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(La and Ga)-doped tin monoxide (stannous oxide, tin (II) oxide, SnO) thin films were grown by plasma-assisted and suboxide molecular beam epitaxy with dopant concentrations ranging from $\approx5\times10^{18}$cm$^{-3}$ to $2\times10^{21}$cm$^{-3}$. In this concentration range, the incorporation of Ga into SnO was limited by the formation of secondary phases observed at $1.2\times10^{21}$cm$^{-3}$ Ga, while the incorporation of La showed a lower solubility limit. Transport measurements on the doped samples reveal that Ga acts as an acceptor and La as a compensating donor. While Ga doping led to an increase of the hole concentration from $1\times10^{18}$cm$^{-3}-1\times10^{19}$cm$^{-3}$ for unintentionally (UID) SnO up to $5\times10^{19}$cm$^{-3}$, La-concentrations well in excess of the UID acceptor concentration resulted in semi-insulating films without detectable $n$-type conductivity. Ab-initio calculations qualitatively agree with our dopant assignment of Ga and La, and further predict In$_\text{Sn}$ to act as an acceptor as well as Al$_\text{Sn}$ and B$_\text{Sn}$ as donor. These results show the possibilities of controlling the hole concentration in $p$-type SnO, which can be useful for a range of optoelectronic and gas-sensing applications., 6 pages, 5 figures

Advanced materials 34(37), 2204217 (2022). doi:10.1002/adma.202204217, Ga$_2$O$_3$ and its polymorphs are attracting increasing attention. The rich structural space of polymorphic oxide systems such as Ga$_2$O$_3$ offers potential for electronic structure engineering, which is of particular interest for a range of applications, such as power electronics. $γ$-Ga$_2$O$_3$ presents a particular challenge across synthesis, characterization, and theory due to its inherent disorder and resulting complex structure–electronic-structure relationship. Here, density functional theory is used in combination with a machine-learning approach to screen nearly one million potential structures, thereby developing a robust atomistic model of the $γ$-phase. Theoretical results are compared with surface and bulk sensitive soft and hard X-ray photoelectron spectroscopy, X-ray absorption spectroscopy, spectroscopic ellipsometry, and photoluminescence excitation spectroscopy experiments representative of the occupied and unoccupied states of $γ$-Ga$_2$O$_3$. The first onset of strong absorption at room temperature is found at 5.1 eV from spectroscopic ellipsometry, which agrees well with the excitation maximum at 5.17 eV obtained by photoluminescence excitation spectroscopy, where the latter shifts to 5.33 eV at 5 K. This work presents a leap forward in the treatment of complex, disordered oxides and is a crucial step toward exploring how their electronic structure can be understood in terms of local coordination and overall structure., Published by Wiley-VCH, Weinheim

Ga

Delafossite CuFeO2 is a p-type oxide semiconductor with a band gap of ∼1.5 eV, which has attracted great interests for applications in solar energy harvesting and oxide electronics. However, there are still some discrepancies in the literature regarding its fundamental electronic structure and transport properties. In this paper, we use a synergistic combination of resonant photoemission spectroscopy and X-ray absorption spectroscopy to directly study the electronic structure of well-defined CuFeO2 epitaxial thin films. Our detailed study reveals that CuFeO2 has an indirect and d-d forbidden band gap of 1.5 eV. The top of the valence band (VB) of CuFeO2 mainly consists of occupied Fe 3d states hybridized with Cu 3d and O 2p, and the bottom of the conduction band (CB) is primarily made up of unoccupied Fe 3d states. The localized nature of the Fe 3d states at both CB and VB edges would limit the carrier mobility and the dynamics of photoexcited carriers. In addition, Mg doping at Fe sites in CuFeO2 increases the hole carrier concentration and leads to a gradual shift of the Fermi level toward the VB. These insights into its electronic structure are of fundamental importance for rational designing and improving the performance of CuFeO2 as photocatalysts.

