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Your search keyword '"S T Ciocys"' showing total 3 results
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3 results on '"S T Ciocys"'

1. Low Loss Superconducting Microstrip Development at Argonne National Lab

Author

A. Cukierman, Benjamin Saliwanchik, Gilbert Holder, V. Yefremenko, Steven W. Allen, Aritoki Suzuki, Jason E. Austermann, Erik Shirokoff, Graeme Smecher, C. Tucker, Kam Arnold, Lloyd Knox, Kent D. Irwin, Alexey Vikhlinin, W. L. Holzapfel, Michael McDonald, Ryan Keisler, Jason W. Henning, C. Posada Arbelaez, Donna Kubik, Bradford Benson, N. W. Halverson, M. J. Myers, D. Hanson, P. A. R. Ade, W. B. Everett, Ki Won Yoon, A. J. Gilbert, Amy N. Bender, D. Dutcher, E. M. Leitch, N. L. Harrington, J. F. Cliche, H. Nguyen, Dale Li, K. Vanderlinde, H. M. Cho, Joshua Montgomery, T. M. Crawford, K. T. Story, T. Natoli, J. T. Sayre, G. Simard, Chihway Chang, Lindsey Bleem, C. L. Kuo, Zeeshan Ahmed, Christian L. Reichardt, S. S. Meyer, Kaori Hattori, V. Novosad, Aaron Lee, A. A. Stark, John E. Carlstrom, T. de Haan, J. E. Ruhl, S. T. Ciocys, M. A. Dobbs, Junjia Ding, Gene C. Hilton, K. L. Thompson, Z. Pan, G. Wang, John E. Pearson, Stephen Padin, Joaquin Vieira, and J. Hubmayr

Subjects
Physics, Fabrication, Condensed matter physics, Physics::Instrumentation and Detectors, business.industry, Bolometer, Detector, Astrophysics::Instrumentation and Methods for Astrophysics, Condensed Matter Physics, Microstrip, Computer Science::Other, Electronic, Optical and Magnetic Materials, law.invention, Resonator, law, Dissipation factor, Optoelectronics, Dielectric loss, Electrical and Electronic Engineering, Transition edge sensor, business
Abstract

Low loss superconducting microstrip is an essential component in realizing 100 kilo-pixel multichroic cosmic microwave background detector arrays. We have been developing a low loss microstrip by understanding and controlling the loss mechanisms. We present the fabrication of the superconducting microstrip, the loss measurements at a few GHz frequencies using half-wavelength resonators, and the loss measurements at 220 GHz frequencies with the superconducting microstrip coupled to slot antennas at one end and to TES detectors at the other end. The measured loss tangent of the microstrip made of sputtered Nb and SiOx is 1-2e-3.

Published
2015
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2. Fabrication of large dual-polarized multichroic TES bolometer arrays for CMB measurements with the SPT-3G camera

Author

V. G. Yefremenko, S. T. Ciocys, Kam Arnold, Benjamin Saliwanchik, Kent D. Irwin, W. L. Holzapfel, Ralu Divan, T. Natoli, Donna Kubik, N. W. Halverson, K. L. Thompson, M. J. Myers, Andrew Nadolski, W. B. Everett, Aritoki Suzuki, Antony A. Stark, Z. Pan, Ki Won Yoon, Carole Tucker, J. E. Ruhl, H. M. Cho, N. L. Harrington, Oliver Jeong, C. L. Kuo, Amy N. Bender, John E. Pearson, A. J. Gilbert, Valentine Novosad, John E. Carlstrom, Jason E. Austermann, Zeeshan Ahmed, Junjia Ding, Gene C. Hilton, J. F. Cliche, D. Dutcher, T. de Haan, Ryan Keisler, Kaori Hattori, Bradford Benson, Adrian T. Lee, E. M. Leitch, J. A. Sobrin, Graeme Smecher, Matt Dobbs, David A. Czaplewski, S. S. Meyer, K. E. Ziegler, C. L. Chang, Karen Byrum, A. Cukierman, T. M. Crawford, Lindsey Bleem, Erik Shirokoff, J. T. Sayre, Johannes Hubmayr, Joshua Montgomery, C. S. Miller, Peter A. R. Ade, K. T. Story, Nathan Whitehorn, H. Nguyen, K. Vanderlinde, Sergi Lendinez, Jason W. Henning, C. M. Posada, Joaquin Vieira, Liliana Stan, Stephen Padin, and Gensheng Wang

Subjects
Physics, business.industry, Bolometer, Detector, Metals and Alloys, Condensed Matter Physics, Isotropic etching, Microstrip, law.invention, Optics, South Pole Telescope, Etching (microfabrication), law, Materials Chemistry, Ceramics and Composites, Electrical and Electronic Engineering, Reactive-ion etching, business, Microfabrication
Abstract

This work presents the procedures used at Argonne National Laboratory to fabricate large arrays of multichroic transition-edge sensor (TES) bolometers for cosmic microwave background (CMB) measurements. These detectors will be assembled into the focal plane for the SPT-3G camera, the third generation CMB camera to be installed in the South Pole Telescope. The complete SPT-3G camera will have approximately 2690 pixels, for a total of 16 140 TES bolometric detectors. Each pixel is comprised of a broad-band sinuous antenna coupled to a Nb microstrip line. In-line filters are used to define the different bands before the millimeter-wavelength signal is fed to the respective Ti/Au TES bolometers. There are six TES bolometer detectors per pixel, which allow for measurements of three band-passes (95, 150 and 220 GHz) and two polarizations. The steps involved in the monolithic fabrication of these detector arrays are presented here in detail. Patterns are defined using a combination of stepper and contact lithography. The misalignment between layers is kept below 200 nm. The overall fabrication involves a total of 16 processes, including reactive and magnetron sputtering, reactive ion etching, inductively coupled plasma etching and chemical etching.

Published
2015
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3. Fabrication of large dual-polarized multichroic TES bolometer arrays for CMB measurements with the SPT-3G camera.

Author

C M Posada, P A R Ade, Z Ahmed, K Arnold, J E Austermann, A N Bender, L E Bleem, B A Benson, K Byrum, J E Carlstrom, C L Chang, H M Cho, S T Ciocys, J F Cliche, T M Crawford, A Cukierman, D Czaplewski, J Ding, R Divan, and T de Haan

Subjects
FABRICATION (Manufacturing), COSMIC background radiation, POLARIZATION (Electricity), PARTICLE detectors, BOLOMETERS
Abstract

This work presents the procedures used at Argonne National Laboratory to fabricate large arrays of multichroic transition-edge sensor (TES) bolometers for cosmic microwave background (CMB) measurements. These detectors will be assembled into the focal plane for the SPT-3G camera, the third generation CMB camera to be installed in the South Pole Telescope. The complete SPT-3G camera will have approximately 2690 pixels, for a total of 16 140 TES bolometric detectors. Each pixel is comprised of a broad-band sinuous antenna coupled to a Nb microstrip line. In-line filters are used to define the different bands before the millimeter-wavelength signal is fed to the respective Ti/Au TES bolometers. There are six TES bolometer detectors per pixel, which allow for measurements of three band-passes (95, 150 and 220 GHz) and two polarizations. The steps involved in the monolithic fabrication of these detector arrays are presented here in detail. Patterns are defined using a combination of stepper and contact lithography. The misalignment between layers is kept below 200 nm. The overall fabrication involves a total of 16 processes, including reactive and magnetron sputtering, reactive ion etching, inductively coupled plasma etching and chemical etching. [ABSTRACT FROM AUTHOR]

Published
2015
Full Text
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