68 results on '"Laixi, Sun"'
Search Results
2. Effect of H2O2 Treatment on Mechanical and Mechanochemical Properties of Fused Silica
- Author
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Xinqi Liu, Lingyu Yin, Hongtu He, Youze Ma, Qiuju Zheng, Laixi Sun, Fang Wang, Jiaxin Yu, and Yong Cai
- Subjects
fused silica ,H2O2 ,indentation ,nanowear ,subsurface damage ,Technology ,Engineering (General). Civil engineering (General) ,TA1-2040 ,Biology (General) ,QH301-705.5 ,Physics ,QC1-999 ,Chemistry ,QD1-999 - Abstract
The surface properties of fused silica (FS) change after H2O2 treatment, but the surface and subsurface damage behaviors and their mechanisms under various physical contact conditions have not been elucidated yet. This work investigated the effect of H2O2 treatment on mechanical and mechanochemical properties of FS surface. The results show that the hydrophilicity and adsorbed water film thickness of the FS surface increase with the concentration of H2O2 solution. The surface damage, nanowear, and subsurface deformation of FS caused by indentation increase with the concentration of H2O2 solution, while the nanohardness and reduced modulus decrease. Further analysis revealed that the water activity on the FS surface plays a critical role in reducing the mechanical and mechanochemical properties. In addition, the treatment with H2O2 solution on the FS surface shows a weakly corrosive effect, which implies the H2O2 treatment can be an alternative method to remove the surface defects on FS optics.
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- 2023
- Full Text
- View/download PDF
3. Laser Damage Performance Study of Fundamental Frequency Dielectric Film Optical Elements
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Zixuan Chen, Ye Tian, Jingguo Zhu, Laixi Sun, Fang Wang, Yizhang Ai, Hongjie Liu, Xuewei Deng, Mingjun Chen, Jian Cheng, and Linjie Zhao
- Subjects
high-reflective mirror ,dielectric films ,laser-induced damage threshold ,damage growth ,Crystallography ,QD901-999 - Abstract
In laser application systems, the optical film is one of the most important parts of the system, as well as its weakest link. Its damage performance determines the output characteristics and safety performance of the laser system. This paper focuses on the fundamental frequency reflection of dielectric films used in large high-powered laser devices. The study of the dielectric film’s initial laser damage performance and laser damage growth performance is carried out through laser damage testing and microscopic morphology testing of the damage. The results show two different damage morphologies: type 1 damage (film discoloration damage) and type 2 damage (cratered damage), and the damage growth behavior between the two is very different, with type 1 damage not growing and type 2 damage growing rapidly under subsequent episodes that trigger their damage fluxes. The difference in the growth behavior is well explained by the micro-zone surface shape of the damage location. The results of this paper help to deepen the understanding of the dielectric membrane element processing process and the damage growth behavior.
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- 2023
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4. Experimental study of 355 nm laser damage ignited by Fe and Ce impurities on fused silica surface
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Hongjie, Liu, Fengrui, Wang, Jin, Huang, Jie, Meng, yongjun, Ma, Yafei, Lian, Laixi, Sun, Xin, Ye, Feng, Geng, Xiaodong, Jiang, Weidong, Wu, and Liming, Yang
- Published
- 2019
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5. Numerical and Experimental Study on Thermal Damage Induced by Medium—Infrared Laser
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Zhenhua Lei, Yubin Zhang, Qingzhi Li, Ting Shao, Laixi Sun, Kaixuan Wang, Zao Yi, Xin Ye, Wanguo Zheng, and Pinghui Wu
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middle−infrared laser ,silicon ,laser−induced thermal damage ,Applied optics. Photonics ,TA1501-1820 - Abstract
We studied the laser-induced thermal damage on the surface of a single crystal silicon mirror illuminated by a mid-infrared intense laser. We used mid−infrared quasi-continuous wave lasers to irradiate the surface of the single−crystal silicon mirror. The power density of the irradiation process is 1 kW/cm2 to 17 kW/cm2, and the transient temperature field and thermal stress field under different laser fluxes were obtained. The simulation results show that we can calculate the thermal stress and temperature under laser irradiation. In addition, irradiance exceeding the corresponding breaking strength and melting point limit was obtained by the model. We can predict the irradiance that causes cracking and melting. There is little difference between experimental results and simulation results. On this basis, the thermal damage to the surface of the silicon wafer caused by continuous mid−infrared laser irradiation was studied.
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- 2022
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6. Statistically Correlating Laser-Induced Damage Performance with Photothermal Absorption for Fused Silica Optics in a High-Power Laser System
- Author
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Zhaohua Shi, Laixi Sun, Ting Shao, Hongjie Liu, Jin Huang, Xin Ye, Fengrui Wang, Liming Yang, and Wanguo Zheng
- Subjects
fused silica ,surface absorption ,laser-induced damage ,absorbing defects ,non-destructive evaluation ,Applied optics. Photonics ,TA1501-1820 - Abstract
Photothermal weak absorption is useful for the diagnosis of absorbing defects on the surface of fused silica optics in high-power lasers. However, how they relate to the laser-induced damage performance remains unclear, especially for a fused silica surface that has been post-treated with different processes (e.g., dynamic chemical etching or magnetorheological finishing). Here, we present a correlation study on the surface defect absorption level and laser-induced damage performance of fused silica optics post-treated with different processes using the photothermal common-path interferometer method. Statistical distribution of the absorbing defects at various absorption levels is obtained. The relationship between the defect density and the laser damage performance was analyzed. We show that the surface absorbing defects of fused silica can be affected by the post-treatment type and material removal amount. Furthermore, we show that the density of the defects with the absorption over 2 ppm is strongly correlated with the damage initiation threshold and damage density. Especially, for high-density defects at this absorption level, the damage density of fused silica optics can be well-predicted. In the low-density range, the density of this kind of defect can reflect the zero-probability damage threshold well. The study exhibits the potential of this methodology to non-destructively detect the key absorbing defects on fused silica surfaces as well as evaluate and optimize the post-treatment level of fused silica optics for high-power laser applications.
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- 2022
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7. Effect of H2O2 Treatment on Mechanical and Mechanochemical Properties of Fused Silica
- Author
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Cai, Xinqi Liu, Lingyu Yin, Hongtu He, Youze Ma, Qiuju Zheng, Laixi Sun, Fang Wang, Jiaxin Yu, and Yong
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fused silica ,H2O2 ,indentation ,nanowear ,subsurface damage - Abstract
The surface properties of fused silica (FS) change after H2O2 treatment, but the surface and subsurface damage behaviors and their mechanisms under various physical contact conditions have not been elucidated yet. This work investigated the effect of H2O2 treatment on mechanical and mechanochemical properties of FS surface. The results show that the hydrophilicity and adsorbed water film thickness of the FS surface increase with the concentration of H2O2 solution. The surface damage, nanowear, and subsurface deformation of FS caused by indentation increase with the concentration of H2O2 solution, while the nanohardness and reduced modulus decrease. Further analysis revealed that the water activity on the FS surface plays a critical role in reducing the mechanical and mechanochemical properties. In addition, the treatment with H2O2 solution on the FS surface shows a weakly corrosive effect, which implies the H2O2 treatment can be an alternative method to remove the surface defects on FS optics.