Gallium oxide (Ga2O3) is an ultra-wide bandgap material, which has recently attracted widespread attention for holding promising applications in power electronics and solar blind UV photodetectors, outclassing GaN or SiC in terms of a larger bandgap and higher breakdown voltages. The orthorhombic κ phase (also referred to as e) has sparked particular interest for offering higher symmetry than β, while featuring ferroelectric behavior paired with a large predicted spontaneous polarization, paving the way to fabricating high-quality two-dimensional electron gases for application in heterostructure field effect transistors. The presently available κ phase samples are characterized by a domain structure, in which orthorhombic domains are rotated 120° against each other within the c-plane forming a pseudo-hexagonal structure, which has previously often been ascribed to e-Ga2O3 and incorrectly been viewed as this polymorph's true crystal structure. A detailed investigation into the phonon modes of orthorhombic κ-Ga2O3 provides insights into fundamental material properties such as crystal structure and orientation as well as the vibrational symmetries of Raman active modes. We investigate the Raman active phonon modes of an MBE-grown orthorhombic κ-Ga2O3 thin film featuring the domain structure deposited on (0001)-Al2O3 by experiment and theory: Polarized micro-Raman spectroscopy measurements in conjunction with density functional perturbation theory (DFPT) calculations enable the identification of both the frequencies and vibrational symmetries of the Raman active phonons. Presenting comprehensive Raman spectra of the orthorhombic κ phase, the experimental frequencies of more than 90 Raman modes are determined and correlated with the 117 modes predicted by the calculations. Angular-resolved Raman measurements are utilized to provide an experimental verification of phonon mode symmetries. We present an analytical tool to deal with the domain structure and its effect on the obtained Raman spectra.

The oxidation-related issues in controlling Si doping from the Si source material in oxide molecular beam epitaxy (MBE) are addressed by using its solid suboxide, SiO, as an alternative source material in a conventional effusion cell. Line-of-sight quadrupole mass spectrometry of the direct SiO-flux ([Formula: see text]) from the source at different temperatures ( TSiO) confirmed SiO molecules to sublime with an activation energy of 3.3 eV. The TSiO-dependent [Formula: see text] was measured in vacuum before and after subjecting the source material to an O2-background of [Formula: see text] (typical oxide MBE regime). The absence of a significant [Formula: see text] difference indicates negligible source oxidation in molecular O2. Mounted in an oxygen plasma-assisted MBE, Si-doped β-Ga2O3 layers were grown using this source. The [Formula: see text] at the substrate was evaluated [from 2.9 × 109 cm−2 s−1 ( TSiO = 700 °C) to 5.5 × 1013 cm−2 s−1 ( TSiO = 1000 °C)] and Si-concentration in the β-Ga2O3 layers measured by secondary ion mass spectrometry highlighting unprecedented control of continuous Si-doping for oxide MBE, i.e., [Formula: see text] from 4 × 1017 cm−3 ( TSiO = 700 °C) up to 1.7 × 1020 cm−3 ( TSiO = 900 °C). For a homoepitaxial β-Ga2O3 layer, a Hall charge carrier concentration of 3 × 1019 cm−3 in line with the provided [Formula: see text] (TSiO = 800 °C) is demonstrated. No SiO-incorporation difference was found between β-Ga2O3(010) layers homoepitaxially grown at 750 °C and β-Ga2O3(−201) heteroepitaxial layers grown at 550 °C on c-plane sapphire. However, the presence of activated oxygen (plasma) resulted in partial source oxidation and related decrease in doping concentration (particularly at TSiO < 800 °C), which has been tentatively explained with a simple model. Degassing the source at 1100 °C reverted this oxidation. Concepts to reduce source oxidation during MBE-growth are referenced.

By employing a mixed SnO$_2$+Sn source, we demonstrate suboxide molecular beam epitaxy growth of phase-pure single crystalline metastable SnO(001) thin films at a growth rate of ~1.0nm/min without the need for additional oxygen. These films grow epitaxially across a wide substrate temperature range from 150 to 450{\deg}C. Hence, we present an alternative pathway to overcome the limitations of high Sn or SnO$_2$ cell temperatures and narrow growth windows encountered in previous MBE growth of metastable SnO. In-situ laser reflectometry and line-of-sight quadrupole mass spectrometry were used to investigate the rate of SnO desorption as a function of substrate temperature. While SnO ad-molecules desorption at Ts = 450{\deg}C was growth-rate limiting,the SnO films did not desorb at this temperature after growth in vacuum. The SnO (001) thin films are transparent and unintentionally p-type doped, with hole concentrations and mobilities in the range of 0.9 to 6.0x10$^{18}$cm$^{-3}$ and 2.0 to 5.5 cm$^2$/V.s, respectively. These p-type SnO films obtained at low temperatures are promising for back-end-of-line (BEOL) compatible applications and for integration with n-type oxides in p-n heterojunction and field-effect transistors, Comment: 18 pages, 10 figures

