1. Investigation of microstructure and V-defect formation in InxGa1−xN/GaN MQW grown using temperature-gradient metalorganic chemical vapor deposition
- Author
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Junqiao Wu, M.C. Johnson, Edith Bourret-Courchesne, D. N. Zakharov, W. Shan, Zuzanna Liliental-Weber, R.J. Jorgenson, and D.E. McCready
- Subjects
Materials science ,Photoluminescence ,Scanning electron microscope ,Analytical chemistry ,chemistry.chemical_element ,Chemical vapor deposition ,Condensed Matter Physics ,Microstructure ,Electronic, Optical and Magnetic Materials ,Crystallography ,chemistry ,Transmission electron microscopy ,Materials Chemistry ,Wafer ,Metalorganic vapour phase epitaxy ,Electrical and Electronic Engineering ,Indium - Abstract
Temperature-gradient metalorganic chemical vapor deposition (MOCVD) was used to deposit InxGa1−xN/GaN multiple quantum well (MQW) structures with a concentration gradient of indium across the wafer. These MQW structures were deposited on low defect density (2×108 cm−2) GaN template layers for investigation of microstructural properties and V-defect (pinhole) formation. Room temperature (RT) photoluminescence (PL) and photomodulated transmission (PT) were used for optical characterization, which show a systematic decrease in emission energy for a decrease in growth temperature. Triple-axis x-ray diffraction (XRD), scanning electron microscopy, and cross-sectional transmission electron microscopy were used to obtain microstructural properties of different regions across the wafer. Results show that there is a decrease in crystal quality and an increase in V-defect formation with increasing indium concentration. A direct correlation was found between V-defect density and growth temperature due to increased strain and indium segregation for increasing indium concentration.
- Published
- 2005
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