- Published
- 2023
- Full Text
- View/download PDF
8. Fabrication and characterisation of geometry-controlled Cu microwires in porous poly(methyl methacrylate) templates using melt co-drawing and electrochemical deposition techniques
- Author
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Bo Yang, Laixi Sun, Wei Wei, Gao Niu, Shufan Chen, Weidong Wu, and Bo Li
- Subjects
Materials of engineering and construction. Mechanics of materials ,TA401-492 - Abstract
The fabrication of geometry-controlled Cu microwires (CuMWs) using melt co-drawing and electrochemical deposition techniques is reported in this study; the resulting CuMWs have good surface quality and integrity. By designing and arranging the poly(methyl methacrylate) (PMMA)/polystyrene (PS) and PMMA fibres artificially, porous PMMA templates with different coding orders (e.g. “1 × 1”, “3 × 3”, “5 × 5”, and “7 × 7”) are created after multi-step drawing followed by the dissolution of the inner PS. With these templates, coding arrays of CuMWs with diameters of 2–10 μm are fabricated. The geometries of the obtained templates and CuMWs arrays are shown to be consistent with the design values. This new approach extends the types and quality of CuMWs and makes it possible to devise extremely complex array structures with micro or even nano dimensions for diverse optical applications such as spectral sensing, laser phased arrays, and photonic crystal fibres. Keywords: PMMA template, Melt co-drawing, Cu microwires, Coding array, Fibre
- Published
- 2020
- Full Text
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9. Theoretical and Experimental Research on Laser-Induced Damage of Fused Silica Optics Due to Stimulated Brillouin Scattering
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Laixi Sun, Ruifang Ni, Handing Xia, Ting Shao, Jin Huang, Xin Ye, Xiaodong Jiang, and Linhong Cao
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Fused silica ,stimulated Brillouin scattering ,laser-induced damage ,surface. ,Applied optics. Photonics ,TA1501-1820 ,Optics. Light ,QC350-467 - Abstract
The damage behavior of fused silica optics induced by stimulated Brillouin scattering (SBS) was studied theoretically and experimentally based on a coupled-wave theory. The SBS-induced damage mechanism was systematically investigated by analyzing the evolutions of the Stokes-light intensity and induced stress as a function of laser pulse shape, thickness, and surface reflectance of the optics. The results show that the SBS-induced damage often occurs on the front surface of the fused silica optics. The Tophat beam has the most effect on an SBS-induced damage, followed by a focused Gaussian pulse. SBS effect is strongly thickness dependent, which is associated with the gain length. The SBS-induced damage can be efficiently suppressed by decreasing the surface reflection of the optics. Good agreements are obtained between the experimental and theoretical results, which strengthen our understanding of the damage mechanism of fused silica and provide a favorable reference for developing high-power laser systems.
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- 2018
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10. Fabrication of Polymer Composite Fibers Embedding Ultra-Long Micro/Nanowires
- Author
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Bo Yang, Dawei Pan, Laixi Sun, Shufan Chen, Weidong Wu, and Bo Li
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polymer composite fibers ,micro/nano porous array templates ,ultra-long micro/nanowires ,melt co-drawing ,Cu nanowires ,Chemistry ,QD1-999 - Abstract
Fabrication of polymer composite fibers embedding ultra-long micro/nanowires via an iterative melt co-drawing and bundling technique is reported in this study. The poly(methyl methacrylate) (PMMA) porous array templates were prepared with section-cutting the PMMA/polystyrene (PS) (shell/core) composite fibers and dissolution of inner PS. The results showed that the PS cores or pores in the PMMA matrix are regularly arranged with hexagonal, and their diameter and spacing exhibits a uniform distribution. Especially, the core diameter can be precisely controlled from millimeter-scale to nanometer-scale by multi-step melt co-drawing. Based on the PMMA porous array templates, the Cu nanowires were successfully prepared by electrochemical deposition. Moreover, to fabricate PMMA ultra-long micro/nanowires, the composite fibers with converse shell/core component of PS/PMMA were initially prepared, and then the outer PS was dissolved. The obtained PMMA micro/nanowires were characterized with smooth complete orientation structure. The study provides an experimental basis for fabricating such polymer composite fibers, micro/nano porous array templates, and micro/nanowires with precise and controllable manner to meet the real application requirements.
- Published
- 2021
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11. Evolution of Physical and Mechanical Properties of Fused Silica after Subsurface Damage Layer Removal by Rie Treatment
- Author
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Youze Ma, Qiuju Zheng, Fang Wang, Laixi Sun, Jinxi Yu, and Hongtu He
- Published
- 2023
12. Simulation analysis of spatial transmission of backward stimulated Brillouin scattered light in high power laser facilities
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Yizhang Ai, Zairu Ma, Ping Li, Bo Ren, Fang Wang, Hongjie Liu, Yuan Chen, Tianran Zheng, Laixi Sun, and Xuewei Deng
- Published
- 2022
13. Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
- Author
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Xin Ye, Jin Huang, Feng Geng, Laixi Sun, Hongjie Liu, Xiaodong Jiang, Weidong Wu, Xiaotao Zu, and Wanguo Zheng
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Subwavelength structures ,low-temperature thermal dewetting ,effective medium theory ,finite-difference time domains ,optical properties ,Applied optics. Photonics ,TA1501-1820 ,Optics. Light ,QC350-467 - Abstract
The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm.
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- 2016
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14. Optimizing cure temperature of polyimide flyer for exploding foil initiator applications
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Laixi Sun, Zhiqiang Zhan, Zhiqing Wu, Ruijiao Zou, Ye Zhu, Tao Yi, Jiangshan Luo, Gao Niu, Fan Lei, Jin Wang, Bo Yang, and Qiubo Fu
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Polymers and Plastics ,Materials Chemistry ,General Chemistry ,Surfaces, Coatings and Films - Published
- 2022
15. Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics
- Author
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Xin Ye, Li Weihua, Zhou Xinda, Ting Shao, Liming Yang, Bo Li, Shufan Chen, Jin Huang, Fenfei Li, Laixi Sun, and Wanguo Zheng
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Aqueous solution ,Fabrication ,Materials science ,business.industry ,General Chemical Engineering ,fungi ,technology, industry, and agriculture ,General Chemistry ,Laser ,Ion ,law.invention ,Optics ,law ,Etching (microfabrication) ,Surface roughness ,Reactive-ion etching ,business ,Absorption (electromagnetic radiation) - Abstract
The optical performance of fused silica optics used in high-power lasers is known to depend not only on their surface damage resistance, but also on their surface quality. Previous studies have shown that good fused silica damage performance and surface quality can be achieved by the use of reactive ion etching (RIE), followed by HF-based wet shallow etching (3 μm). In this study, two kinds of HF-based etchants (aqueous HF and HF/NH4F solutions) were employed to investigate the effect of HF-based etching on the optical performance of reactive-ion-etched fused silica surfaces at various HF-based shallow etching depths. The results showed that the addition of NH4F to HF solution makes it possible to produce a high-quality optical surface with a high laser-induced damage threshold, which is strongly associated with the surface roughness and fluorescence defect density. Additionally, changing the HF-based etching depth over the range from 1 μm to 3 μm can affect the surface damage resistance and absorption performance of RIE-treated fused silica. The light-scattering results indicate that the point defect density plays an important role in the determination of the HF-based etching depth. Understanding these trends can enable the advantages of the combined technique of RIE and HF-based etching during the fabrication of high-quality fused silica optics.
- Published
- 2021
16. Convenient and Efficient Fabrication of Colloidal Crystals Based on Solidification-Induced Colloidal Assembly
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Ting Shao, Laixi Sun, Chun Yang, Xin Ye, Shufan Chen, and Xuan Luo
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colloidal crystal ,nanoparticles ,solidification-induced ,colloidal crystallization ,Chemistry ,QD1-999 - Abstract
The simple yet efficient and versatile fabrication of colloidal crystals was investigated based on the solidification-induced colloidal crystallization process with particle/water suspension as precursor. The resulting colloidal crystals were constituted by crystal grains with sizes ranging from several tens of micrometers to a few millimeters. Each of the grains had a close-hexagonal array of colloids, which endowed the bulk colloidal crystal powders with some specific optical properties. The freezing of water was shown as the major driving force to form colloidal crystal grains, which supersaturated the solution with nanoparticles and thus induced the formation and growth of colloidal crystal seeds. This process is intrinsically different from those conventional methods based on shearing force, surface tension, columbic interaction or magnetic interaction, revealing a new strategy to fabricate colloidal crystals in a convenient and efficient way.
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- 2019
- Full Text
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17. Fabrication of Antireflective Nanostructures on a Transmission Grating Surface Using a One-Step Self-Masking Method
- Author
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Ting Shao, Feng Tang, Laixi Sun, Xin Ye, Junhui He, Liming Yang, and Wanguo Zheng
- Subjects
antireflection ,subwavelength structures ,self-masking etching ,transmission grating ,Chemistry ,QD1-999 - Abstract
Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements.