Preparation of rectifying Schottky contacts on n-type oxide semiconductors, such as indium oxide (In2O3), is often challenged by the presence of a distinct surface electron accumulation layer. We investigated the material properties and electrical transport characteristics of platinum contact/indium oxide heterojunctions to define routines for the preparation of high-performance Schottky diodes on n-type oxide semiconductors. Combining the evaluation of different Pt deposition methods, such as electron-beam evaporation and (reactive) sputtering in an (O and) Ar atmosphere, with oxygen plasma interface treatments, we identify key parameters to obtain Schottky-type contacts with high electronic barrier height and high rectification ratio. Different photoelectron spectroscopy approaches are compared to characterize the chemical properties of the contact layers and the interface region toward In2O3, to analyze charge transfer and plasma oxidation processes as well as to evaluate the precision and limits of different methodologies to determine heterointerface energy barriers. An oxygen-plasma-induced passivation of the semiconductor surface, which induces electron depletion and generates an intrinsic interface energy barrier, is found to be not sufficient to generate rectifying platinum contacts. The dissolution of the functional interface oxide layer within the Pt film results in an energy barrier of ∼0.5 eV, which is too low for an In2O3 electron concentration of ∼1018 cm-3. A reactive sputter process in an Ar and O atmosphere is required to fabricate rectifying contacts that are composed of platinum oxide (PtOx). Combining oxygen plasma interface oxidation of the semiconductor surface with reactive sputtering of PtOx layers results in the generation of a high Schottky barrier of ∼0.9 eV and a rectification ratio of up to 106. An additional oxygen plasma treatment after contact deposition further reduced the reverse leakage current, likely by eliminating a surface conduction path between the coplanar Ohmic and Schottky contacts. We conclude that processes that allow us to increase the oxygen content in the interface and contact region are essential for fabrication of device-quality-rectifying contacts on various oxide semiconductors.

The influence of Ga incorporation into cubic In$_2$O$_3$ on the electronic and vibrational properties is discussed for (In$_{1-x}$,Ga$_x$)$_2$O$_3$ alloy films grown by molecular beam epitaxy. Using spectroscopic ellipsometry, a linear dependence of the absorption onset on the Ga content $x$ is found with a blueshift of up to 150 meV for $x = 0.1$. Consistently, the fundamental band gap exhibits a blueshift as determined by hard X-ray photoelectron spectroscopy. The dependence of the absorption onset and the effective electron mass on the electron concentration is derived from the infrared dielectric functions for a Sn doped alloy film. The influence of alloying on phonon modes is analyzed on the basis of Raman spectroscopic measurements. The frequencies of several phonon modes are identified as sensitive measures for the spectroscopic determination of the Ga content.

Journal of materials chemistry / C 9(7), 2311-2320 (2021). doi:10.1039/D0TC04101G, Published by RSC, London [u.a.]

As a contribution to (transparent) bipolar oxide electronics, vertical pn heterojunction diodes were prepared by plasma-assisted molecular beam epitaxy of unintentionally doped p-type SnO layers with hole concentrations ranging from p = 10 18 to 1019 cm−3 on unintentionally doped n-type β-Ga2O3(−201) substrates with an electron concentration of n = 2.0 × 10 17 cm−3. The SnO layers consist of (001)-oriented grains without in-plane epitaxial relation to the substrate. After subsequent contact processing and mesa-etching (which drastically reduced the reverse current spreading in the SnO layer and associated high leakage), electrical characterization by current–voltage and capacitance–voltage measurement was performed. The results reveal a type-I band alignment and junction transport by thermionic emission in forward bias. A rectification of 2 × 10 8 at ±1 V, an ideality factor of 1.16, a differential specific on-resistance of 3.9 m Ω cm2, and a built-in voltage of 0.96 V were determined. The pn-junction isolation prevented parallel conduction in the highly conductive Ga2O3 substrate during van-der-Pauw Hall measurements of the SnO layer on top, highlighting the potential for decoupling the p-type functionality in lateral transport devices from that of the underlying n-type substrate. The measured maximum reverse breakdown voltage of the diodes of 66 V corresponds to a peak breakdown field of 2.2 MV/cm in the Ga2O3-depletion region and suggests the low bandgap of the SnO ( ≈ 0.7 eV) not to be the limiting factor for breakdown. Higher breakdown voltages that are required in high-voltage devices could be achieved by reducing the donor concentration in the β-Ga2O3 toward the interface to increase the depletion width, as well as improving the contact geometry to reduce field crowding.

