1. Effects of porosity on the structural and optoelectronic properties of Er-doped Ga2O3 epitaxial films on etched epi-GaN/sapphire substrates.
- Author
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Yang, Xiaokun, Du, Xuejian, Liu, Jie, Chen, Rongrong, Wang, Di, Le, Yong, Zhu, Hongyan, Feng, Bo, Ma, Jin, and Xiao, Hongdi
- Subjects
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GALLIUM nitride films , *GENERATIVE adversarial networks , *POROSITY , *SAPPHIRES , *OPTOELECTRONIC devices , *EPITAXY , *NANOPORES - Abstract
The nanoporous (NP) GaN wafers which were fabricated by electrochemical etching (EC) method were used as substrates to deposit Er-doped Ga 2 O 3 epitaxial films by pulsed layer deposition (PLD). The epitaxial relationship between the GaN and Er doped β-Ga 2 O 3 film was Ga 2 O 3 (−201) ‖ GaN (0001) with Ga 2 O 3 [010] ‖ GaN [-12-10]. Compared to the Er doped films on the epi-GaN wafers with the porosity of 0%, ~20% and ~60%, the β-Ga 2 O 3 film deposited on the wafer with a porosity of ~40%, which has an energy bandgap of ~4.89 eV, has the best crystal quality and optoelectronic properties. The performance enhancement should be due to improved crystalline quality as a result of the existence of nanopores in the etched substrates. The excellent properties of Er doped Ga 2 O 3 films indicated that the films have great potential to fabricate Ga 2 O 3 optoelectronic devices. [ABSTRACT FROM AUTHOR]
- Published
- 2021
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