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- 2019
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18. Nanoindentation creep dependent deformation process of silica and soda lime silicate glass
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Yonglong Lai, Jinxi Yu, Laixi Sun, Fang Wang, Qiuju Zheng, and Hongtu He
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History ,Polymers and Plastics ,Materials Chemistry ,Ceramics and Composites ,Business and International Management ,Condensed Matter Physics ,Industrial and Manufacturing Engineering ,Electronic, Optical and Magnetic Materials - Published
- 2022
19. Role of graphene in enhancing indentation and scratch properties of soda lime silicate glass
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Fenglin Gu, Hongtu He, Laixi Sun, Fang Wang, Qiuju Zheng, and Jiaxin Yu
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Materials Chemistry ,Ceramics and Composites ,Condensed Matter Physics ,Electronic, Optical and Magnetic Materials - Published
- 2022
20. Combination of scanning ion beam etching and dynamic chemical etching for improving laser damage resistance of fused silica optics
- Author
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Ting Shao, Zhaohua Shi, Qingzhi Li, Weihua Li, Xin Ye, Laixi Sun, Liming Yang, and Wanguo Zheng
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Inorganic Chemistry ,Organic Chemistry ,Electrical and Electronic Engineering ,Physical and Theoretical Chemistry ,Atomic and Molecular Physics, and Optics ,Spectroscopy ,Electronic, Optical and Magnetic Materials - Published
- 2022
21. Towards Investigating Surface Quality of Single-Crystal Silicon Optics Polished with Different Processes
- Author
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Laixi Sun, Yubin Zhang, Xiaoyan Zhou, Miaomiao Duan, Xin Ye, Weihua Li, Yaguo Li, and Liming Yang
- Subjects
silicon ,SC images ,weak absorption ,defect detection ,Materials Chemistry ,Surfaces and Interfaces ,eye diseases ,Surfaces, Coatings and Films - Abstract
A series of cleaning and etching experiments utilizing organic solvent or weak alkali solutions were performed on single-crystal silicon optics polished with different processes. Polishing-introduced fractured defects in the subsurface layer were systematically characterized using laser-induced scattering imaging and photothermal weak absorption imaging techniques. A white-light interferometer also measured the surface morphology and roughness of the samples to evaluate the surface quality of the optics. The results show that the organic solvent cleaning process can eliminate the surface contamination resulting from the environment and the near-surface polishing-introduced impurities but can not remove the fractured defects in the subsurface layer of the optics. By contrast, weak alkali solution can effectively expose the subsurface defects and decrease the concentration of the embedded absorbing impurities to some extent. The results also imply that the polishing process has a crucial effect on the surface quality (e.g., surface roughness and error) and optical performance (e.g., surface absorption) after the subsequent treatments such as cleaning or etching. The corresponding methodology of cleaning and characterization can serve as a predictive tool for evaluating the polishing level and laser damage resistance of the single-crystal silicon optics.
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- 2022
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22. Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process
- Author
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Laixi Sun, Ting Shao, Zhaohua Shi, Jin Huang, Xin Ye, Xiaodong Jiang, Weidong Wu, Liming Yang, and Wanguo Zheng
- Subjects
fused silica ,contamination ,reactive ion etching ,laser damage ,optical performance ,Technology ,Electrical engineering. Electronics. Nuclear engineering ,TK1-9971 ,Engineering (General). Civil engineering (General) ,TA1-2040 ,Microscopy ,QH201-278.5 ,Descriptive and experimental mechanics ,QC120-168.85 - Abstract
The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique.
- Published
- 2018
- Full Text
- View/download PDF
23. Role of each step in the combined treatment of reactive ion etching and dynamic chemical etching for improving the laser-induced damage resistance of fused silica
- Author
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Wanguo Zheng, Jin Huang, Bo Li, Laixi Sun, Ting Shao, Liming Yang, Xin Ye, and Shi Zhaohua
- Subjects
Materials science ,business.industry ,Infrared spectroscopy ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Isotropic etching ,Atomic and Molecular Physics, and Optics ,law.invention ,010309 optics ,Inorganic salts ,Combined treatment ,Optics ,Chemical engineering ,law ,0103 physical sciences ,Optical surface ,Reactive-ion etching ,0210 nano-technology ,Luminescence ,business - Abstract
We investigate the role of each step in the combined treatment of reactive ion etching (RIE) and dynamic chemical etching (DCE) for improving the laser-induced damage resistance of fused silica optics. We employ various surface analytical methods to identify the possible damage precursors on fused silica surfaces treated with different processes (RIE, DCE, and their combination). The results show that RIE-induced defects, including F contamination, broken Si-O bonds, luminescence defects (i.e., NBOHCs and ODCs), and material densification, are potential factors that limit the improvement of laser-induced damage resistance of the optics. Although being capable of eliminating the above factors, the DCE treatment can achieve rough optical surface with masses of exposed scratches and pits which might serve as reservoirs of the deposits such as inorganic salts, thus limiting the further improvement in damage resistance of fused silica. The study guides us to a deep understanding of the laser-induced damage process in achieving fused silica optics with enhanced resistance to laser-induced damage by the combined treatment of RIE and DCE.
- Published
- 2021
24. Fabrication of Polymer Composite Fibers Embedding Ultra-Long Micro/Nanowires
- Author
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Shufan Chen, Dawei Pan, Yang Bo, Bo Li, Weidong Wu, and Laixi Sun
- Subjects
Cu nanowires ,Materials science ,Fabrication ,micro/nano porous array templates ,General Chemical Engineering ,Composite number ,Nanowire ,polymer composite fibers ,Article ,ultra-long micro/nanowires ,Core (optical fiber) ,lcsh:Chemistry ,chemistry.chemical_compound ,melt co-drawing ,chemistry ,lcsh:QD1-999 ,General Materials Science ,Polystyrene ,Methyl methacrylate ,Composite material ,Porosity ,Deposition (law) - Abstract
Fabrication of polymer composite fibers embedding ultra-long micro/nanowires via an iterative melt co-drawing and bundling technique is reported in this study. The poly(methyl methacrylate) (PMMA) porous array templates were prepared with section-cutting the PMMA/polystyrene (PS) (shell/core) composite fibers and dissolution of inner PS. The results showed that the PS cores or pores in the PMMA matrix are regularly arranged with hexagonal, and their diameter and spacing exhibits a uniform distribution. Especially, the core diameter can be precisely controlled from millimeter-scale to nanometer-scale by multi-step melt co-drawing. Based on the PMMA porous array templates, the Cu nanowires were successfully prepared by electrochemical deposition. Moreover, to fabricate PMMA ultra-long micro/nanowires, the composite fibers with converse shell/core component of PS/PMMA were initially prepared, and then the outer PS was dissolved. The obtained PMMA micro/nanowires were characterized with smooth complete orientation structure. The study provides an experimental basis for fabricating such polymer composite fibers, micro/nano porous array templates, and micro/nanowires with precise and controllable manner to meet the real application requirements.