${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ is an $n$-type transparent semiconducting oxide possessing a surface electron accumulation layer (SEAL) like several other relevant semiconductors, such as InAs, InN, ${\mathrm{SnO}}_{2}$, and ZnO. Even though the SEAL is within the core of the application of ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ in conductometric gas sensors, a consistent set of transport properties of this two-dimensional electron gas (2DEG) is missing in the present literature. To this end, we investigate high-quality single-crystalline as well as textured doped and undoped ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$(111) films grown by plasma-assisted molecular beam epitaxy to extract transport properties of the SEAL by means of Hall effect measurements at room temperature while controlling the oxygen adsorbate coverage via illumination. The resulting sheet electron concentration and mobility of the SEAL are $\ensuremath{\approx}1.5\ifmmode\times\else\texttimes\fi{}{10}^{13}\phantom{\rule{4pt}{0ex}}{\mathrm{cm}}^{\ensuremath{-}2}$ and $\ensuremath{\approx}150\phantom{\rule{4pt}{0ex}}{\mathrm{cm}}^{2}/\mathrm{Vs}$, respectively, both of which are strongly reduced by oxygen-related surface adsorbates from the ambient air. Our transport measurements further demonstrate a systematic reduction of the SEAL by doping ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ with the deep compensating bulk acceptors Ni or Mg. This finding is supported by x-ray photoelectron spectroscopy (XPS) measurements of the surface band bending and SEAL electron emission. Quantitative analyses of these XPS results using self-consistent, coupled Schr\"odinger-Poisson calculations indicate the simultaneous formation of compensating bulk donor defects (likely oxygen vacancies), which almost completely compensate the bulk acceptors. Finally, an enhancement of the thermopower by reduced dimensionality is demonstrated in ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$: Seebeck coefficient measurements of the surface 2DEG with partially reduced sheet electron concentrations between $3\ifmmode\times\else\texttimes\fi{}{10}^{12}$ and $7\ifmmode\times\else\texttimes\fi{}{10}^{12}\phantom{\rule{4pt}{0ex}}{\mathrm{cm}}^{\ensuremath{-}2}$ (corresponding average volume electron concentration between $1\ifmmode\times\else\texttimes\fi{}{10}^{19}$ and $2.3\ifmmode\times\else\texttimes\fi{}{10}^{19}\phantom{\rule{4pt}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$) indicate a value enhanced by $\ensuremath{\approx}80%$ compared to that of bulk Sn-doped ${\mathrm{In}}_{2}{\mathrm{O}}_{3}$ with comparable volume electron concentration.

The search for new wide band gap materials is intensifying to satisfy the need for more advanced and energy efficient power electronic devices. Ga$_2$O$_3$ has emerged as an alternative to SiC and GaN, sparking a renewed interest in its fundamental properties beyond the main $\beta$-phase. Here, three polymorphs of Ga$_2$O$_3$, $\alpha$, $\beta$ and $\varepsilon$, are investigated using X-ray diffraction, X-ray photoelectron and absorption spectroscopy, and ab initio theoretical approaches to gain insights into their structure - electronic structure relationships. Valence and conduction electronic structure as well as semi-core and core states are probed, providing a complete picture of the influence of local coordination environments on the electronic structure. State-of-the-art electronic structure theory, including all-electron density functional theory and many-body perturbation theory, provide detailed understanding of the spectroscopic results. The calculated spectra provide very accurate descriptions of all experimental spectra and additionally illuminate the origin of observed spectral features. This work provides a strong basis for the exploration of the Ga$_2$O$_3$ polymorphs as materials at the heart of future electronic device generations., Comment: Updated manuscript version after peer review

