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111 results on '"Lee, Seong-Eui"'

9. Enhancing the Plasma-Resistance Properties of Li 2 O–Al 2 O 3 –SiO 2 Glasses for the Semiconductor Etch Process via Alkaline Earth Oxide Incorporation.

Author

Kim, So-Won, Lee, Hwan-Seok, Jun, Deok-Sung, Lee, Seong-Eui, Lee, Joung-Ho, and Lee, Hee-Chul

Subjects
ALKALINE earth oxides, CHALCOGENIDE glass, FUSED silica, X-ray photoelectron spectroscopy, PLASMA etching, ALKALINE earth metals
Abstract

To develop plasma-resistant glass materials suitable for semiconductor etching processes, we introduced alkaline earth oxides (ROs) into a Li2O–Al2O3–SiO2 (LAS) glass. Analysis of glass properties with respect to the additives revealed that among the analyzed materials, the LAS material in which Li2O was partially replaced by MgO (MLAS) exhibited the most favorable characteristics, including a low dielectric constant (6.3) and thermal expansion coefficient (2.302 × 10−6/°C). The high performance of MLAS is attributed to the high ionic field strength of Mg2+ ions, which restricts the movement of Li+ ions under the influence of electric fields and thermal vibrations at elevated temperatures. When exposed to CF4/O2/Ar plasma, the etching speed of RO-doped glasses decreased compared with that of quartz and LAS glass, primarily owing to the generation of a high-sublimation-point fluoride layer on the surface. Herein, MLAS demonstrated the slowest etching speed, indicating exceptional plasma resistance. X-ray photoelectron spectroscopy analysis conducted immediately after plasma etching revealed that the oxidation-to-fluorination ratio of Li was the lowest for MLAS. This observation suggests that the presence of Mg2+ ions in the plasma discharge inhibits the migration of Li+ ions toward the surface, thereby contributing to the excellent plasma resistance of MLAS. [ABSTRACT FROM AUTHOR]

Published
2023
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21. The effect of the auxiliary electrode on the microplasma generated in a plasma display with a coplanar gap

Author

Kim, Seung Hun, Mun, Jeong Hun, Choi, Kyung Cheol, and Lee, Seong-Eui

Subjects
Electric discharges -- Research, Electric discharges through gases -- Research, Plasma dynamics -- Research, Business, Chemistry, Electronics, Electronics and electrical industries
Abstract

The microplasma modes generated in a plasma display with a coplanar gap and an auxiliary electrode were investigated using the discharge current peak time (discharge delay) and discharge current. Three types of modes were classified as follows: Mode 1) showed a decrease in both the discharge current and the discharge delay, Mode 2) showed a decrease in the discharge current and an increase in the discharge delay, and Mode 3) showed an increase in the discharge current and a decrease in the discharge delay. The infrared efficiency increased in Modes 1) and 2) with an increase in the auxiliary pulse voltage. However, in Mode 3), the IR efficiency started to decrease. According to the measurement results, Modes 1) and 2) are suitable for microplasma generated in a coplanar gap with an auxiliary electrode to obtain high efficacy. Index Terms--Auxiliary electrode, coplanar gap, discharge current peak time, discharge delay, infrared (IR) efficiency, IR peak time, microplasma, plasma display.

Published
2007

30. Effect of helium addition on discharge characteristics in a flat fluorescent lamp.

Author

Lee, Seong-Eui, Lee, Ho-Nyeon, Park, Hyoung-Bin, Lee, Kyo Sung, and Choi, Kyung Cheol

Subjects
*FLUORESCENT lighting, *FLUORESCENT lamps, *HELIUM, *INFRARED spectra, *BRIGHTNESS perception
Abstract

The discharge characteristics of a multielectrode dual coplanar in a mercury-free flat fluorescent lamp were investigated using brightness-efficiency measurement and the infrared (IR) spectrum and intensified charge coupled device (ICCD) characteristics. The level of brightness was above 14 900 cd/m2 under the conditions of neon-–50% xenon–8% He gas composition, 150 Torr pressure, and 20 kHz alternating current pulse. The ICCD results revealed a faster and wider discharge with a Ne–50% Xe–8% He gas composition. The effect of adding helium (He) to Ne–50% Xe revealed a faster peak emission, as confirmed by ICCD images. From the gated IR emission spectrum, the intensity ratio of I823 nm/I828 nm was ∼8% higher with Ne–50% Xe–8% He than with Ne–50% Xe under the same pressure and applied voltage conditions. [ABSTRACT FROM AUTHOR]

Published
2005
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