1. Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties
- Author
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Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan, and Josef Krýsa
- Subjects
al2o3 ,atomic layer deposition (ald) ,barrier properties ,corrosion ,electrochemistry ,fto ,Technology ,Chemical technology ,TP1-1185 ,Science ,Physics ,QC1-999 - Abstract
Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. However, these films were rapidly dissolved in 1 M NaOH (≈100 nm/h). The dissolution was slower in 1 M H2SO4 (1 nm/h) but after 24 h the blocking behaviour was entirely lost. The optimal stability was reached at pH 7.2 where no changes were found up to 24 h and even after 168 h of exposure the changes in the blocking behaviour were still minimal. This behaviour was also observed for protection against direct reduction of FTO.
- Published
- 2021
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