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The electron emission properties of N-doped homoepitaxially grown diamond have been measured and discussed in order to clarify the electron emission mechanism by excluding the effects of polycrystallinity. As a result, N-doped homoepitaxially grown diamond exhibits extremely low threshold electron emission even from extremely flat smooth surfaces without grain boundaries. This result strongly implies that the low threshold electron emission from N-doped diamond should be caused by the resistance of the film rather than by high β whatever the underlying mechanism is.

Although we had reported the remarkable low threshold emission from polycrystalline diamond heavily doped with nitrogen (N) [Nature 381 (1996) 140], the problems caused by polycrystallinity still remain for understanding the electron emission mechanism. This paper describes the growth of N-doped homoepitaxial diamond film {100}, {111} and {110}, and their electron emission properties. N-doped homoepitaxial diamond is grown on synthetic diamond by hot filament chemical vapor deposition. Urea [(NH2)2CO] is used as a dopant for N. Atomic force microscope (AFM) observations indicate that the relatively smooth surface morphologies are obtained for all the films. The epitaxial growth of all the film is confirmed using reflective high energy electron diffraction (RHEED) patterns. Reflective electron energy loss spectra (REELS) indicate that the very surfaces of {100} and {111} are diamond while {110} is graphite rather than diamond. Raman spectra suggest that the bulk of the obtained films are diamond. The resistivities of the films are found to be much higher than the detection limit of the system. The relatively low threshold emission was observed even from the smooth surface and the threshold voltage is confirmed to depend on the crystal orientation. It is speculated from the film characterizations and the electron emission properties that the low threshold emission is due to high resistance rather than rough surface and/or grain boundaries.