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3. Humidity‐Controlled Molecular Assembly and Photoisomerization Behavior with a Bubble‐Assisted Patterning Approach

5. Bubble wall confinement–driven molecular assembly toward sub–12 nm and beyond precision patterning

7. Volatile Dual‐Solvent Assisted Intermediate Phase Regulation for Anti‐Solvent‐Free Perovskite Photovoltaics.

12. pH-Control as a way to fine-tune the Cu/Cu2O ratio in radiation induced synthesis of Cu2O particles.

13. Volatile Dual-Solvent Assisted Intermediate Phase Regulation for Anti-Solvent-Free Perovskite Photovoltaics.

14. A Bubble-Assisted Approach for Patterning Nanoscale Molecular Aggregates.

15. pH-Control as a way to fine-tune the Cu/Cu 2 O ratio in radiation induced synthesis of Cu 2 O particles.

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