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1. Germanium on Silicon Avalanche Photodiode for High-Speed Fiber Communication

8. Nanowire-Based Solar Cells

9. Recess-type waveguide integrated germanium on silicon avalanche photodiode

12. Low temperature epitaxial growth of Ge:B and Ge0.99Sn0.01:B source/drain for Ge pMOS devices: in-situ and conformal B-doping, selectivity towards oxide and nitride with no need for any post-epi activation treatment

14. #AiMES2018_20181002_1400_Low-T-SiGe_Porret

16. (Invited) Very Low Temperature Epitaxy of Group-IV Semiconductors for Use in Finfet, Stacked Nanowires and Monolithic 3D Integration

18. Fundamentals of Ge 1−x Sn x and Si y Ge 1−x-y Sn x RPCVD epitaxy

20. Heteroepitaxial growth of In In[subscript 0.30]Ga[subscript 0.70]As high-electron mobility transistor on 200 mm silicon substrate using metamorphic graded buffer

21. PPAC scaling enablement for 5nm mobile SoC technology

23. Study of silicon nanowires and their integration into photovoltaic systems

24. (Invited) Selective Epitaxial Growth of High-P Si:P for Source/Drain Formation in Advanced Si nFETs

25. Heteroepitaxial growth of In0.30Ga0.70As high-electron mobility transistor on 200 mm silicon substrate using metamorphic graded buffer

29. Étude des nanofils de silicium et de leur intégration dans des systèmes de récupération d'énergie photovoltaïque

32. Metalorganic chemical vapor deposition-regrown Ga-rich InGaP films on SiGe virtual substrates for Si-based III-V optoelectronic device applications.

33. (Invited) Very Low Temperature Epitaxy of Group-IV Semiconductors for Use in FinFET, Stacked Nanowires and Monolithic 3D Integration

34. Heteroepitaxial growth of In0.30Ga0.70As high-electron mobility transistor on 200 mm silicon substrate using metamorphic graded buffer.

37. Electrical Properties of III-V/Oxide Interfaces

38. Molecular Beam Epitaxy study of a common a-GeO2 interfacial passivation layer for Ge- and GaAs-based MOS heterostructures

39. The role of AsH3 partial pressure on anti-phase boundary in GaAs-on-Ge grown by MOCVD – Application to a 200 mm GaAs virtual substrate.

40. (Invited) Selective Epitaxial Growth of High-P Si:P for Source/Drain Formation in Advanced Si nFETs

41. Al catalyzed growth of silicon nanowires and subsequent in situdry etching of the catalyst for photovoltaic application

44. Cu2ZnSn(S1−x Se x )4 based solar cell produced by selenization of vacuum deposited precursors

45. Fundamentals of Ge1−xSnx and SiyGe1−x-ySnx RPCVD epitaxy.

46. Cu2ZnSn(S1 − x Se x )4 thin films for photovoltaic applications: Influence of the precursor stacking order on the selenization process.

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