- Published
- 2021
25. The investigation of the antireflection method and laser induced damage properties for perfluoroalkoxy copolymer film as short pulse laser debris shields
- Author
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Minglong Zhong, Laixi Sun, Qinghua Deng, Zhiqing Wu, Chaoyang Wang, and Shufan Chen
- Subjects
Mechanics of Materials ,Mechanical Engineering ,General Materials Science ,Condensed Matter Physics - Published
- 2022
26. Intramolecular charge transfer tuning of azo dyes: Spectroscopic characteristic and third-order nonlinear optical properties
- Author
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Weidong Wu, Laixi Sun, Huang Chuanqun, Shuang Ni, Yu Fang, Xuan Luo, Quanjie Zhong, Zhang Qingjun, Shufan Chen, Baili Chen, and Yinglin Song
- Subjects
Thermogravimetric analysis ,Materials science ,Process Chemistry and Technology ,General Chemical Engineering ,Hyperpolarizability ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Fluorescence spectroscopy ,0104 chemical sciences ,Intramolecular force ,Femtosecond ,Figure of merit ,Physical chemistry ,Molecule ,0210 nano-technology ,HOMO/LUMO - Abstract
Five novel azo dyes molecules with different intramolecular charge transfer (ICT) characters were synthesized and characterized. Their thermal stabilities were studied with thermogravimetric analysis (TGA). Their linear optical properties were investigated by Ultraviolet–visible (UV–Vis) and Fluorescence spectroscopy. △-Self-consistent-field density functional theoretical (SCF-DFT or simply △SCF) calculation and optical method were used to analyze the ICT strength of the azo Dyes 1, 2, 3, 4, 5, Disperse Red 1 (DR 1), DR 17 and DR 13. The fundamental gap, energy gaps (Eg) between HOMO and LUMO, optical gap falls down with the increase of the ICT strength. The third-order nonlinear optical (NLO) properties of azo dyes were investigated by Z-scan technique at the condition of 440 nm, 190 femtosecond, 20 Hz. The relationship between the third-order NLO properties and ICT character was discussed in detail. Going from dyes 1 → 2→3 → 4→5→DR 1→DR 17→DR 13, the Eg values decrease and the ICT strength increase. The third-order nonlinear susceptibility χ(3) and molecular second hyperpolarizability γ of the azo dyes are up to the order of 10−8 esu and 10−27 esu, respectively. The χ(3) and γ increase with the ICT strength. The Figures of Merit W » 1 and T « 1, meet the requirement of all-optical materials: W > 1 and T
- Published
- 2018
27. Fabrication and characterisation of geometry-controlled Cu microwires in porous poly(methyl methacrylate) templates using melt co-drawing and electrochemical deposition techniques
- Author
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Yang Bo, Laixi Sun, Bo Li, Shufan Chen, Weidong Wu, Wei Wei, and Gao Niu
- Subjects
Fabrication ,Materials science ,Mechanical Engineering ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Poly(methyl methacrylate) ,0104 chemical sciences ,chemistry.chemical_compound ,Template ,chemistry ,Chemical engineering ,Mechanics of Materials ,visual_art ,Nano ,visual_art.visual_art_medium ,lcsh:TA401-492 ,Deposition (phase transition) ,General Materials Science ,lcsh:Materials of engineering and construction. Mechanics of materials ,Polystyrene ,Methyl methacrylate ,0210 nano-technology ,Porosity - Abstract
The fabrication of geometry-controlled Cu microwires (CuMWs) using melt co-drawing and electrochemical deposition techniques is reported in this study; the resulting CuMWs have good surface quality and integrity. By designing and arranging the poly(methyl methacrylate) (PMMA)/polystyrene (PS) and PMMA fibres artificially, porous PMMA templates with different coding orders (e.g. “1 × 1”, “3 × 3”, “5 × 5”, and “7 × 7”) are created after multi-step drawing followed by the dissolution of the inner PS. With these templates, coding arrays of CuMWs with diameters of 2–10 μm are fabricated. The geometries of the obtained templates and CuMWs arrays are shown to be consistent with the design values. This new approach extends the types and quality of CuMWs and makes it possible to devise extremely complex array structures with micro or even nano dimensions for diverse optical applications such as spectral sensing, laser phased arrays, and photonic crystal fibres. Keywords: PMMA template, Melt co-drawing, Cu microwires, Coding array, Fibre
- Published
- 2020
28. Plasma-Induced, Self-Masking, One-Step Approach to an Ultrabroadband Antireflective and Superhydrophilic Subwavelength Nanostructured Fused Silica Surface
- Author
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Xiaodong Jiang, Fengrui Wang, Laixi Sun, Xin Ye, Junhui He, Ting Shao, Wanguo Zheng, Weidong Wu, and Jingjun Wu
- Subjects
010302 applied physics ,Materials science ,Nanostructure ,business.industry ,02 engineering and technology ,Substrate (electronics) ,021001 nanoscience & nanotechnology ,01 natural sciences ,Light scattering ,law.invention ,Anti-reflective coating ,Superhydrophilicity ,law ,0103 physical sciences ,Plasma parameter ,Optoelectronics ,General Materials Science ,Vacuum chamber ,Reactive-ion etching ,0210 nano-technology ,business - Abstract
In this work, antireflective and superhydrophilic subwavelength nanostructured fused silica surfaces have been created by one-step, self-masking reactive ion etching (RIE). Bare fused silica substrates with no mask were placed in a RIE vacuum chamber, and then nanoscale fluorocarbon masks and subwavelength nanostructures (SWSs) automatically formed on these substrate after the appropriate RIE plasma process. The mechanism of plasma-induced self-masking SWS has been proposed in this paper. Plasma parameter effects on the morphology of SWS have been investigated to achieve perfect nanocone-like SWS for excellent antireflection, including process time, reactive gas, and pressure of the chamber. Optical properties, i.e., antireflection and optical scattering, were simulated by the finite difference time domain (FDTD) method. Calculated data agree well with the experiment results. The optimized SWS show ultrabroadband antireflective property (up to 99% from 500 to 1360 nm). An excellent improvement of transmission was achieved for the deep-ultraviolet (DUV) range. The proposed low-cost, highly efficient, and maskless method was applied to achieve ultrabroadband antireflective and superhydrophilic SWSs on a 100 mm optical window, which promises great potential for applications in the automotive industry, goggles, and optical devices.
- Published
- 2018
29. Effect of CHF3/Ar Gas Flow Ratio on Self-masking Subwavelength Structures Prepared on Fused Silica Surface
- Author
-
Zao Yi, Jin Huang, Xiaodong Jiang, Geng Feng, Kuibao Zhang, Jibin Wen, Yong Zeng, Jingjun Wu, Laixi Sun, and Xin Ye
- Subjects
010302 applied physics ,chemistry.chemical_classification ,Materials science ,Argon ,Analytical chemistry ,chemistry.chemical_element ,02 engineering and technology ,Polymer ,021001 nanoscience & nanotechnology ,01 natural sciences ,chemistry.chemical_compound ,chemistry ,Etching (microfabrication) ,Sputtering ,0103 physical sciences ,General Materials Science ,Fluorocarbon ,Nanodot ,0210 nano-technology ,Fluoride ,Visible spectrum - Abstract
Based on an advanced technology, randomly-aligned subwavelength structures (SWSs) were obtained by a metal-nanodot-induced one-step self-masking reactive-ion-etching process on a fused silica surface. Metal-fluoride (mainly ferrous-fluoride) nanodots induce and gather stable fluorocarbon polymer etching inhibitors in the reactive-ion-etching polymers as masks. Metal fluoride (mainly ferrous fluoride) is produced by the sputtering of argon plasma and the ion-enhanced chemical reaction of metal atoms. With an increase in CHF3/Ar gas flow ratio, the average height of the SWSs increases, the number of SWSs per specific area increases and then decreases, and the optical transmittance of visible light increases and then decreases. The optimum CHF3/Ar gas flow ratio for preparing SWSs is 1:5.
- Published
- 2018
30. Theoretical and Experimental Research on Laser-Induced Damage of Fused Silica Optics Due to Stimulated Brillouin Scattering
- Author
-
Xin Ye, Ting Shao, Ruifang Ni, Linhong Cao, Laixi Sun, Xiaodong Jiang, Jin Huang, and Handing Xia
- Subjects
lcsh:Applied optics. Photonics ,Materials science ,stimulated Brillouin scattering ,Physics::Optics ,02 engineering and technology ,laser-induced damage ,01 natural sciences ,surface ,law.invention ,010309 optics ,Optics ,Brillouin scattering ,law ,0103 physical sciences ,lcsh:QC350-467 ,Electrical and Electronic Engineering ,business.industry ,lcsh:TA1501-1820 ,Fused silica ,021001 nanoscience & nanotechnology ,Laser ,Atomic and Molecular Physics, and Optics ,Experimental research ,0210 nano-technology ,business ,lcsh:Optics. Light - Abstract
The damage behavior of fused silica optics induced by stimulated Brillouin scattering (SBS) was studied theoretically and experimentally based on a coupled-wave theory. The SBS-induced damage mechanism was systematically investigated by analyzing the evolutions of the Stokes-light intensity and induced stress as a function of laser pulse shape, thickness, and surface reflectance of the optics. The results show that the SBS-induced damage often occurs on the front surface of the fused silica optics. The Tophat beam has the most effect on an SBS-induced damage, followed by a focused Gaussian pulse. SBS effect is strongly thickness dependent, which is associated with the gain length. The SBS-induced damage can be efficiently suppressed by decreasing the surface reflection of the optics. Good agreements are obtained between the experimental and theoretical results, which strengthen our understanding of the damage mechanism of fused silica and provide a favorable reference for developing high-power laser systems.