Smooth interfaces and surfaces are beneficial for most (opto)electronic devices that are based on thin films and their heterostructures. For example, smoother interfaces in (010) β-Ga2O3/(AlxGa1-x)2O3 heterostructures, whose roughness is ruled by that of the β-Ga2O3 layer, can enable higher mobility 2-dimensional electron gases by reducing interface roughness scattering. To this end we experimentally prove that a substrate offcut along the [001] direction allows to obtain smooth β-Ga2O3 layers in (010)-homoepitaxy under metal-rich deposition conditions. Applying In-mediated metal-exchange catalysis (MEXCAT) in molecular beam epitaxy at high substrate temperatures (Tg = 900 °C) we compare the morphology of layers grown on (010)-oriented substrates having different unintentional offcuts. The layer roughness is generally ruled by (i) the presence of (110)- and 1 ˉ 10 -facets visible as elongated features along the [001] direction (rms < 0.5 nm), and (ii) the presence of trenches (5–10 nm deep) orthogonal to [001]. We show that an unintentional substrate offcut of only ≈ 0.1° almost oriented along the [001] direction suppresses these trenches resulting in a smooth morphology with a roughness exclusively determined by the facets, i.e. rms ≈ 0.2 nm. Since we found the facet-and-trench morphology in layer grown by MBE with and without MEXCAT, we propose that the general growth mechanism for (010)-homoepitaxy is ruled by island growth whose coalescence results in the formation of the trenches. The presence of a substrate offcut in the [001] direction can allow for step-flow growth or island nucleation at the step edges, which prevents the formation of trenches. Moreover, we give experimental evidence for a decreasing surface diffusion length or increasing nucleation density on the substrate surface with decreasing metal-to-oxygen flux ratio. Based on our experimental results we can rule-out step bunching as cause of the trench formation as well as a surfactant-effect of indium during MEXCAT.

This paper introduces a growth method---suboxide molecular-beam epitaxy (S-MBE)---which enables the growth of Ga2O3 and related materials at growth rates exceeding 1 micrometer per hours with excellent crystallinity in an adsorptioncontrolled regime. Using a Ga + Ga2O3 mixture with an oxygen mole fraction of x(O) = 0.4 as an MBE source, we overcome kinetic limits that had previously hampered the adsorption-controlled growth of Ga2O3 by MBE. We present growth rates up to 1.6 micrometer per hour for Ga2O3--Al2O3 heterostructures with unprecedented crystalline quality and also at unparalleled low growth temperature for this level of perfection. We combine thermodynamic knowledge of how to create molecular-beams of targeted suboxides with a kinetic model developed for the S-MBE of III-VI compounds to identify appropriate growth conditions. Using S-MBE we demonstrate the growth of phase-pure, smooth, and high-purity homoepitaxial Ga2O3 films that are thicker than 4 micrometer. With the high growth rate of S-MBE we anticipate a significant improvement to vertical Ga2O3-based devices. We describe and demonstrate how this growth method can be applied to a wide-range of oxides. S-MBE rivals leading synthesis methods currently used for the production of Ga2O3-based devices., Comment: 15 pages, 12 figures

This chapter sheds light on various fundamental aspects of the O plasma-assisted molecular beam epitaxy of Ga2O3. It discusses the volatile suboxide-related growth kinetics of Ga2O3 explaining the observed growth rate behavior as function of all growth parameters. The binary growth kinetics of Ga2O3 is then compared to that of its related oxides In2O3 and SnO2. During the ternary growth of (InxGa1-x)2O3, thermodynamic aspects based on different metal-oxygen bond strengths become important, which will be shown to govern the Ga- versus In-incorporation into the (InxGa1-x)2O3 thin film. More importantly, we describe how the collaborative effect of the different growth kinetics and thermodynamics of the binary oxides can lead to a strong growth rate enhancement of Ga2O3 by metal-exchange catalysis (MEXCAT) using In2O3 or SnO2 as catalyst. A brief overview of the polymorphs of Ga2O3 stabilized by different substrates is given. The surface morphology obtained by homoepitaxy will be discussed in relation to thermodynamically induced faceting. Finally, open questions will be identified that require further research.

