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Recent studies show disordered materials such as amorphous silicon (a-Si), in spite of their low mobility, can efficiently amplify photocurrent via carrier multiplication process. Detectors with a thin (~40nm) a-Si multiplication layer has demonstrated single photon sensitivity at high speed under room temperature. It is believed that the abundance of bandtail states that cause low mobility of the amorphous materials actually contribute to the detector’s superior performance because carrier impact ionization involving these states, which can be modeled by donor-acceptor pairs (DAPs), relax the k-selection rule of the many-body carrier multiplication process. Our paper presents a theoretical framework to calculate the carrier multiplication process in a-Si or other disordered materials involving DAPs. Our analysis also establishes the relations between detector characteristics and key parameters such as the density of band tail states, layer thickness, and applied electric field. DAP assisted carrier multiplication rate is computed first. Carrier multiplication coefficients for electrons and holes under given applied field are then calculated using a trial distribution function that satisfies both the continuity equation and the energy balance equation. Our analysis shows that thinner a-Si gives rise to higher multiplication efficiency than thicker a-Si because of its higher carrier kinetic energy when the layer thickness is shorter than the length of energy relaxation by phonon scattering. Using the calculated carrier multiplication coefficients, voltage dependent gain of the device is computed and the results agree well with the measured results of a-Si cycling excitation process (CEP) detectors. [ABSTRACT FROM AUTHOR]

Since impact ionization was observed in semiconductors over half a century ago, avalanche photodiodes (APDs) using impact ionization in a fashion of chain reaction have been the most sensitive semiconductor photodetectors. However, APDs have relatively high excess noise, a limited gain-bandwidth product, and high operation voltage, presenting a need for alternative signal amplification mechanisms of superior properties. As an amplification mechanism, the cycling excitation process (CEP) was recently reported in a silicon p-n junction with subtle control and balance of the impurity levels and profiles. Realizing that CEP effect depends on Auger excitation involving localized states, we made the counter intuitive hypothesis that disordered materials, such as amorphous silicon, with their abundant localized states, can produce strong CEP effects with high gain and speed at low noise, despite their extremely low mobility and large number of defects. Here, we demonstrate an amorphous silicon low noise photodiode with gain-bandwidth product of over 2 THz, based on a very simple structure. This work will impact a wide range of applications involving optical detection because amorphous silicon, as the primary gain medium, is a low-cost, easy-to-process material that can be formed on many kinds of rigid or flexible substrates. [ABSTRACT FROM AUTHOR]

Signal amplification, performed by transistor amplifiers with its merit rated by the efficiency and noise characteristics, is ubiquitous in all electronic systems. Because of transistor thermal noise, an intrinsic signal amplification mechanism, impact ionization was sought after to complement the limits of transistor amplifiers. However, due to the high operation voltage (30-200V typically), low power efficiency, limited scalability, and, above all, rapidly increasing excess noise with amplification factor, impact ionization has been out of favor for most electronic systems except for a few applications such as avalanche photodetectors and single-photon Geiger detectors. Here, we report an internal signal amplification mechanism based on the principle of the phonon-assisted cycling excitation process (CEP). Si devices using this concept show ultrahigh gain, low operation voltage, CMOS compatibility, and, above all, quantum limit noise performance that is 30 times lower than devices using impact ionization. Established on a unique physical effect of attractive properties, CEP-based devices can potentially revolutionize the fields of semiconductor electronics. [ABSTRACT FROM AUTHOR]

Signal amplification, performed by transistor amplifiers with its merit rated by the efficiency and noise characteristics, is ubiquitous in all electronic systems. Because of transistor thermal noise, an intrinsic signal amplification mechanism, impact ionization was sought after to complement the limits of transistor amplifiers. However, due to the high operation voltage (30-200 V typically), low power efficiency, limited scalability, and, above all, rapidly increasing excess noise with amplification factor, impact ionization has been out of favor for most electronic systems except for a few applications such as avalanche photodetectors and single-photon Geiger detectors. Here, we report an internal signal amplification mechanism based on the principle of the phonon-assisted cycling excitation process (CEP). Si devices using this concept show ultrahigh gain, low operation voltage, CMOS compatibility, and, above all, quantum limit noise performance that is 30 times lower than devices using impact ionization. Established on a unique physical effect of attractive properties, CEP-based devices can potentially revolutionize the fields of semiconductor electronics. [ABSTRACT FROM AUTHOR]