- Published
- 2018
31. Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics
- Author
-
Weidong Wu, Geng Feng, Xin Ye, Li Qingzhi, Wanguo Zheng, Hongjie Liu, Dunlu Sun, Jin Huang, Laixi Sun, Xiaodong Jiang, and Fengrui Wang
- Subjects
Fluorescence-lifetime imaging microscopy ,Multidisciplinary ,Materials science ,business.industry ,lcsh:R ,Magnetorheological finishing ,lcsh:Medicine ,02 engineering and technology ,Radiation ,021001 nanoscience & nanotechnology ,01 natural sciences ,Fluorescence ,Isotropic etching ,Article ,Pulsed laser deposition ,010309 optics ,Optics ,Attenuation coefficient ,Non destructive ,0103 physical sciences ,lcsh:Q ,0210 nano-technology ,business ,lcsh:Science - Abstract
The surface laser damage performance of fused silica optics is related to the distribution of surface defects. In this study, we used chemical etching assisted by ultrasound and magnetorheological finishing to modify defect distribution in a fused silica surface, resulting in fused silica samples with different laser damage performance. Non-destructive test methods such as UV laser-induced fluorescence imaging and photo-thermal deflection were used to characterize the surface defects that contribute to the absorption of UV laser radiation. Our results indicate that the two methods can quantitatively distinguish differences in the distribution of absorptive defects in fused silica samples subjected to different post-processing steps. The percentage of fluorescence defects and the weak absorption coefficient were strongly related to the damage threshold and damage density of fused silica optics, as confirmed by the correlation curves built from statistical analysis of experimental data. The results show that non-destructive evaluation methods such as laser-induced fluorescence and photo-thermal absorption can be effectively applied to estimate the damage performance of fused silica optics at 351 nm pulse laser radiation. This indirect evaluation method is effective for laser damage performance assessment of fused silica optics prior to utilization.
- Published
- 2017
32. Convenient and Efficient Fabrication of Colloidal Crystals Based on Solidification-Induced Colloidal Assembly
- Author
-
Yang Chun, Laixi Sun, Xuan Luo, Xin Ye, Ting Shao, and Shufan Chen
- Subjects
endocrine system ,Materials science ,General Chemical Engineering ,Communication ,digestive, oral, and skin physiology ,Nanoparticle ,Colloidal crystal ,complex mixtures ,law.invention ,Suspension (chemistry) ,lcsh:Chemistry ,Surface tension ,Crystal ,body regions ,Colloid ,lcsh:QD1-999 ,Chemical engineering ,law ,solidification-induced ,colloidal crystallization ,Particle ,General Materials Science ,nanoparticles ,colloidal crystal ,Crystallization - Abstract
The simple yet efficient and versatile fabrication of colloidal crystals was investigated based on the solidification-induced colloidal crystallization process with particle/water suspension as precursor. The resulting colloidal crystals were constituted by crystal grains with sizes ranging from several tens of micrometers to a few millimeters. Each of the grains had a close-hexagonal array of colloids, which endowed the bulk colloidal crystal powders with some specific optical properties. The freezing of water was shown as the major driving force to form colloidal crystal grains, which supersaturated the solution with nanoparticles and thus induced the formation and growth of colloidal crystal seeds. This process is intrinsically different from those conventional methods based on shearing force, surface tension, columbic interaction or magnetic interaction, revealing a new strategy to fabricate colloidal crystals in a convenient and efficient way.
- Published
- 2019
33. Capping a glass thin layer on the etched surface via plasma chemical vapor deposition for improving the laser damage performance of fused silica
- Author
-
Laixi Sun, Sun Yuancheng, Xiaodong Jiang, Shi Zhaohua, Weidong Wu, Jin Huang, Xin Ye, Changpeng Li, Fengrui Wang, Zhang Xiaoqiang, Song Xuefu, and Shufan Chen
- Subjects
Materials science ,business.industry ,fungi ,02 engineering and technology ,Chemical vapor deposition ,021001 nanoscience & nanotechnology ,01 natural sciences ,Hardness ,Atomic and Molecular Physics, and Optics ,010309 optics ,Optics ,Impurity ,Etching (microfabrication) ,0103 physical sciences ,Surface roughness ,Deposition (phase transition) ,Thin film ,Composite material ,0210 nano-technology ,business ,Buffered oxide etch - Abstract
Buffered HF-based etching can effectively improve the laser damage resistance of the fused silica, but deep etching would cause the deteriorations in surface roughness and hardness, and decrease the laser-induced damage threshold. Capping a glass thin layer on the etched surface via plasma chemical vapor deposition in one step could overcome those deteriorations. We found that the deposition of the glass thin layer can further reduce the impurity element contamination and the PL intensity while retaining the low subsurface defect density as well as for the deeply etched sample. The surface quality, surface hardness and the laser damage resistance of the fused silica can be significantly improved by the glass thin layer, which reveals the potential application in high power laser facility.
- Published
- 2019
34. Fabrication of Antireflective Nanostructures on a Transmission Grating Surface Using a One-Step Self-Masking Method
- Author
-
Feng Tang, Xin Ye, Junhui He, Liming Yang, Ting Shao, Wanguo Zheng, and Laixi Sun
- Subjects
Diffraction ,self-masking etching ,Materials science ,transmission grating ,General Chemical Engineering ,02 engineering and technology ,Grating ,01 natural sciences ,law.invention ,010309 optics ,lcsh:Chemistry ,antireflection ,Etching (microfabrication) ,law ,0103 physical sciences ,General Materials Science ,Diffraction grating ,Nanopillar ,business.industry ,Communication ,Fresnel equations ,021001 nanoscience & nanotechnology ,subwavelength structures ,Reflection (mathematics) ,Anti-reflective coating ,lcsh:QD1-999 ,Optoelectronics ,0210 nano-technology ,business - Abstract
Suppression of Fresnel reflection from diffraction grating surfaces is very important for many optical configurations. In this work, we propose a simple method to fabricate subwavelength structures on fused-silica transmission grating for optical antireflection. The fabrication is a one-step self-masking reaction ion etching (RIE) process without using any masks. According to effective medium theory, random cone-shaped nanopillars which are integrated on the grating surface can act as an antireflective layer. Effects of the nanostructures on the reflection and transmission properties of the grating were investigated through experiments and simulations. The nanostructure surface exhibited excellent antireflection performance, where the reflection of the grating surface was suppressed to zero over a wide range of incident angles. Results also revealed that the etching process can change the duty cycle of the grating, and thus the diffraction orders if there are oblique lateral walls. The simulation results were in good agreement with the experimental ones, which verified our physical comprehension and the corresponding numerical model. The proposed method would offer a low-cost and convenient way to improve the antireflective performance of transmission-diffractive elements.
