1. Analyse structurale de couches minces de silice amorphe pulvérisée : une étude par spectroscopie Raman
- Author
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S. Ben Khemis, Hervé Montigaud, Emmanuelle Gouillart, D. Skrelic, Laurent Cormier, Ekaterina Burov, Institut de minéralogie, de physique des matériaux et de cosmochimie (IMPMC), Muséum national d'Histoire naturelle (MNHN)-Institut de recherche pour le développement [IRD] : UR206-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS), Surface du Verre et Interfaces (SVI), SAINT-GOBAIN-Centre National de la Recherche Scientifique (CNRS), ANR-17-CE08-0019,MAGI,Mobilité couplée des éléments à la surface d'un verre float et une couche mince fonctionnalisée(2017), Saint-Gobain-Centre National de la Recherche Scientifique (CNRS), Propriétés des amorphes, liquides et minéraux [IMPMC] (IMPMC_PALM), and Muséum national d'Histoire naturelle (MNHN)-Institut de recherche pour le développement [IRD] : UR206-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Muséum national d'Histoire naturelle (MNHN)-Institut de recherche pour le développement [IRD] : UR206-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
Materials science ,Thin films ,02 engineering and technology ,Substrate (electronics) ,Deconvolution ,01 natural sciences ,symbols.namesake ,0103 physical sciences ,Densification ,Materials Chemistry ,[PHYS.COND.CM-DS-NN]Physics [physics]/Condensed Matter [cond-mat]/Disordered Systems and Neural Networks [cond-mat.dis-nn] ,Thin film ,Deposition (law) ,010302 applied physics ,Silicon oxide ,business.industry ,Metals and Alloys ,Surfaces and Interfaces ,[CHIM.MATE]Chemical Sciences/Material chemistry ,Sputter deposition ,021001 nanoscience & nanotechnology ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Amorphous solid ,Characterization (materials science) ,Raman spectroscopy ,symbols ,[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ,Optoelectronics ,0210 nano-technology ,business ,Layer (electronics) ,Magnetron sputtering - Abstract
International audience; In this work, a structural characterization of sputtered silica films was carried out using Raman spectroscopy. Due to the low cross-section and the thinness of the silica layer, its Raman signature is dwarfed by that of the glass substrate and is therefore difficult to extract. Overcoming these limitations represents an experimental challenge and requires the development of specific analysis strategies. For this purpose, an integrated approach for extracting and interpreting the Raman signature of amorphous silica films deposited on a soda-lime glass substrate was developed, based on three distinct methods: delamination of the sputtered silica film, creating a reflective mask substrate by depositing a metallic silver coating on the glass substrate and applying a numerical signal analysis (Non-negative matrix factorization) to the multidimensional dataset acquired through depth profile acquisitions on silica films directly deposited on a glass substrate. The reliability of each proposed method is demonstrated for the extraction of the silica thin film Raman spectra. These various methods can be easily extended to other materials, either crystalline or amorphous. Furthermore, we discuss the advantages and the limits of each approach.Applying this methodology allowed us to highlight the structural differences between sputtered silica thin film and bulk vitreous silica glass (v-SiO2). Magnetron sputtering film deposition is shown to form dense silica glass layers, with an estimated densification ratio, measured by x-ray reflectivity, equal to 7%. At the medium distance range, the network connectivity change in v-SiO2 is expressed by an unusually high population of three-membered rings leading to a more compact structure. The short-range order transformation was also studied by deriving the intertetrahedral angle decrease. The present results could be a step towards advanced investigation to gain insights into the structure of films at the atomic level.
- Published
- 2021
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