1. The correlation of the drain-source capacitance variation and the P-pillar structures in a 4H-SiC quasi super junction MOSFET.
- Author
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Wu, Ruei-Ci, Lee, Kung-Yen, Wen, Yan-Yu, and Liao, Pei-Chun
- Subjects
- *
METAL oxide semiconductor field-effect transistors , *FIELD-effect transistors - Abstract
In order to improve the trade-off between the 4H-SiC planar Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) and super junction MOSFET (SJ-MOSFET), particularly on the drain to source capacitance (C ds) which affects the switching performance, this study investigates the C ds of the quasi SJ-MOSFETs with various P-pillar widths, depths, and concentrations. The measured results show (1) when the N -type region between the P-pillars (Epi-1 region) is fully depleted, the C ds value abruptly drops, (2) when the N -type drift region beneath the P-pillar (Epi-2 region) is fully depleted, the slope of the C ds -V ds curve slowly changes because of the small extension of the depletion region in the P-type region. This is because the wider P-pillar width will increase the magnitude of the abrupt drop of the C ds and make the drop occur earlier; the abrupt drop of the C ds will occur later and the magnitude increases when the P-pillar depth is deeper due to the larger P-type region; Moreover, increasing the P-pillar concentration not only initiates the abrupt drop earlier and increases the magnitude, but also increases the minimum saturation value of the C ds at a higher reverse bias. This study also reveals that the mechanism of the C ds formation in a quasi SJ-MOSFET is different from the planar MOSFET and SJ-MOSFET. Finally, the simulated results are used to validate the influence of the P-pillar structures on the C ds – V ds curves in a quasi SJ-MOSFET. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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