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More than a decade after the first theoretical and experimental studies of the spin Hall conductivity (SHC) of Pt, both its dominant origin and amplitude remain in dispute. Resolving these questions is of fundamental importance for advancing understanding of very strong spin-orbit effects in conducting systems and for maximizing the spin Hall effect for energy-efficient spintronics applications. Here, we report the experimental determination of the rapid variation of the intrinsic SHC of Pt with the carrier lifetime ({\tau}) in the dirty-metal regime by incorporating finely dispersed MgO inter-site impurities into the Pt while maintaining the essential elements of its band structure (face-centered-cubic order). This findings conclusively validate the theoretical prediction that the SHC in Pt in the dirty-metal regime should be dominated by the intrinsic Berry curvature contribution and should decrease rapidly with shortening {\tau}. This also establishes the limit to which the spin Hall ratio {\theta}SH of pure Pt can be increased by shortening {\tau}. When the spin backflow at the Pt/ferromagnet interface due to the finite interfacial spin-mixing conductance is taken into account, the amplitude of the intrinsic SHC of Pt in the clean limit is found to be at least 1.6x10^6 (h_bar/2e) {\Omega}-1 m-1, more than 3.5 times greater than the available theoretical predictions. Our work also establishes a compelling spin Hall metal Pt0.6(MgO)0.4 that combines a giant {\theta}SH (0.73) with a moderate resistivity (74 {\mu}{\Omega} cm), a strong Dzyaloshinskii-Moriya interaction, easy growth, and good integration compatibility for spintronics technology.

Increasing dampinglike spin-orbit torque (SOT) is both of fundamental importance for enabling new research into spintronics phenomena and also technologically urgent for advancing low-power spin-torque memory, logic, and oscillator devices. Here, we demonstrate that enhancing interfacial scattering by inserting ultra-thin layers within a spin Hall metals with intrinsic or side-jump mechanisms can significantly enhance the spin Hall ratio. The dampinglike SOT was enhanced by a factor of 2 via sub-monolayer Hf insertion, as evidenced by both harmonic response measurements and current-induced switching of in-plane magnetized magnetic memory devices with the record low critical switching current of ~73 uA (switching current density of 3.6x10^6 A/cm^2). This work demonstrates a very effective strategy for maximizing dampinglike SOT for low-power spin-torque devices.

Here, we demonstrate an approach that provides a precise control of the dimension of InAs from one-dimensional nanowires to wafer-scale free-standing two-dimensional nanosheets, which have a high degree of crystallinity and outstanding electrical and optical properties, using molecular-beam epitaxy by controlling catalyst alloy segregation. In our approach, two-dimensional InAs nanosheets can be obtained directly from one-dimensional InAs nanowires by silver-indium alloy segregation, which is much easier than all previously reported method, such as traditional buffering technique and select area epitaxial growth. Detailed transmission electron microscopy investigations provide a solid evidence that the catalyst alloy segregation is the origination of the InAs dimensional transformation from one-dimensional nanowires to two-dimensional nanosheets, and even to three-dimensional complex crosses. Using this method, we find that the wafer-scale free-standing InAs nanosheets can be grown on various substrates including Si, MgO, sapphire and GaAs etc. The InAs nanosheets grown at high temperature are pure phase single crystals and have a high electron mobility and a long time-resolved THz kinetics lifetime. Our work will open up a conceptually new and general technology route toward the effective controlling the dimension of the low-dimensional III-V semiconductors. It may also enable the low-cost fabrication of free-standing nanosheet-based devices on an industrial scale., Comment: 18 pages,8 figures

The localized dielectric breakdown had been considered as the driving force for growth of plasma electrolytic oxide (PEO) coatings for several decades. However, the TEM study here reveals the dielectric breakdown behavior has little contribution for coating thickening. The presented evidences show the nature of PEO coating growth in all three consecutive stages I-III is ionic migration behavior inside the amorphous alumina layer (AAL) at the coating/matrix interface. The evolution of morphological characterizations in the PEO process is attributed to the interfacial reactions of AAL/alkaline (stage I), AAL/discharge-on-surface (stage II) and AAL/discharge-in-pore (stage III)., Comment: 22 pages, 11 figures