558 results on '"Mertens, Paul"'
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2. Non-uniformly receding contact line breaks axisymmetric flow patterns
3. Optimization of particle removal performance of dHF-based cleaning recipes
4. Implementation of the IMEC-cleaning in advanced CMOS manufacturing
5. Ultra Clean Processing of Semiconductor Surfaces XV
6. The circuit architecture of cortical multisensory processing: Distinct functions jointly operating within a common anatomical network
7. Monitoring of Trace Molecular Impurities in Clean-Room Air
8. Socioeconomic differences in caesarean section – are they explained by medical need? An analysis of patient record data of a large Kenyan hospital
9. Effects of Arc/Arg3.1 gene deletion on rhythmic synchronization of hippocampal CA1 neurons during locomotor activity and sleep
10. Ultra Clean Processing of Semiconductor Surfaces XIV
11. Coherent mapping of position and head direction across auditory and visual cortex
12. Direct correlation between the measured electrochemical capacitance, wettability and surface functional groups of CarbonNanosheets
13. List of Contributors
14. Overview of Wafer Contamination and Defectivity
15. Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch and below
16. Ultra Clean Processing of Semiconductor Surfaces XIII
17. Peter Iljitsch Tschaikowsky (Petr Il’ic Čajkovskij)
18. Contributors
19. Ultra Clean Processing of Semiconductor Surfaces XII
20. Coherent mapping of position and head direction across auditory and visual cortex
21. Quantitative Modelling of Residual Molecular Contamination in Low-Pressure Processing Environments.
22. An analytical model to describe the efficiency of an immersion rinsing process
23. Recombinant P-selectin glycoprotein ligand–immunoglobulin, a P-selectin antagonist, as an adjunct to thrombolysis in acute myocardial infarction. The P-Selectin Antagonist Limiting Myonecrosis (PSALM) trial
24. Ultra Clean Processing of Semiconductor Surfaces XI
25. Ultra Clean Processing of Semiconductor Surfaces IX
26. A Detailed Study of Semiconductor Wafer Drying
27. Overview of Wafer Contamination and Defectivity
28. Non-uniformly receding contact line breaks axisymmetric flow patterns
29. Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
30. Photoresist Characterization and Wet Strip after Low-k Dry Etch
31. The Removal of Silica Particles from Micron Wide Trenches by Megasonic Cleaning
32. Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes
33. Aging Phenomena in the Removal of Nano-Particles from Si Wafers
34. Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
35. Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
36. Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
37. Galvanic Corrosion of Stacked Metal Gate Electrodes during Cleaning in HF Solutions
38. Effect of Dopants on the Dissolution Behavior of Silicon Substrates in HF-Based Cleaning Solutions
39. Particle-Substrate Interaction Forces in a Non-Polar Liquid
40. Particle Deposition and Removal from Ge Wafers
41. Ultra Clean Processing of Semiconductor Surfaces VIII
42. A Study of the Influence of Typical Wet Chemical Treatments on the Germanium Wafer Surface
43. Performance of a Linear Single Wafer IPA Vapour Based Drying System
44. Metal Contamination on Silicon Surfaces from Solvents
45. A Force Study in Brush Scrubbing
46. Evaluation of Megasonic Cleaning for Sub-90nm Technologies
47. Megasonics: A Cavitation Driven Process
48. Influences of Oxide Loss on Contamination Removal
49. Ultra Clean Processing of Silicon Surfaces VII
50. The Impact of Backside Particles on the Limits of Optical Lithography
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