- Published
- 2019
35. KOH-based shallow etching for exposing subsurface damage and increasing laser damage resistance of fused silica optical surface
- Author
-
Shufan Chen, Xin Ye, Jin Huang, Zhou Xinda, Ting Shao, Wanguo Zheng, Fenfei Li, Liming Yang, Laixi Sun, Li Weihua, and Bo Li
- Subjects
Potassium hydroxide ,Materials science ,Organic Chemistry ,technology, industry, and agriculture ,02 engineering and technology ,010402 general chemistry ,021001 nanoscience & nanotechnology ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,0104 chemical sciences ,Electronic, Optical and Magnetic Materials ,Inorganic Chemistry ,chemistry.chemical_compound ,chemistry ,Laser damage ,Etching (microfabrication) ,Optical surface ,Surface roughness ,Electrical and Electronic Engineering ,Physical and Theoretical Chemistry ,Composite material ,0210 nano-technology ,Spectroscopy - Abstract
HF-based wet deep etching is an effective method for improving the laser damage resistance of fused silica optics. However, the fact that the etching process involves HF reaction makes the operation very unsafe. Potassium hydroxide (KOH) has recently shown great potential to outperform the more commonly used HF-acid as an etchant for the damage resistance enhancement of fused silica optical surface. In this paper, we present a detailed investigation into how the KOH-based shallow etching process affects the polished surface of fused silica. The results show that KOH-based etching does a good job at exposing the subsurface damage and increasing the laser damage threshold of fused silica while keeping the surface roughness nearly unchanged. Potential factors that limit the further increase in surface damage threshold of fused silica are also delved. The study offers an exciting option for fabricating high-quality fused silica optics with shallow wet etching under higher safety conditions that cannot be achieved with conventional HF-based wet etching approaches.
- Published
- 2020
36. Subwavelength structures for high power laser antireflection application on fused silica by one-step reactive ion etching
- Author
-
Xin Ye, Wanguo Zheng, Zao Yi, Xiao-Tao Zu, Xiaodong Jiang, Jin Huang, Laixi Sun, Weidong Wu, and Geng Feng
- Subjects
Materials science ,Nanoparticle ,02 engineering and technology ,Substrate (electronics) ,01 natural sciences ,law.invention ,010309 optics ,chemistry.chemical_compound ,Optics ,law ,Etching (microfabrication) ,0103 physical sciences ,Electrical and Electronic Engineering ,Reactive-ion etching ,business.industry ,Mechanical Engineering ,Colloidal crystal ,021001 nanoscience & nanotechnology ,Laser ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Anti-reflective coating ,chemistry ,Optoelectronics ,Polystyrene ,0210 nano-technology ,business - Abstract
In this paper we report a simple method to fabricate a novel subwavelength structure surface on fused silica substrate using one-step reactive ion etching with two-dimensional polystyrene colloidal crystals as masks. The etching process and the morphologies of the obtained structure are controlled. We show that the period of the obtained fused silica pillar-like arrays were determined by the initial polystyrene nanoparticle size. The height of pillar arrays can be adjusted by controlling the etching duration, which is proved to be of importance in tailoring the antireflection properties of subwavelength structures surface. The novel subwavelength structures surface exhibit excellent broadband antireflection properties, but the size of the pillar affects the antireflective properties in short wavelength region. We anticipate this method would offer a convenient and scalable way for inexpensive and high-efficiency high power laser field designs.
- Published
- 2016
37. Broadband Antireflection Subwavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns
- Author
-
Xiaodong Jiang, Laixi Sun, Hongjie Liu, Jin Huang, Weidong Wu, Geng Feng, Wanguo Zheng, Xiaotao Zu, and Xin Ye
- Subjects
low-temperature thermal dewetting ,optical properties ,Diffraction ,Materials science ,Annealing (metallurgy) ,02 engineering and technology ,01 natural sciences ,Optics ,effective medium theory ,0103 physical sciences ,Transmittance ,finite-difference time domains ,Applied optics. Photonics ,Electrical and Electronic Engineering ,Reactive-ion etching ,Thin film ,Nanoscopic scale ,010302 applied physics ,Subwavelength structures ,business.industry ,Finite-difference time-domain method ,QC350-467 ,Optics. Light ,021001 nanoscience & nanotechnology ,Atomic and Molecular Physics, and Optics ,TA1501-1820 ,0210 nano-technology ,business ,Refractive index - Abstract
The antireflection (AR) performance and far-field transmittance, depending on the morphology and parameters of subwavelength structures (SWSs), have been investigated by a 3-D finite-difference time-domain (FDTD) method. It is found that far-field transmission characteristics are dominated mainly by period of SWSs. If the period is increased above 220 nm, the far-field transmittance rapidly decreases for a short-wavelength region. An effective and inexpensive method for fabricating disordered SWSs on fused silica has been demonstrated in this paper. An Au nanoscale island mask was formed by lower temperatures thermal dewetted at normal atmosphere. Then, a disordered SWS was fabricated by reactive ion etching (RIE). The average diameter of the Au nanoscale island was easily controlled by the thickness of Au thin films and annealing temperature. The etched depth and shape of fused silica SWSs depend additionally on RIE duration, thus achieving efficient AR characteristics. The measured data and calculated results obtained by the FDTD method exhibit reasonably similar tendencies. The optimized single-side fused silica SWS that is tapered on the tips leads to a significantly high transmissivity value of 96.2%. In addition, it exhibits a broadband AR property at a wavelength range of 400–1100 nm.
- Published
- 2016
38. Surface modification and etch process optimization of fused silica during reaction CHF3–Ar plasma etching
- Author
-
Xiaodong Jiang, Xin Ye, Wanguo Zheng, Fengrui Wang, Hongjie Liu, Laixi Sun, Weidong Wu, and Huang Jin
- Subjects
Plasma etching ,Materials science ,Analytical chemistry ,02 engineering and technology ,021001 nanoscience & nanotechnology ,01 natural sciences ,Fluence ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,Volumetric flow rate ,010309 optics ,Etching (microfabrication) ,0103 physical sciences ,Surface roughness ,Surface modification ,Electrical and Electronic Engineering ,Absorption (chemistry) ,0210 nano-technology ,Inertial confinement fusion - Abstract
The ability to predict and control the influence of reaction ion etching process parameters on laser damage resistance of fused silica optical components is vital for their development in specialized applications such as inertial confinement fusion. In this study, a set of experiments was designed and performed to determine an optimized process condition by characterizing the evolution of the surface roughness and absorption of the fused silica samples treated at various gas flow rates. The macroscopic morphology, carbon concentration and laser damage resistance of the etched surface was measured. The optimized surface was obtained when the gas flow rate R (CHF 3 /(CHF 3 + Ar)) decreased down to 38.4%. With the optimized etch process, the presence of subsurface defects known to lead to laser damage initiation was removed and prevented. The C atomic concentration of the sample surface etched was decreased by 64.7%. The laser damage resistance increased dramatically; the average threshold fluence for damage initiation increased from 6.79 J/cm 2 to 8.99 J/cm 2 .
- Published
- 2016
39. Effect of PVA coating on the electric field intensity distribution and laser damage performance of fused silica optics surfaces
- Author
-
Weidong Wu, Xiaodong Jiang, Changpeng Li, Laixi Sun, Wu Zhiqing, Li Qingzhi, Jin Huang, Shufan Chen, and Xin Ye
- Subjects
Materials science ,High power lasers ,business.industry ,Finite-difference time-domain method ,02 engineering and technology ,engineering.material ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,law.invention ,010309 optics ,Optics ,Laser damage ,Coating ,law ,Electric field ,0103 physical sciences ,engineering ,Thin film ,0210 nano-technology ,business ,Intensity (heat transfer) - Abstract
A facile method was proposed to enhance the laser damage performance of the fused silica optics by coating a PVA film on the rear surface of the optics. FDTD simulation result suggests that the PVA coating with suitable thickness can transfer the maximal electric field intensity from the rear surface to the interface between the coating and air, and reduce the electric field intensity of the rear surface remarkably. LIDT tests reveal that the LIDT of fused silica with PVA coating changed periodically with respect to the coating thickness, which agrees well with the tendency predicted by FDTD simulation. Finally, PVA coatings with a thickness of 60 nm and 300 nm can both improve the LIDT of AMP-treated fused silica by ~20%, which provide a potential to be applied in high power laser facility.