Semiconducting metal oxide (SMOX)-based gas sensors are indispensable for safety and health applications, for example, explosive, toxic gas alarms, controls for intake into car cabins, and monitor for industrial processes. In the past, the sensor community has been studying polycrystalline materials as sensors where the porous and random microstructure of the SMOX does not allow a separation of the phenomena involved in the sensing process. This led to conduction models that can model and predict the behavior of the overall response, but they were not capable of giving fundamental information regarding the basic mechanisms taking place. The study of epitaxial layers is a definite improvement, allowing clarifying the different aspects and contributions of the sensing mechanisms. A detailed analytical model of the transduction function for n-A nd p-type single-crystalline/compact metal oxide gas sensors was developed that directly relates the conductance of the sample with changes in the surface electrostatic potential. Combined dc resistance and work function measurements were used in a compact SnO2(101) layer in operando conditions that allowed us to check the validity of our model in the region where Boltzmann approximation holds to determine the surface and bulk properties of the material. Fil: Simion, Cristian Eugen. Institut de Physique Des Matériaux, Bucarest-magurele; Rumania Fil: Schipani, Federico. Consejo Nacional de Investigaciones Científicas y Técnicas. Centro Científico Tecnológico Conicet - Mar del Plata. Instituto de Investigaciones en Ciencia y Tecnología de Materiales. Universidad Nacional de Mar del Plata. Facultad de Ingeniería. Instituto de Investigaciones en Ciencia y Tecnología de Materiales; Argentina Fil: Papadogianni, Alexandra. Paul Drude Institut Fur Festkorperelektronik; Alemania Fil: Stanoiu, Adelina. Institut de Physique Des Matériaux, Bucarest-magurele; Rumania Fil: Budde, Melanie. Paul Drude Institut Fur Festkorperelektronik; Alemania Fil: Oprea, Alexandru. Universität Tübingen; Alemania Fil: Weimar, Udo. Universität Tübingen; Alemania Fil: Bierwagen, Oliver. Paul Drude Institut Fur Festkorperelektronik; Alemania Fil: Barsan, Nicolae. Universität Tübingen; Alemania

NiO layers were grown on MgO(100), MgO(110), and MgO(111) substrates by plasma-assisted molecular beam epitaxy under Ni-flux limited growth conditions. Single crystalline growth with a cube-on-cube epitaxial relationship was confirmed by X-ray diffraction measurements for all used growth conditions and substrates except MgO(111). A detailed growth series on MgO(100) was prepared using substrate temperatures ranging from 20 {\deg}C to 900 {\deg}C to investigate the influence on the layer characteristics. Energy-dispersive X-ray spectroscopy indicated close-to-stoichiometric layers with an oxygen content of ~47 at. % and ~50 at. % grown under low and high O-flux, respectively. All NiO layers had a root-mean-square surface roughness below 1 nm, measured by atomic force microscopy, except for rougher layers grown at 900 {\deg}C or using molecular oxygen. Growth at 900 {\deg}C led to a significant diffusion of Mg from the substrate into the film. The relative intensity of the quasi-forbidden one-phonon Raman peak is introduced as a gauge of the crystal quality, indicating the highest layer quality for growth at low oxygen flux and high growth temperature, likely due to the resulting high adatom diffusion length during growth. The optical and electrical properties were investigated by spectroscopic ellipsometry and resistance measurements, respectively. All NiO layers were transparent with an optical bandgap around 3.6 eV and semi-insulating at room temperature. However, changes upon exposure to reducing or oxidizing gases of the resistance of a representative layer at elevated temperature were able to confirm p-type conductivity, highlighting their suitability as a model system for research on oxide-based gas sensing.

Transparent conducting or semiconducting oxides are important materials for (transparent) optoelectronics and power electronics applications. While most of these oxides can be doped n-type only with room-temperature electron mobilities on the order of 100cm^2/Vs p-type oxides are needed for the realization of pn-junction devices but typically suffer from exessively low (<

Raman spectroscopy is utilized to study the magnetic characteristics of heteroepitaxial NiO thin films grown by plasma-assisted molecular beam epitaxy on MgO(100) substrates. For the determination of the N\'eel temperature, we demonstrate a reliable approach by analyzing the temperature dependence of the Raman peak originating from second-order scattering by magnons. The antiferromagnetic coupling strength is found to be strongly influenced by the growth conditions. The low-temperature magnon frequency and the N\'eel temperature are demonstrated to depend on the biaxial lattice strain and the degree of structural disorder which is dominated by point defects.

