17 results on '"Oh, Hansol"'
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2. Controlling the crystallinity of HfO2 thin film using the surface energy-driven phase stabilization and template effect
3. Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application
4. NRF2 is a spatiotemporal metabolic hub essential for the polyfunctionality of Th2 cells.
5. Structure-based molecular characterization of a putative aspartic proteinase from Bacteroides fragilis
6. Improvement in dielectric properties of ZrO2 thin film by employing a Zr precursor with enhanced thermal stability in high-temperature atomic layer deposition
7. Suppressing Interfacial Layer Formation in ZrO2‑Based Capacitors with TiN Electrodes via a MgO Thin-Film Oxygen Diffusion Barrier.
8. Corrigendum to “Controlling the crystallinity of HfO2 thin film using the surface energy-driven phase stabilization and template effect” [Appl. Surf. Sci. 590 (2022) 153082]
9. Achieving High Dielectric Constants in Tetragonal Single‐Phase ZrHfO 2 Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor
10. Altering Binding Affinities of Tetraruthenocycles for Polycyclic Aromatic Hydrocarbons by Post-Assembly Modification
11. Structure-based functional analysis of a PadR transcription factor from Streptococcus pneumoniae and characteristic features in the PadR subfamily-2
12. Crystal structure of the Pseudomonas aeruginosa PA0423 protein and its functional implication in antibiotic sequestration
13. Achieving High Dielectric Constants in Tetragonal Single‐Phase ZrHfO2 Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor.
14. ‘Doing Housework Doing Laundry’: Spectacularization of Labor in Caroline, or Change.
15. Make theatre, create contacts in Gob Squad’s living room
16. Mapping Polivocality in East Asian Theatrical Realism: Realisms in East Asian Performance by Jessica Nakamura and Katherine Saltzman-Li, Ann Arbor, MI: University of Michigan Press, 2023; pp. 269.
17. Achieving High Dielectric Constants in Tetragonal Single‐Phase ZrHfO2Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor
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