- Published
- 2018
40. Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching
- Author
-
Jin Huang, Xin Ye, Laixi Sun, Ting Shao, Jianfeng Xu, Jian Bai, Liming Yang, Xiaodong Jiang, Wanguo Zheng, and Xiangdong Zhou
- Subjects
Materials science ,Plasma etching ,business.industry ,General Chemical Engineering ,Transmission loss ,02 engineering and technology ,General Chemistry ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Isotropic etching ,law.invention ,010309 optics ,Etching (microfabrication) ,law ,0103 physical sciences ,Surface roughness ,Optoelectronics ,Degradation (geology) ,Laser beam quality ,0210 nano-technology ,business - Abstract
HF-based etching has been successful in mitigating damage precursors on the surface of fused silica optics used in high power lasers. However, wet etching generally leaves an etching trace leading to surface roughness, which seriously degrades laser beam quality (e.g., transmission loss and wave-front degradation). A way of addressing this issue is to apply plasma etching as a preprocessing step before HF etching, but so far very few studies have provided a practical scheme for engineering applications. In this work, we proposed a novel two-step scheme by combining reactive ion beam etching with dynamic chemical etching techniques. We demonstrate the combined scheme is capable of tracelessly mitigating the laser damage precursors on a fused silica surface. The 0% probability damage threshold obtained by combined etching is 1.4 times higher than that obtained by HF-based etching. The study opens a new approach towards high damage-resistant optics manufacturing and provides the potential possibility of exploring extreme interactions between high-power lasers and matter.
- Published
- 2018
41. Monolayer Colloidal Crystals by Modified Air-Water Interface Self-Assembly Approach
- Author
-
Xin Ye, Xiaodong Jiang, Wanguo Zheng, Yong Zeng, Laixi Sun, Hongjie Liu, Weidong Wu, Geng Feng, Fengrui Wang, and Jin Huang
- Subjects
Materials science ,General Chemical Engineering ,Dispersity ,Nanotechnology ,02 engineering and technology ,010402 general chemistry ,01 natural sciences ,Article ,lcsh:Chemistry ,Surface tension ,Colloid ,chemistry.chemical_compound ,Pulmonary surfactant ,monolayer ,Monolayer ,General Materials Science ,colloidal microspheres ,colloidal crystal ,self-assembly ,Colloidal crystal ,021001 nanoscience & nanotechnology ,0104 chemical sciences ,lcsh:QD1-999 ,Chemical engineering ,chemistry ,Polystyrene ,Self-assembly ,0210 nano-technology - Abstract
Hexagonally ordered arrays of polystyrene (PS) microspheres were prepared by a modified air-water self-assembly method. A detailed analysis of the air-water interface self-assembly process was conducted. Several parameters affect the quality of the monolayer colloidal crystals, i.e., the colloidal microsphere concentration on the latex, the surfactant concentration, the polystyrene microsphere diameter, the microsphere polydispersity, and the degree of sphericity of polystyrene microspheres. An abrupt change in surface tension was used to improve the quality of the monolayer colloidal crystal. Three typical microstructures, i.e., a cone, a pillar, and a binary structure were prepared by reactive-ion etching using a high-quality colloidal crystal mask. This study provides insight into the production of microsphere templates with flexible structures for large-area patterned materials.
- Published
- 2017
42. Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistance of fused silica optical surfaces
- Author
-
Jingjun Wu, Jin Huang, Liming Yang, Weidong Wu, Laixi Sun, Wanguo Zheng, Xiaodong Jiang, Hongjie Liu, and Xin Ye
- Subjects
Materials science ,business.industry ,02 engineering and technology ,Surface finish ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Isotropic etching ,Atomic and Molecular Physics, and Optics ,law.invention ,Ion ,010309 optics ,Optics ,Laser damage ,Etching (microfabrication) ,law ,0103 physical sciences ,Optical surface ,Composite material ,Reactive-ion etching ,0210 nano-technology ,business - Abstract
In this Letter, an effective combined process of reaction ion etching (RIE) and dynamic chemical etching (DCE) is applied for significantly improving the damage resistance of fused silica optics, while minimizing the removal amount. By optimizing the combination process and removal depth, a near-perfect optical surface of fused silica with relatively low roughness (
- Published
- 2016
43. Understanding the role of fluorine-containing plasma on optical properties of fused silica optics during the combined process of RIE and DCE
- Author
-
Xiaoyan Zhou, Liming Yang, Xin Ye, Wanguo Zheng, Ting Shao, Li Weihua, Fengrui Wang, Jin Huang, and Laixi Sun
- Subjects
Optics ,Plasma etching ,Materials science ,business.industry ,Surface roughness ,Surface modification ,Plasma ,Reactive-ion etching ,business ,Isotropic etching ,Layer (electronics) ,Atomic and Molecular Physics, and Optics ,Volumetric flow rate - Abstract
Reactive ion etching (RIE) is crucial for fabricating high-quality fused silica optics since this technique can be used as a first step before dynamic chemical etching (DCE) for tracelessly removing the fractured defects in subsurface layer. The final quality of the optics is dramatically influenced by the plasma etching condition but still lacks sufficient information for practical application. In this work, combination of RIE and DCE was investigated deeply on polished fused silica surface by changing the gas type and flow rate. We show that the proper choice of fluorine-containing plasma condition during the RIE process allows the simultaneous occurrence of high surface quality and a low concentration of etching-introduced defects on fused silica. This leads to an ultrahigh laser-induced damage threshold at 355 nm while substantially keeping the surface roughness unchanged. This study paves the way for designing and developing a next-generation surface modification ability of high-quality fused silica with the great potential for high-power laser application.
- Published
- 2019
44. Fabrication and properties of broadband antireflective coatings on inert perfluoropolymer films treated by inductively coupled oxygen plasma
- Author
-
Laixi Sun, Fan Yang, Weidong Wu, Xiaodong Jiang, Xin Ye, and Shufan Chen
- Subjects
Fabrication ,Materials science ,02 engineering and technology ,engineering.material ,010402 general chemistry ,01 natural sciences ,law.invention ,chemistry.chemical_compound ,Fluorinated ethylene propylene ,Optics ,Coating ,law ,Transmittance ,Absorption (electromagnetic radiation) ,Inert ,business.industry ,021001 nanoscience & nanotechnology ,Laser ,Atomic and Molecular Physics, and Optics ,0104 chemical sciences ,Anti-reflective coating ,chemistry ,engineering ,Optoelectronics ,0210 nano-technology ,business - Abstract
Fluorinated ethylene propylene (FEP) film is an attractive candidate for mitigating target debris in high-power laser systems due to its remarkable advantages such as low cost, low absorption, and high damage threshold. However, the inert surface with bad wettability presents an enormous challenge to realize optical antireflection. In this Letter, we experimentally demonstrate that broadband antireflection of FEP film can be achieved through combining oxygen plasma treatment and solgel coating techniques. By optimizing the plasma treating time and withdrawal rate during the coating process, the treated FEP film has 4.7% enhanced transmittance compared to the untreated sample. In this case, transmittance over 99% with wide wave bands ranging from 600 to 950 nm is achieved. The mechanism of broadband antireflection was revealed by investigating the fluorocarbon groups on the FEP surface. The applicable wave band of antireflective FEP film can be designed at will by changing plasma-treating conditions, which could open up a new avenue in the field of laser debris mitigation.