The alloying of the group-III transparent semiconducting sesquioxides In$_2$O$_3$ and Ga$_2$O$_3$ can lead to a modulation of the properties of the parent compounds, e.g., the shallow- and deep-donor character of the oxygen vacancy or the presence and absence of a surface electron accumulation layer, respectively. In this work, we investigate the effect of alloying on the electron transport properties of unintentionally-doped single-crystalline and textured bixbyite (In$_{1-x}$Ga$_x$)$_2$O$_3$ thin films annealed in oxygen and vacuum with Ga contents up to $x$=0.18. Hall effect measurements demonstrate a surprising increase in electron density due to native defects with added Ga. This increase may be related to the incorporation of Ga-interstitials or oxygen vacancies induced by Ga-related unit-cell distortions. A combined investigation based on hard and soft x-ray photoelectron spectroscopy measurements demonstrates the existence of the surface electron accumulation layer for all alloy films and, hence, no depletion up to $x$=0.18. Finally, we additionally demonstrate a single-crystalline (In$_{0.92}$Ga$_{0.08}$)$_2$O$_3$:Sn film, as a possible transparent conductive oxide with a wider band gap than that of (Sn-doped) In$_2$O$_3$., 7 pages, 4 figures

In this work, we report on the realization of SnO/β-Ga2O3 heterojunction vertical diodes and lateral field-effect transistors for power electronic applications. The p-type semiconductor SnO is grown by plasma-assisted molecular beam epitaxy on n-type (100) β-Ga2O3 with donor concentrations of 3 × 1017 cm−3 for the diode devices and 8.1 × 1017 cm−3 for the field-effect transistors. The deposited films show a predominant SnO (001) phase featuring a hole concentration and a mobility of 7.2 × 1018 cm−3 and 1.5 cm2/V s, respectively. The subsequent electrical characterization of the heterojunction diodes and field-effect transistors show stable switching properties with on/off current ratios >106 and specific on-resistances below 4 mΩ cm2. Furthermore, breakdown measurements in air of the non-field-plated heterojunction transistor with a gate-to-drain distance of 4 μm yield a breakdown voltage of 750 V, which equals an average breakdown strength of nearly 1.9 MV/cm. The resulting power figure of merit is calculated to 178 MW/cm2 demonstrating state-of-the-art properties. This emphasizes the high potential of this heterojunction approach.

NiO is a p-type wide bandgap semiconductor of use in various electronic devices ranging from solar cells to transparent transistors. Understanding and improving its optical and transport properties have been of considerable interest. In this work, we have investigated the effect of Li doping on the electronic, optical and transport properties of NiO epitaxial thin films grown by pulsed laser deposition. We show that Li doping significantly increases the p-type conductivity of NiO, but all the films have relatively low room-temperature mobilities (

We present an initial study of the influence of the growth parameters on the surface morphology and on the interface quality of homoepitaxial GaP(1 1 1) and heteroepitaxial GaP/AlGaP(1 1 1) grown on GaP(1 1 1)B substrates using Gas-Source Molecular Beam Epitaxy (GSMBE). Three different surface reconstructions are identified in the RHEED patterns during the growth runs. The Root Mean Square (RMS) surface roughness measured post-growth by AFM ranges from 3 to 10 nm over 10 × 10 µm 2 areas, for a film thickness of 100–600 nm. The results of 2θ-ω XRD scans on (1 1 1) and (3 1 1) planes reveal a stacking disorder in the AlGaP layer and further XRD phi-scan measurements on GaP (3 1 1) show strong peaks with 3-fold rotational symmetry and additional of 3-fold weak peaks indicating only a negligible fraction of the twinned crystal orientation in the substrate. TEM images of these samples show a smooth interface between the AlGaP layer and GaP substrate, and reveal the presence of a high density of extended defects such as stacking faults, twinning and dislocations lines in AlGaP layer whereas the GaP layer appears as pure Zinc-Blende. Further TEM analysis reveals composition and local strain variations for GaP/AlGaP samples associated with an undulated surface.

