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387 results on '"Morawe, Christian"'

1. Differential deposition applied to x-ray mirror substrate

Author

Bras, Patrice, Labouré, Sylvain, Vivo, Amparo, Perrin, François, and Morawe, Christian

Subjects
Physics - Applied Physics
Abstract

The process of differential deposition is currently applied at the ESRF in order to correct figure errors of x-ray optics substrates, prior to multilayer deposition. The substrate is moved at a controlled speed in front of a sputtering source to precisely control the deposition profile. This work will describe the concept of differential deposition at the ESRF as well as recent results of its implementation to correct a real mirror substrate surface. Finally, initial studies using a synchrotron beamline characterization technique based on x-ray total reflection are presented., Comment: 6 pages, 7 figures, SPIE Optics + Optoelectronics 2023, Prague

Published
2023
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6. Development of an advanced in‐line multilayer deposition system at Diamond Light Source.

Author

Wang, Hongchang, Majhi, Arindam, Tan, Wai Jue, Singhapong, Wadwan, Morawe, Christian, and Sawhney, Kawal

Subjects
SYNCHROTRON radiation, LIGHT sources, VACUUM chambers, SUBSTRATES (Materials science), ENGINEERING instruments
Abstract

A state‐of‐the‐art multilayer deposition system with a 4200 mm‐long linear substrate translator housed within an ultra‐high vacuum chamber has been developed. This instrument is engineered to produce single and multilayer coatings, accommodating mirrors up to 2000 mm in length through the utilization of eight rectangular cathodes. To ensure the quality and reliability of the coatings, the system incorporates various diagnostic tools for in situ thickness uniformity and stress measurement. Furthermore, the system features an annealing process capable of heating up to 700°C within the load‐lock chamber. The entire operation, including pump down, deposition and venting processes, is automated through user‐friendly software. In addition, all essential log data, power of sputtering source, working pressure and motion positions are automatically stored for comprehensive data analysis. Preliminary commissioning results demonstrate excellent lateral film thickness uniformity, achieving 0.26% along the translation direction over 1500 mm in dynamic mode. The multilayer deposition system is poised for use in fabricating periodic, lateral‐graded and depth‐graded multilayers, specifically catering to the beamlines for diverse scientific applications at Diamond Light Source. [ABSTRACT FROM AUTHOR]

Published
2024
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11. Specially Designed Multilayers

Author

Larruquert, Juan I., Michette, Alan G., Borel, Christine, Morawe, Christian, Vidal, Bernard, Rhodes, William T., editor, Erko, Alexei, editor, Idir, Mourad, editor, Krist, Thomas, editor, and Michette, Alan G., editor

Published
2008
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12. Multilayers with Ultra-Short Periods

Author

Jergel, Matej, Majková, Eva, Borel, Christine, Morawe, Christian, MaŤko, Igor, Rhodes, William T., editor, Erko, Alexei, editor, Idir, Mourad, editor, Krist, Thomas, editor, and Michette, Alan G., editor

Published
2008
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14. X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films.

Author

Bras, Patrice, Morawe, Christian, Labouré, Sylvain, Perrin, François, Vivo, Amparo, and Barrett, Raymond

Subjects
*THIN film deposition, *MAGNETRON sputtering, *ROOT-mean-squares, *MIRRORS, *SURFACE roughness
Abstract

Differential deposition by DC magnetron sputtering was applied to correct for figure errors of X-ray mirrors to be deployed on low-emittance synchrotron beamlines. During the deposition process, the mirrors were moved in front of a beam-defining aperture and the required velocity profile was calculated using a deconvolution algorithm. The surface figure was characterized using conventional off-line visible-light metrology instrumentation (long trace profiler and Fizeau interferometer) before and after the deposition. WSi2 was revealed to be a promising candidate material since it conserves the initial substrate surface roughness and limits the film stress to acceptable levels. On a 300 mm-long flat Si mirror the average height errors were reduced by a factor of 20 down to 0.2 nm root mean square. This result shows the suitability of WSi2 for differential deposition. Potential promising applications include the upgrade of affordable, average-quality substrates to the standards of modern synchrotron beamlines. [ABSTRACT FROM AUTHOR]