- Published
- 2018
45. Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics
- Author
-
Laixi Sun, Jin Huang, Liang Qiao, Hongjie Liu, Weidong Wu, Geng Feng, Xin Ye, Xiaotao Zu, Xiaodong Jiang, and Wanguo Zheng
- Subjects
chemistry.chemical_classification ,Multidisciplinary ,Materials science ,technology, industry, and agriculture ,Mineral acid ,02 engineering and technology ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Article ,law.invention ,010309 optics ,Laser damage ,chemistry ,stomatognathic system ,Scratch ,law ,Impurity ,0103 physical sciences ,Ultrasonic sensor ,Leaching (metallurgy) ,Composite material ,0210 nano-technology ,computer ,computer.programming_language - Abstract
The laser damage precursors in subsurface of fused silica (e.g. photosensitive impurities, scratches and redeposited silica compounds) were mitigated by mineral acid leaching and HF etching with multi-frequency ultrasonic agitation, respectively. The comparison of scratches morphology after static etching and high-frequency ultrasonic agitation etching was devoted in our case. And comparison of laser induce damage resistance of scratched and non-scratched fused silica surfaces after HF etching with high-frequency ultrasonic agitation were also investigated in this study. The global laser induce damage resistance was increased significantly after the laser damage precursors were mitigated in this case. The redeposition of reaction produce was avoided by involving multi-frequency ultrasonic and chemical leaching process. These methods made the increase of laser damage threshold more stable. In addition, there is no scratch related damage initiations found on the samples which were treated by Advanced Mitigation Process.
- Published
- 2016
46. Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics
- Author
-
Li Qingzhi, Ting Shao, Weidong Wu, Wanguo Zheng, Jin Huang, Laixi Sun, Liming Yang, Xin Ye, and Xiaodong Jiang
- Subjects
White light interferometry ,Materials science ,business.industry ,fungi ,technology, industry, and agriculture ,Polishing ,macromolecular substances ,02 engineering and technology ,021001 nanoscience & nanotechnology ,01 natural sciences ,Isotropic etching ,Atomic and Molecular Physics, and Optics ,010309 optics ,Optics ,stomatognathic system ,Etching (microfabrication) ,0103 physical sciences ,Surface roughness ,Degradation (geology) ,Reactive-ion etching ,0210 nano-technology ,business ,Laser-induced fluorescence - Abstract
We investigate the interest of combined process of reactive ion etching (RIE) and dynamic chemical etching (DCE) as a final step after polishing to improve the laser damage resistance of fused silica optics at the wavelength of 355 nm. The investigation is carried out on the polished fused silica optics by changing the RIE depth while keeping the DCE depth fixed. We evidence that the combined etching process can effectively remove the damage precursors on the fused silica surface and thus improve its laser-induced damage threshold exceeding the level of the deep HF-etched surface. The effects of the combined etching depth on the surface roughness and surface error are also studied systematically. We show that the combined shallow etching can achieve better overall surface quality. Deeper etching will cause surface quality degradation of the fused silica optics, which is believed to be associated with the chemical etching during the combined process. Given that HF acid processing will degrade the surface quality of fused silica optics, the combined shallow etching appears as a pertinent alternative to HF-based deep etching.
- Published
- 2018
47. Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process
- Author
-
Xin Ye, Laixi Sun, Liming Yang, Ting Shao, Wu Weidong, Shi Zhaohua, Xiaodong Jiang, Wanguo Zheng, and Jin Huang
- Subjects
Materials science ,fused silica ,laser damage ,02 engineering and technology ,medicine.disease_cause ,lcsh:Technology ,01 natural sciences ,Article ,010309 optics ,contamination ,Optics ,Etching (microfabrication) ,0103 physical sciences ,medicine ,reactive ion etching ,optical performance ,General Materials Science ,Reactive-ion etching ,lcsh:Microscopy ,lcsh:QC120-168.85 ,Electrode material ,lcsh:QH201-278.5 ,lcsh:T ,business.industry ,Plasma ,Contamination ,021001 nanoscience & nanotechnology ,Laser damage ,lcsh:TA1-2040 ,Scientific method ,lcsh:Descriptive and experimental mechanics ,lcsh:Electrical engineering. Electronics. Nuclear engineering ,lcsh:Engineering (General). Civil engineering (General) ,0210 nano-technology ,business ,lcsh:TK1-9971 ,Ultraviolet - Abstract
The reactive ion etching (RIE) process of fused silica is often accompanied by surface contamination, which seriously degrades the ultraviolet laser damage performance of the optics. In this study, we find that the contamination behavior on the fused silica surface is very sensitive to the RIE process which can be significantly optimized by changing the plasma generating conditions such as discharge mode, etchant gas and electrode material. Additionally, an optimized RIE process is proposed to thoroughly remove polishing-introduced contamination and efficiently prevent the introduction of other contamination during the etching process. The research demonstrates the feasibility of improving the damage performance of fused silica optics by using the RIE technique.
- Published
- 2018
48. Initial Damage and Damage Growth of KDP Crystals Induced by 355 nm Pulse Laser
- Author
-
Hongjie Liu, Xin Ye, Xiaodong Jiang, Dunlu Sun, Xiaoyan Zhou, Fengrui Wang, Laixi Sun, Wu Zhiqing, Wanguo Zheng, Jin Huang, and Deng Qinghua
- Subjects
010302 applied physics ,010309 optics ,Materials science ,business.industry ,0103 physical sciences ,Optoelectronics ,General Materials Science ,General Chemistry ,Condensed Matter Physics ,business ,01 natural sciences ,Pulsed laser deposition - Published
- 2018
49. Growth mechanism of one-step self-masking reactive-ion-etching (RIE) broadband antireflective and superhydrophilic structures induced by metal nanodots on fused silica
- Author
-
Geng Feng, Jin Huang, Li Qingzhi, Kuibao Zhang, Zao Yi, Jingjun Wu, Jibin Wen, Yong Zeng, Xin Ye, Laixi Sun, and Xiaodong Jiang
- Subjects
010302 applied physics ,chemistry.chemical_classification ,Materials science ,business.industry ,02 engineering and technology ,Polymer ,021001 nanoscience & nanotechnology ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,Nanoimprint lithography ,law.invention ,Optics ,Anti-reflective coating ,chemistry ,law ,Superhydrophilicity ,Etching (microfabrication) ,0103 physical sciences ,Optoelectronics ,Nanodot ,Reactive-ion etching ,0210 nano-technology ,business ,Electron-beam lithography - Abstract
This work presents a low-cost, simple, convenient, advanced technology to prepare large-area defect-free subwavelength structures (SWSs). SWSs were obtained by a metal-induced one-step self-masking RIE process on a fused-silica surface, in which metal-fluoride (mainly ferrous-fluoride) nanodots were used to induce and gather stable fluorocarbon polymer etching inhibitors in the RIE polymers as masks. The SWS growth processes are visible with an increase in etching time and some exhibit prominent broadband antireflective properties from the visible to the near-infrared wavelength range. Transmission in the 600-900-nm range increased from approximately 93% for the polished fused silica to above 99% for the double-side SWSs on fused silica. A theoretical simulation by a finite-difference time-domain method agreed well with the experiments. Moreover, the surface of the SWSs exhibits excellent superhydrophilic properties.
- Published
- 2018
50. Influence of bulk defects on bulk damage performance of fused silica optics at 355 nm nanosecond pulse laser
- Author
-
Hongjie Liu, Jin Huang, Xin Ye, Laixi Sun, Wanguo Zheng, Wu Zhiqing, Dunlu Sun, Xiaodong Jiang, Fengrui Wang, and Xiaoyan Zhou
- Subjects
Materials science ,Pulse (signal processing) ,business.industry ,Quantitative Biology::Tissues and Organs ,Bubble ,02 engineering and technology ,Nanosecond ,Nanosecond pulse ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Atomic and Molecular Physics, and Optics ,law.invention ,010309 optics ,Metal ,Optics ,Impurity ,law ,visual_art ,0103 physical sciences ,visual_art.visual_art_medium ,0210 nano-technology ,business ,Absorption (electromagnetic radiation) - Abstract
We demonstrate the effects of typical bulk defects in fused silica on the bulk damage threshold under nanosecond UV pulse in this study. A new test method is proposed to accurately evaluate laser induced bulk damage performance. The bulk bubble, hydroxyl, metal impurity, and weak absorption of the 355 nm laser are respectively characterized. The effects of bulk defects on bulk damage performance are analyzed statistically based on the correlation principle. For synthetic fused silica, metal impurities and hydroxyl have a weak correlation coefficient with the bulk damage threshold, while there is strong correlation between weak UV absorption and the bulk damage threshold. The influence of bulk damage threshold on surface damage performance is also discussed.
- Published
- 2017
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