The semiconducting oxide $\ensuremath{\beta}$-gallium oxide ($\ensuremath{\beta}\ensuremath{-}{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$) possesses a monoclinic unit cell, whose low symmetry generally leads to anisotropic physical properties. For example, its electrical conductivity is generally described by a polar symmetrical tensor of second rank consisting of four independent components. Using van der Pauw measurements in a well-defined square geometry on differently oriented high-quality bulk samples and the comparison to finite-element simulations, we precisely determine the ratio of all elements of the $\ensuremath{\beta}\ensuremath{-}{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$ three-dimensional electrical conductivity tensor. Despite the strong structural anisotropy, a weakly anisotropic conductivity at and above room temperature was found. In the ${a}^{*}bc$ coordinate system, the diagonal elements deviate from each other by no more than 6%. Based on these results and the off-diagonal element being $\ensuremath{\approx}5%$ of the diagonal ones, the direction of highest conductivity is rotated ${(59\ifmmode\pm\else\textpm\fi{}15)}^{\ensuremath{\circ}}$ from the $c$ direction towards the ${a}^{*}$ direction with a conductivity of $(1.12\ifmmode\pm\else\textpm\fi{}0.09)\ifmmode\times\else\texttimes\fi{}$ that in the perpendicular direction of lowest conductivity. Analysis of the temperature dependence of the anisotropy and mobility of differently doped samples allows us to compare the anisotropy for dominant phonon scattering to that for dominant ionized-impurity scattering. For both scattering mechanisms, the conductivities along the $a$ and $b$ direction agree within 2%. In contrast, the conductivity along the $c$ direction amounts to $0.96\ifmmode\times\else\texttimes\fi{}$ that along the $b$ direction for dominant phonon scattering, and up to $1.12\ifmmode\times\else\texttimes\fi{}$ for ionized-impurity scattering. The transport anisotropies are determined to be larger than the theoretically predicted effective mass anisotropy, suggesting slightly anisotropic scattering mechanisms. We demonstrate that significantly higher anisotropies can be caused by oriented, extended structural defects in the form of low-angle grain boundaries, for which we determined energy barriers of up to 93 meV.

Semiconducting metal oxide (SMOX)-based gas sensors are indispensable for safety and health applications, for example, explosive, toxic gas alarms, controls for intake into car cabins, and monitor for industrial processes. In the past, the sensor community has been studying polycrystalline materials as sensors where the porous and random microstructure of the SMOX does not allow a separation of the phenomena involved in the sensing process. This led to conduction models that can model and predict the behavior of the overall response, but they were not capable of giving fundamental information regarding the basic mechanisms taking place. The study of epitaxial layers is a definite improvement, allowing clarifying the different aspects and contributions of the sensing mechanisms. A detailed analytical model of the transduction function for n- and p-type single-crystalline/compact metal oxide gas sensors was developed that directly relates the conductance of the sample with changes in the surface electrostatic potential. Combined dc resistance and work function measurements were used in a compact SnO

Preparation of rectifying Schottky contacts on n-type oxide semiconductors, such as indium oxide (In

To date, there are only a few studies on the gas sensing properties of single crystalline sensors. […]

Single crystalline and textured In2O3 thin films with (1 1 1) surface orientation, grown by plasma-assisted molecular beam epitaxy, were used as a model system to study the role of bulk and surface electron accumulation layer conductance for ozone sensing. Both conductance contributions, which add to the total film conductance, were systematically varied. The resulting ozone sensitivity was determined by total conductance measurements in synthetic air with defined ozone concentration using UV irradiation instead of heating to regenerate the In2O3 surface. Depletion of the surface electron accumulation by an oxygen plasma treatment, confirmed by X-ray photoelectron spectroscopy, rendered the films ozone insensitive. The ozone response of films with an accumulation layer was increased by thickness reduction or by designing the bulk of the film semi-insulating using deep acceptor doping by Mg. Our results of using electron accumulation layers for gas sensing and bulk doping by deep acceptors to increase sensitivity can be generalized to other gas sensing materials. The use of single crystalline films allows selecting the most sensitive crystallographic surface orientation and may have further advantages over polycrystalline films, such as increased stability and sensing speed.