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1. Influence of dcMS and HPPMS in a dcMS/HPPMS hybrid process on plasma and coating properties.

2. Influence of HPPMS pulse parameters on the reactive gas N2 and on the properties of (Cr, Al)N coatings.

3. Energetic Ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties

4. System for voltage control and for data acquisition of retarding field energy analyzer

5. Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties

6. System for voltage control and for data acquisition of Retarder Field Energy Analyzer (RFEA)

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