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$\mathrm{HfO_2}$-based dielectrics are promising for nanoscale ferroelectric applications, and the most favorable material within the family is Zr-substituted hafnia, i.e., $\mathrm{Hf_{1-x}Zr_xO_2}$ (HZO). The extent of Zr substitution can be great, and x is commonly set to 0.5. However, the band gap of $\mathrm{ZrO_2}$ is lower than $\mathrm{HfO_2}$, thus it is uncertain how the Zr content should influence the electronic band structure of HZO. A reduced band gap is detrimental to the cycling endurance as charge injection and dielectric breakdown would become easier. Another issue is regarding the comparison on the band gaps between $\mathrm{HfO_2}$/$\mathrm{ZrO_2}$ superlattices and HZO solid-state solutions. In this work we systematically investigated the electronic structures of $\mathrm{HfO_2}$, $\mathrm{ZrO_2}$ and HZO using self-energy corrected density functional theory. In particular, the conduction band minimum of $Pca2_1$-$\mathrm{HfO_2}$ is found to lie at an ordinary k-point on the Brillouin zone border, not related to any interlines between high-symmetry k-points. Moreover, the rule of HZO band gap variation with respect to x has been extracted. The physical mechanisms for the exponential reduction regime and linear decay regime have been revealed. The band gaps of $\mathrm{HfO_2}$/$\mathrm{ZrO_2}$ ferroelectric superlattices are investigated in a systematic manner, and the reason why the superlattice could possess a band gap lower than that of $\mathrm{ZrO_2}$ is revealed through comprehensive analysis., Comment: 23 pages, 9 figures

The wake-up phenomenon widely exists in hafnia-based ferroelectric capacitors, which causes device parameter variation over time. Crystallization at higher temperatures have been reported to be effective in eliminating wake-up, but high temperature may yield the monoclinic phase or generate high concentration oxygen vacancies. In this work, a unidirectional annealing method is proposed for the crystallization of $\mathrm{Hf_{0.5}Zr_{0.5}O_2}$ (HZO) superlattice ferroelectrics, which involves heating from the $\mathrm{Pt/ZrO_2}$ interface side. Nanoscale $\mathrm{ZrO_2}$ is selected to resist the formation of monoclinic phase, and the chemically inert Pt electrode can avoid the continuous generation of oxygen vacancies during annealing. It is demonstrated that $\mathrm{600^oC}$ annealing only leads to a moderate content of monoclinic phase in HZO, and the TiN/HZO/Pt capacitor exhibits wake-up free nature and a $2P_\mathrm{r}$ value of 27.4 $\mu\mathrm{C/cm^2}$. On the other hand, heating from the $\mathrm{TiN/HfO_2}$ side, or using $\mathrm{500^oC}$ annealing temperature, both yield ferroelectric devices that require a wake-up process. The special configuration of $\mathrm{Pt/ZrO_2}$ is verified by comparative studies with several other superlattice structures and HZO solid-state solutions. It is discovered that heating from the $\mathrm{Pt/HfO_2}$ side at $\mathrm{600^oC}$ leads to high leakage current and a memristor behavior. The mechanisms of ferroelectric phase stabilization and memristor formation have been discussed. The unidirectional heating method can also be useful for other hafnia-based ferroelectric devices., Comment: 16 pages, 7 figures

The highly non-linear switching behavior of hafnia memristor actually hinders its wide application in neuromorphic computing. Theoretical understanding into its switching mechanism has been focused on the processes of conductive filament generation and rupture, but possible phase transition and crystallization around the region of conductive filaments (CFs) due to the variation of O content have been paid less attention to. In this paper, HfO$\mathrm{_x}$ structural models covering the full stoichiometries from Hf to HfO$\mathrm{_2}$ were established, and the crystal structure evolution during the reduction process of hafnia was obtained through first-principles calculation. The electronic structures and O vacancy migration characteristics of these structures were analyzed. A criterion was prescribed to predict the mode of abrupt binary switching or gradual conductance modulation according to the structure evolution of the CFs. In particular, factors that influence the merging of tiny conductive channels into strong filaments are intensively discussed, including the anisotropy of O vacancy migration and the size effect. The feasibility of Mg doping to achieve robust gradual switching is discussed., Comment: 33 pages, 18 figures

Ferroelectricity observed in thin film $\mathrm{HfO_2}$, either doped with Si, Al, etc. or in the $\mathrm{Hf_{0.5}Zr_{0.5}O_2}$ form, has gained great technical significance. However, the soft mode theory faces a difficulty in explaining the origin of such ferroelectricity. In this work, we propose that the 7 cation coordination number of $\mathrm{HfO_2/ZrO_2}$ lies at the heart of this ferroelectricity, which stems from the proper ionic radii of Hf/Zr compared with O. Among the numerous compounds with non-centrosymmetric nature, e.g., $mm2$ point group, $\mathrm{HfO_2}$ and $\mathrm{ZrO_2}$ are special in that they are close to the border of 7 and 8 cation coordination, such that the 8-coordination tetragonal intermediate phase could greatly reduce the switching barrier. Other 7-coordination candidates, including $\mathrm{SrI_2}$, TaON, YSBr and YOF are also studied in comparison to $\mathrm{HfO_2}$/$\mathrm{ZrO_2}$, and six switching paths are analyzed in detail for the $Pca2_1$ phase. A rule of preferred switching path in terms of ionic radii ratio and coordination number has been established. We also show the possible route from ferroelectric $Pca2_1$ phase to monoclinic $P2_1/c$ phase in $\mathrm{HfO_2}$, which is relevant to the fatigue phenomenon., Comment: 14 pages, 4 figures