Published
2023
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15. The ALS interferometric microscope upgraded for measurements with large x-ray optics and optical assemblies

Author

Lacey, I, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Lacey, I, Anderson, K, Barnard, H, English, D, McKinney, WR, Saeed, MA, Yashchuk, VV, Lacey, I, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Lacey, I, Anderson, K, Barnard, H, English, D, McKinney, WR, Saeed, MA, and Yashchuk, VV

Abstract

We describe details of a recent deep upgrade of the MicroMap-570 interferometric microscope available at the Advanced Light Source X-Ray Optics Laboratory. The upgrade has included an improvement of the microscope optical sensor and data acquisition software, design and implementation of automated optic alignment and microscope translation systems, and development of a specialized software for data processing in the spatial frequency domain. With the upgraded microscope, we are now capable for automated (remoted) measurements with large x-ray optics and optical systems. The results of experimental evaluation of the upgraded microscope performance and calibration of its instrument transfer function are also discussed. Because the same already obsolete MicroMap-570 microscopes have been used for years at other metrology laboratories at the x-ray facilities around the globe, we believe that our experience on upgrade of the microscope describe in detail in the present paper is broadly interesting and useful.

Published
2022

16. Reliability investigation of the instrument transfer function calibration technique based on binary pseudo-random array standards

Author

Yashchuk, VV, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Yashchuk, VV, Munechika, K, Rochester, S, Chao, W, Lacey, I, Pina-Hernandez, C, Takacs, PZ, Yashchuk, VV, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Yashchuk, VV, Munechika, K, Rochester, S, Chao, W, Lacey, I, Pina-Hernandez, C, and Takacs, PZ

Abstract

The reliability of the instrument transfer function (ITF) calibration technique based on binary pseudo-random array (BPRA) standards is investigated and demonstrated in application to interferometric microscopes. We demonstrate the linearity of the calibration (that is, independence of the ITF calibration on the standards root-mean-square roughness) via comparison of the ITF measurements with a number of artifacts with the etched depth varying from 30 nm to 120 nm. We also show that the calibration does not depend on the surface reflectivity, at least in the range between ∼36% and ∼80%. The criteria for selection of the geometrical parameters of the BPRA standard design appropriate for a particular interferometric microscope arrangement (including optical magnification), as well as the data acquisition and analysis procedures for different applications are also discussed.

Published
2022

17. Fabrication of low blaze angle gratings by replication and plasma etch

Author

Park, S, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Park, S, Voronov, DL, Wojdyla, A, Gullikson, EM, Salmassi, F, Padmore, HA, Park, S, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Park, S, Voronov, DL, Wojdyla, A, Gullikson, EM, Salmassi, F, and Padmore, HA

Abstract

We suggest a new method of making ultra-low blaze angle gratings for synchrotron application. The method is based on reduction of the blaze angle of a master grating by replication followed by a plasma etch. A master blazed grating with a relatively large blaze angle is fabricated by anisotropic wet etching of a Si single crystal substrate. The surface of the master grating is replicated by a polymer material on top of a quartz substrate by nanoimprinting and then transferred into quartz by a plasma etch. Then a 2nd nanoimprint step is applied to transfer the saw-tooth surface into a resist layer on top of a Si grating substrate. The plasma etch through the patterned resist layer provides transfer of the grooves into the Si substrate and results in reduction of the blaze angle due to the difference in etch rates of the resist and Si. We investigated the impact of the replication process on the groove shape, facet surface roughness, and diffraction efficiency of the fabricated 200 lines/mm low blaze angle grating.

