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The demand for essential pixel components with ever-decreasing size and enhanced performance is central to current optoelectronic applications, including imaging, sensing, photovoltaics and communications. The size of the pixels, however, are severely limited by the fundamental constraints of lightwave diffraction. Current development using transmissive filters and planar absorbing layers can shrink the pixel size, yet there are two major issues, optical and electrical crosstalk, that need to be addressed when the pixel dimension approaches wavelength scale. All these fundamental constraints preclude the continual reduction of pixel dimensions and enhanced performance. Here we demonstrate subwavelength scale color pixels in a CMOS compatible platform based on anti-Hermitian metasurfaces. In stark contrast to conventional pixels, spectral filtering is achieved through structural color rather than transmissive filters leading to simultaneously high color purity and quantum efficiency. As a result, this subwavelength anti-Hermitian metasurface sensor, over 28,000 pixels, is able to sort three colors over a 100 nm bandwidth in the visible regime, independently of the polarization of normally-incident light. Furthermore, the quantum yield approaches that of commercial silicon photodiodes, with a responsivity exceeding 0.25 A/W for each channel. Our demonstration opens a new door to sub-wavelength pixelated CMOS sensors and promises future high-performance optoelectronic systems.

Threshold‐switching devices based on amorphous chalcogenides are considered for use as selector devices in 3D crossbar memories. However, the fundamental understanding of amorphous chalcogenide is hindered owing to the complexity of the local structures and difficulties in the trap analysis of multinary compounds. Furthermore, after threshold switching, the local structures gradually evolve to more stable energy states owing to the unstable homopolar bonds. Herein, based on trap analysis, DFT simulations, and operando XPS analysis, it is determined that the threshold switching mechanism is deeply related to the charged state of Se–Se homopolar defects. A threshold switching device is demonstrated with an excellent performance through the modification of the local structure via the addition of alloying elements and investigating the time‐dependent trap evolution. The results concerning the trap dynamics of local atomic structures in threshold switching phenomena may be used to improve the design of amorphous chalcogenides. [ABSTRACT FROM AUTHOR]

We report the integration of SrRuO3, one of the most widely used oxide electrode materials in functional oxide heterostructures, with silicon using molecular-beam epitaxy and an SrTiO3 buffer layer. The resulting SrRuO3 film has a rocking curve full width at half maximum of 0.01°, a resistivity at room temperature of 250 μΩ cm, a residual resistivity ratio (ρ300 K ρ4 K) of 11, and a paramagnetic-to-ferromagnetic transition temperature of ∼160 K. These structural, electrical, and magnetic properties compare favorably to the best reported values for SrRuO3 films on silicon and rival those of epitaxial SrRuO3 films produced directly on SrTiO3 single crystals by thin film growth techniques other than molecular-beam epitaxy. These high quality SrRuO3 films with metallic conductivity on silicon are relevant to integrating multi-functional oxides with the workhorse of semiconductor technology, silicon. [ABSTRACT FROM AUTHOR]

A low-temperature laser crystallization is newly devised for producing polycrystalline silicon (poly-Si) thin films of low-loss, low surface roughness enough for nanoscale patterning, applicable to practical Si metasurface elements on complementary metal-oxide semiconductor (CMOS) electronic architectures in visible lights. The method is based on dielectric encapsulation of an amorphous Si film and subsequent laser-induced local crystallization. Such poly-Si thin film yields order-of-magnitude smaller surface roughness and grain size than those obtained with the conventional laser annealing processes. The mechanism of the formation of small and uniform crystalline grains during solidification is studied to ensure the smooth surfaces enough for nanoscale patterning. By obtaining root mean square of surface roughness <2.49 nm and extinction coefficient <4.8 × 10 -2 at 550 nm, visible metasurface color-filter elements are experimentally demonstrated with the resonant transmission-peak efficiency approaching ∼85%. This low-loss poly-Si metasurface is favorably compatible with embedded CMOS electronic architectures in contrast to the conventional thermal annealing processes that often cause failure of electrical device functionalities due to delamination and material-property degradation problems. The proposed fabrication in this study provides a practical method for further development of various Si metasurfaces in the visible domain and their integration with CMOS electronic devices as well.

Transparent conducting electrodes (TCEs) based on silver nanowire (AgNW) networks possess high conductance, transmittance, and mechanical flexibility. However, due to the relatively high diffuse reflection of incident light on AgNWs, they cannot be practically implemented in displays requiring low pattern visibility. One promising strategy for solving this problem is to place an optical stack with high refractive index underneath the AgNW layer. In this work, AgNW-RuO 2 nanosheet hybrid TCEs with low diffuse reflections are fabricated using metallic RuO 2 nanosheets as undercoats. As predicted by theoretical simulations, RuO 2 nanosheets with high refractive indices reduce the diffuse reflections of AgNWs by almost 8%. Moreover, after the partial etching of AgNWs, the difference in the diffuse reflections of their etched and non-etched regions becomes equal to about 0.003, leading to the formation of an invisible pattern. The film consisting of micro-sized RuO 2 nanosheets is not damaged during etching, but instead forms a current path between different AgNWs broken by cyclic bending, resulting in a tenfold decrease in the resistance of the AgNW TCE after 170 000 cycles. Further, RuO 2 nanosheets suppress the diffusion of humid air from the outside, thus improving the environmental stability of the AgNW-RuO 2 nanosheet hybrid TCEs.