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Highlights: [•] Strainde-SiGe channel p-MOSFETs with a Si-cap layer are studied. [•] The roles of Si-cap layer are clarified by using simulation and experiment. [•] 2D hole distributions is described by considering quantum confinement effect. [•] Mobility degradation in a SiGe channel by surface scattering is considered. [•] Insertion of a Si-cap layer is effective to reduce an OFF-state leakage current. [ABSTRACT FROM AUTHOR]

We investigate the electrical transport characteristics of graphene channel field-effect transistors (FETs) gated via ionic solid (IS), where the conventional gate insulator, such as SiO 2 , has been replaced by solid electrolytes, such as LiP 3 O 4. In this study, we focus on (i) the gate controllability of the current in comparison to conventional graphene FETs with SiO 2 as an insulating material and (ii) the transient characteristics of the drain current and time required to switch on the current. We employ the tight-binding formalism and Boltzmann equation to calculate the electronic band structure and the electronic transport in graphene, while the Nernst–Planck–Poisson equations have been employed to calculate the time-dependent charge distribution in solid electrolytes and the resulting electric double layer formation at the graphene/IS and IS/gate interfaces. Our simulations have shown that graphene FET gated via IS shows superior gate controllability more than SiO 2 -gated graphene FET with the insulator thickness of 1 nm, and the saturated drain current is insensitive to the IS thickness. Moreover, the time required to switch on the drain current is proportional to the thickness of IS, and the limited number of Li + ion vacancies in IS is preferable in obtaining faster switching than the case of unlimited vacancy cases while keeping the superior gate controllability. [ABSTRACT FROM AUTHOR]