Published
2022

18. Towards super-resolution interference microscopy metrology of x-ray variable-line-spacing diffraction gratings: Recent developments

Author

Rochester, S, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Rochester, S, English, D, Lacey, I, Munechika, K, Yashchuk, VV, Rochester, S, Mimura, Hidekazu1, Morawe, Christian, Khounsary, Ali M, Rochester, S, English, D, Lacey, I, Munechika, K, and Yashchuk, VV

Abstract

We report on recent work towards improving interference microscopy metrology of variable-line-spacing (VLS) x-ray diffraction gratings through a combination of techniques: image reconstruction to correct for distortion and blurring, multi-image super-resolution data acquisition to increase resolution beyond the single-image limit, and image stitching to increase the measurement area. Here, we concentrate on precision characterization and correction for lens distortion (aka geometrical distortion) and provide precise measurements of the effective image pixel distribution. We present and analyze the results of geometrical distortion measurements performed with test samples, including traditional checkerboard test artifacts and binary pseudo-random array (BPRA) standards patterned with two-dimensional uniformly redundant arrays (URA). The URA BPRA standards are also useful for measurement of the instrument transfer function (ITF), a measure of the optical aberrations and limited lateral resolution of the instrument. We also outline other essential elements and the next steps of the project on development of so-called super-resolution interference microscopy, enabling more precise measurements of VLS groove density than previously possible. The global aim of this project is to integrate our metrology technique into the manufacture of high-resolution x-ray gratings.

Published
2022

25. ID23-2: an automated and high-performance microfocus beamline for macromolecular crystallography at the ESRF. Corrigendum

Author

Nanao, Max, primary, Basu, Shibom, additional, Zander, Ulrich, additional, Giraud, Thierry, additional, Surr, John, additional, Guijarro, Matias, additional, Lentini, Mario, additional, Felisaz, Franck, additional, Sinoir, Jeremy, additional, Morawe, Christian, additional, Vivo, Amparo, additional, Beteva, Antonia, additional, Oscarsson, Marcus, additional, Caserotto, Hugo, additional, Dobias, Fabien, additional, Flot, David, additional, Nurizzo, Didier, additional, Gigmes, Jonathan, additional, Foos, Nicolas, additional, Siebrecht, Ralf, additional, Roth, Thomas, additional, Theveneau, Pascal, additional, Svensson, Olof, additional, Papp, Gergely, additional, Lavault, Bernard, additional, Cipriani, Florent, additional, Barrett, Ray, additional, Clavel, Carole, additional, and Leonard, Gordon, additional

Published
2022
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26. Optical properties of boron carbide near the boron K edge evaluated by soft-x-ray reflectometry from a Ru/[B.sub.4]C multilayer

Author

Ksenzov, Dmitriy, Panzner, Tobias, Schlemper, Christoph, Morawe, Christian, and Pietsch, Ullrich

Subjects
Optics -- Research, Reflection (Optics) -- Observations, Acoustooptical devices -- Methods, Acoustooptical devices -- Usage, Carbides -- Optical properties, Carbides -- Usage, Astronomy, Physics
Abstract

Soft-x-ray Bragg reflection from two Ru/[B.sub.4]C multilayers with 10 and 63 periods was used for independent determination of both real and imaginary parts of the refractive index n = 1 - [delta] + i[delta] close to the boron K edge (~188 eV). Prior to soft x-ray measurements, the structural parameters of the multilayers were determined by x-ray reflectometry using hard x rays. For the 63-period sample, the optical properties based on the predictions made for elemental boron major deviations were found close to the K edge of boron for the 10-period sample explained by chemical bonding of boron to [B.sub.4]C and various boron oxides. OCIS codes: 120.4530, 310.6860, 340.7470.

Published
2009

29. The Nanodiffraction beamline ID01/ESRF: A microscope for imaging strain and structure

Author

Leake, Steven J., Chahine, Gilbert A., Djazouli, Hamid, Zhou, Tao, Richter, Carsten, Hilhorst, Jan, Petit, Lucien, Richard, Marie-Ingrid, Morawe, Christian, Barrett, Raymond, Zhang, Lin, Homs-Regojo, Roberto A., Favre-Nicolin, Vincent, Boesecke, Peter, and Schülli, Tobias U.

