, Michael, Li, Chen, Koh, Hui Peng, Cho, David, Golotsvan, Anna, Ramanathan, Vidya, Karur Shanmugam, Ramkumar, and Yap, Lipkong

Published
2014
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13. Study of overlay in EUV/ArF mix and match lithography

Author

Starikov, Alexander, Cain, Jason P., Huang, Chin-Chou Kevin, Chua, Lin, Hwang, KyungBae, Mani, Antonio, Marcuccilli, Gino, Pierson, Bill, Karur-Shanmugam, Ramkumar, Robinson, John C., Choi, Dongsub, Ferber, Michael, Roeth, Klaus-Dieter, Lee, ByoungHoon, and Lee, Inhwan

Published
2013
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15. Statistical process optimization method for metrology equipment.

Author

Adan, Ofer, Robinson, John C., Kim, Dongsoo, Zaberchik, Moran, Li, Chen, Lee, Honggoo, Park, Chanha, Lee, Sangho, Lee, Dongyoung, Beatty, Scott, Park, Jae Y., Karur-Shanmugam, Ramkumar, Koffas, Telly, Lee, Dohwa, Jeon, Sanghuck, Choi, Dongsub, Megged, Efi, BenDavid, Nir, and Spielberg, Hedvi

Published
2020
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16. Statistical process optimization method for metrology equipment

Author

Adan, Ofer, Robinson, John C., Kim, Dongsoo, Zaberchik, Moran, Li, Chen, Lee, Honggoo, Park, Chanha, Lee, Sangho, Lee, Dongyoung, Beatty, Scott, Park, Jae Y., Karur-Shanmugam, Ramkumar, Koffas, Telly, Lee, Dohwa, Jeon, Sanghuck, Choi, Dongsub, Megged, Efi, BenDavid, Nir, and Spielberg, Hedvi

Published
2021
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