Subjects
X-ray, scanning microscopy, Beamlines, Bragg diffraction, full-field microscopy, coherent diffraction imaging
Abstract

The ID01 beamline has been built to combine Bragg diffraction with imaging techniques to produce a strain and mosaicity microscope for materials in their native or operando state. A detailed description of the beamline from source to sample is provided and serves as a reference for the user community., The ID01 beamline has been built to combine Bragg diffraction with imaging techniques to produce a strain and mosaicity microscope for materials in their native or operando state. A scanning probe with nano-focused beams, objective-lens-based full-field microscopy and coherent diffraction imaging provide a suite of tools which deliver micrometre to few nanometre spatial resolution combined with 10−5 strain and 10−3 tilt sensitivity. A detailed description of the beamline from source to sample is provided and serves as a reference for the user community. The anticipated impact of the impending upgrade to the ESRF – Extremely Brilliant Source is also discussed.

Published
2019

30. Performance simulations for the ground-based, expanded-beam x-ray source BEaTriX

Author

Morawe, Christian, Khounsary, Ali M., Goto, Shunji, Spiga, Daniele, Salmaso, Bianca, Basso, Stefano, Ghigo, Mauro, Sironi, Giorgia, Vecchi, Gabriele, Cotroneo, Vincenzo, Conconi, Paolo, Pareschi, Giovanni, Tagliaferri, Gianpiero, Bavdaz, Marcos, Ferreira, Ivo, Arcangeli, Luigina, Rossi, Massimilano, Burwitz, Vadim, Rukdee, Surangkhana, Hartner, Gisela, Mueller, Thomas, Schmidt, Thomas, Langmeier, Andreas, Della Monica Ferreira, Desiree, Gellert, Nis C., Massahi, Sonny, Christensen, Finn E., Morawe, Christian, Khounsary, Ali M., Goto, Shunji, Spiga, Daniele, Salmaso, Bianca, Basso, Stefano, Ghigo, Mauro, Sironi, Giorgia, Vecchi, Gabriele, Cotroneo, Vincenzo, Conconi, Paolo, Pareschi, Giovanni, Tagliaferri, Gianpiero, Bavdaz, Marcos, Ferreira, Ivo, Arcangeli, Luigina, Rossi, Massimilano, Burwitz, Vadim, Rukdee, Surangkhana, Hartner, Gisela, Mueller, Thomas, Schmidt, Thomas, Langmeier, Andreas, Della Monica Ferreira, Desiree, Gellert, Nis C., Massahi, Sonny, and Christensen, Finn E.

Abstract

The BEaTriX (Beam Expander Testing X-ray) facility, being completed at INAF-Brera Astronomical Observatory, will represent an important step in the acceptance roadmap of Silicon Pore Optics mirror modules, and so ensure the final angular resolution of the ATHENA X-ray telescope. Aiming at establishing the final angular resolution that can be reached and the respective fabrication/positioning tolerances, we have been dealing with a set of comprehensive optical simulations. Simulations based on wave optics were carried out to predict the collimation performances of the paraboloidal mirror, including the effect of surface errors obtained from metrology. Full-ray-tracing routines were subsequently employed to simulate the full beamline. Finally, wavefront propagation simulation allowed us assessing the sensitivity and the response of a wavefront sensor that will be utilized for the qualification of the collimated beam. We report the simulation results and the methodologies we adopted.

Published
2021

31. Studying the onset of galvanic steel corrosion in situ using thin films: film preparation, characterization and application to pitting

Author

Garai, Debi, primary, Solokha, Vladyslav, additional, Wilson, Axel, additional, Carlomagno, Ilaria, additional, Gupta, Ajay, additional, Gupta, Mukul, additional, Reddy, V Raghavendra, additional, Meneghini, Carlo, additional, Carla, Francesco, additional, Morawe, Christian, additional, and Zegenhagen, Jörg, additional

Published
2021
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